Abstract: A fully automatic inductive sample-collecting bucket capable of storing sample information includes a bucket, and a bucket cover snap-fitted to an upper end of the bucket. A bucket cover cavity is formed in the bucket cover. A locking mechanism, and a control mechanism for driving the locking mechanism to act are integrated in the bucket cover cavity. An integrated circuit (IC) card inductive control assembly is integrated in the bucket cover. The bucket is provided with a radio frequency identification (RFID) chip. The IC card inductive control assembly is configured to identify IC card unlocking information of an external grip for cover opening work and to drive the control mechanism to work to control an action of the locking mechanism. The sample-collecting bucket integrates an RFID card capable of carrying sample coding information, and can realize the automatic cover-sealing and cover-opening function under the identification and control of the controller.

Abstract: A photolithography method includes: sequentially preparing a functional film layer, a reflective auxiliary imaging film layer and a first photoresist layer which are stacked, on a photolithography substrate; performing photolithography on the first photoresist layer to obtain a first photolithography structure; etching the reflective auxiliary imaging film layer with the first photolithography structure as a masking layer; on the pattern of the reflective auxiliary imaging film layer, sequentially preparing a second photoresist layer and a transmissive auxiliary imaging film layer which stacked; performing surface plasmon photolithography with the pattern of the reflective auxiliary imaging film layer as a mask, removing the transmissive auxiliary imaging film layer, and then developing the second photoresist layer, to obtain a second photolithography structure; and etching the functional film layer, with the second photolithography structure as a masking layer, to obtain a third photolithography structure.

Abstract: A method for preparing a metal-dielectric strip array based super-resolution lens includes: performing lithography on a first material layer on a first substrate to obtain a grating structure; alternately depositing second and third material layers until the grating structure is filled up, to obtain a first transition structure, one of the second and third material layers being of metal, and the other one being of dielectric; performing planarization on the first transition structure at least reach the top of the grating structure, to obtain a second transition structure; adhering an upper surface of the second transition structure to a second substrate; removing the first substrate, and performing overturning to make the second transition structure be on the second substrate to obtain a third transition structure; and performing planarization again to at least reach the top of finally deposited second or third material layer, to obtain the super-resolution lens.

Abstract: Provided is an near-field lithography immersion system, including: an immersion unit including: a liquid flow channel and a gas flow channel configured to apply gas to confine an immersion liquid provided by the liquid flow channel into an exposure field; at least two interface modules, the interface module includes a gas connector, a liquid connector and a brake connector, the gas connector and the liquid connector are correspondingly connected to the gas flow channel and the liquid flow channel, respectively, the brake connector is configured to control an assembly and a disassembly of the immersion unit, and the interface module is detachably connected to the immersion unit; and a mask loading module including a mask base plate and a mask, the immersion liquid is guided to an edge of the mask from below the mask base plate to form an immersion field between the mask and a substrate.

Abstract: Provided is an near-field lithography immersion system, including: an immersion unit including: a liquid flow channel and a gas flow channel configured to apply gas to confine an immersion liquid provided by the liquid flow channel into an exposure field; at least two interface modules, the interface module includes a gas connector, a liquid connector and a brake connector, the gas connector and the liquid connector are correspondingly connected to the gas flow channel and the liquid flow channel, respectively, the brake connector is configured to control an assembly and a disassembly of the immersion unit, and the interface module is detachably connected to the immersion unit; and a mask loading module including a mask base plate and a mask, the immersion liquid is guided to an edge of the mask from below the mask base plate to form an immersion field between the mask and a substrate.

Abstract: A method for preparing a super-resolution lens based on a metal-dielectric strip array, the method comprising: performing lithography on a first material layer (3) on a first substrate (1) to obtain a grating structure (S1); alternately depositing a second material layer (5) and a third material layer (6) until the grating structure is filled up and becomes even, so as to obtain a first transition structure, wherein one of the second material layer (5) and the third material layer (6) is metal, and the other one is dielectrics (S2); performing planarization on the first transition structure, wherein the planarization depth at least reaches the top of the grating structure, so as to obtain a second transition structure (S3); curing an upper surface of the second transition structure and a second substrate (9) (S4); removing the first substrate (1), so as to transfer the second transition structure onto the second substrate (9) to obtain a third transition structure (S5); and performing planarization again, whe

Abstract: A photolithography method includes: sequentially preparing a functional film layer, a reflective auxiliary imaging film layer and a first photoresist layer which are stacked, on a photolithography substrate; performing photolithography on the first photoresist layer to obtain a first photolithography structure; etching the reflective auxiliary imaging film layer with the first photolithography structure as a masking layer; on the pattern of the reflective auxiliary imaging film layer, sequentially preparing a second photoresist layer and a transmissive auxiliary imaging film layer which stacked; performing surface plasmon photolithography with the pattern of the reflective auxiliary imaging film layer as a mask, removing the transmissive auxiliary imaging film layer, and then developing the second photoresist layer, to obtain a second photolithography structure; and etching the functional film layer, with the second photolithography structure as a masking layer, to obtain a third photolithography structure.

Abstract: A non-belt automatic mechanized sampling system for a truck configured to collect materials from a carriage of the truck. The system includes an integrated sample preparation component having, in descending arrangement, a discharging mechanism and a feeder, a crusher, a constant mass dividing machine and a sample retention barrel. The system also includes a constant mass dividing machine configured to divide the crushed material into samples and discards. The samples are conveyed to a sample retention barrel and discards to a discharging mechanism, which is configured to convey the discards to the carriage.

Abstract: A solid material grinding method and device with an adjustable discharge size includes a grinding disc housing, and a movable grinding disc and a stationary grinding disc provided in a grinding disc cavity of the grinding disc housing coaxially with grinding surfaces opposite to each other. The movable grinding disc is driven to rotate in the grinding disc housing, thereby grinding materials between the movable grinding disc and the stationary grinding disc. The movable grinding disc is further connected to a pushing mechanism, and the pushing mechanism adjusts the distance between the movable grinding disc and the stationary grinding disc in a push-and-pull manner. A top rectifying blower and a side edge rectifying blower respectively blow gas from an upward side and a lateral side of the movable grinding disc and the stationary grinding disc. A central rectifying blower blows gas to the center of the stationary grinding disc.

Abstract: A fully automatic inductive sample-collecting bucket capable of storing sample information includes a bucket, and a bucket cover snap-fitted to an upper end of the bucket. A bucket cover cavity is formed in the bucket cover. A locking mechanism, and a control mechanism for driving the locking mechanism to act are integrated in the bucket cover cavity. An integrated circuit (IC) card inductive control assembly is integrated in the bucket cover. The bucket is provided with a radio frequency identification (RFID) chip. The IC card inductive control assembly is configured to identify IC card unlocking information of an external grip for cover opening work and to drive the control mechanism to work to control an action of the locking mechanism. The sample-collecting bucket integrates an RFID card capable of carrying sample coding information, and can realize the automatic cover-sealing and cover-opening function under the identification and control of the controller.

Abstract: Provided is a non-belt automatic mechanized sampling system for truck, including: a working platform including a transport channel and a slide rail extending along a first direction, the transport channel is arranged under the slide rail and makes the truck pass; a first frame configured to slide with the slide rail; a sampling mechanism (configured to collect materials from the truck along a second direction perpendicular to the first direction, the first and second directions are arranged horizontally; an integrated sample preparation component including a discharging mechanism and a feeder, a crusher, a constant mass dividing machine and a sample retention barrel. The feeder transports the material to the crusher. The crusher crushes the material and transports the crushed material to the constant mass dividing machine. The constant mass dividing machine divides the crushed material into samples to the sample retention barrel, and the discarded material to the discharging mechanism.

Abstract: Provided is a non-belt automatic mechanized sampling system for a train, including: a working platform provided with a slide rail; a sampling mechanism slidably arranged on the slide rail and configured to collect materials from the carriage of the train; an integrated sample preparation component including a discharging mechanism and a feeder, a crusher, a constant mass dividing machine and a sample retention barrel arranged from top to bottom. The feeder transports the material to the crusher. The crusher crushes the material and transports the crushed material to the constant mass dividing machine. The constant mass dividing machine divides the crushed material into samples to the sample retention barrel, and the discarded material to the discharging mechanism. The discharging mechanism transports the discarded materials to the carriage.

Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.

Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.