Patents by Inventor Yung Hsiung Hsu

Yung Hsiung Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7988831
    Abstract: A method for purifying an aqueous potassium hydroxide solution having rich silicon impurities has been disclosed in the invention, which is particularly related to a method that utilizes a low-carbon alcohol (such as ethanol) for extracting said aqueous potassium hydroxide solution, and includes the steps of mixing a low-carbon alcohol with an aqueous potassium hydroxide solution having rich silicon impurities; allowing the resulting mixture therefrom to divide into an aqueous phase layer and a low-carbon alcohol phase layer that contains the aqueous potassium hydroxide solution with reduced silicon impurities, and subjecting the low-carbon alcohol phase layer to a separation process for removing the low-carbon alcohol, thereby resulting in an aqueous potassium hydroxide solution having reduced silicon impurities.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: August 2, 2011
    Assignee: Yeou Fa Chemical Co., Ltd.
    Inventors: Yung Hsiung Hsu, Sage Hsu
  • Publication number: 20100032281
    Abstract: A method for purifying an aqueous potassium hydroxide solution having rich silicon impurities has been disclosed in the invention, which is particularly related to a method that utilizes a low-carbon alcohol (such as ethanol) for extracting said aqueous potassium hydroxide solution, and includes the steps of mixing a low-carbon alcohol with an aqueous potassium hydroxide solution having rich silicon impurities; allowing the resulting mixture therefrom to divide into an aqueous phase layer and a low-carbon alcohol phase layer that contains the aqueous potassium hydroxide solution with reduced silicon impurities, and subjecting the low-carbon alcohol phase layer to a separation process for removing the low-carbon alcohol, thereby resulting in an aqueous potassium hydroxide solution having reduced silicon impurities.
    Type: Application
    Filed: December 19, 2008
    Publication date: February 11, 2010
    Applicant: YEOU FA CHEMICAL CO., LTD.
    Inventors: Yung Hsiung Hsu, Sage Hsu
  • Patent number: 7166264
    Abstract: A process for purifying phosphoric acid includes removing volatile components from phosphoric acid rich in impurities to form a crude phosphoric acid liquid substantially free of volatile components; heating the crude phosphoric acid liquid to a temperature above 250° C. in order to decompose phosphoric acid in the crude phosphoric acid liquid and generate gaseous phosphoric anhydride; and introducing the gaseous phosphoric anhydride into water or a dilute phosphoric acid aqueous solution in order to hydrate the gaseous phosphoric anhydride to form phosphoric acid.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: January 23, 2007
    Inventors: Yung Hsiung Hsu, Sage Hsu
  • Patent number: 7083768
    Abstract: A process for purifying phosphoric acid includes removing volatile components from phosphoric acid rich in impurities to form a crude phosphoric acid liquid substantially free of volatile components; heating the crude phosphoric acid liquid to a temperature above 250° C. in order to decompose phosphoric acid in the crude phosphoric acid liquid and generate gaseous phosphoric anhydride; and introducing the gaseous phosphoric anhydride into water or a dilute phosphoric acid aqueous solution in order to hydrate the gaseous phosphoric anhydride to form phosphoric acid.
    Type: Grant
    Filed: August 12, 2004
    Date of Patent: August 1, 2006
    Inventors: Yung Hsiung Hsu, Sage Hsu
  • Publication number: 20050287061
    Abstract: A process for purifying phosphoric acid includes removing volatile components from phosphoric acid rich in impurities to form a crude phosphoric acid liquid substantially free of volatile components; heating the crude phosphoric acid liquid to a temperature above 250° C. in order to decompose phosphoric acid in the crude phosphoric acid liquid and generate gaseous phosphoric anhydride; and introducing the gaseous phosphoric anhydride into water or a dilute phosphoric acid aqueous solution in order to hydrate the gaseous phosphoric anhydride to form phosphoric acid.
    Type: Application
    Filed: August 12, 2004
    Publication date: December 29, 2005
    Inventors: Yung Hsiung Hsu, Sage Hsu