Patents by Inventor Yung-Long Chen

Yung-Long Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220367656
    Abstract: A method includes providing a substrate, a dummy fin, and a stack of semiconductor channel layers; forming an interfacial layer wrapping around each of the semiconductor channel layers; depositing a high-k dielectric layer, wherein a first portion of the high-k dielectric layer over the interfacial layer is spaced away from a second portion of the high-k dielectric layer on sidewalls of the dummy fin by a first distance; depositing a first dielectric layer over the dummy fin and over the semiconductor channel layers, wherein a merge-critical-dimension of the first dielectric layer is greater than the first distance thereby causing the first dielectric layer to be deposited in a space between the dummy fin and a topmost layer of the stack of semiconductor channel layers, thereby providing air gaps between adjacent layers of the stack of semiconductor channel layers and between the dummy fin and the stack of semiconductor channel layers.
    Type: Application
    Filed: July 28, 2021
    Publication date: November 17, 2022
    Inventors: Chia-Hao Pao, Chih-Chuan Yang, Shih-Hao Lin, Kian-Long Lim, Chih-Wei Lee, Chien-Yuan Chen, Jo-Chun Hung, Yung-Hsiang Chan, Yu-Kuan Lin, Lien Jung Hung
  • Patent number: 11414658
    Abstract: A tracer particle is provided. The tracer particle includes: a core structure; a nucleic acid molecule immobilized on the core structure; and a shell layer covering the core structure and the nucleic acid molecule; wherein the core structure has a first porosity, the shell layer has a second porosity, and the first porosity is greater than the second porosity.
    Type: Grant
    Filed: December 11, 2019
    Date of Patent: August 16, 2022
    Assignee: Industrial Technology Research Institute
    Inventors: Kai-Chun Fan, Yin-Lung Han, Pei-Jyuan Gao, Yong-Yang Lin, Chieh-Lun Cheng, Chien-Chang Huang, Yung-Ho Chang, Chia-Long Lin, I-Son Ng, Bo-Han Chen
  • Publication number: 20210387306
    Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.
    Type: Application
    Filed: June 15, 2020
    Publication date: December 16, 2021
    Inventors: Chi-Wei CHIU, Yung-Long CHEN, Bo-Zhang CHEN, Chong-Cheng SU, Yu-Chun CHEN, Ching-Jung HSU, Lai-Chi TUNG
  • Publication number: 20210375645
    Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.
    Type: Application
    Filed: May 29, 2020
    Publication date: December 2, 2021
    Inventors: Ming-Chieh HSU, Yung-Long CHEN, Fang-Pin CHIANG, Feng-An YANG, Ching-Jung HSU, Chi-Tung LAI
  • Publication number: 20200298371
    Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.
    Type: Application
    Filed: June 5, 2020
    Publication date: September 24, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: I-Chen CHIANG, Hwai-Te CHIU, Yi-Tsang CHEN, Chih-Chiang TSENG, Yung-Long CHEN
  • Patent number: 10688623
    Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: June 23, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: I-Chen Chiang, Hwai-Te Chiu, Yi-Tsang Chen, Chih-Chiang Tseng, Yung-Long Chen
  • Patent number: 10161060
    Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container via a first tube, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a pressure transducer installed on a second tube connected to the gas flow controller and configured to generate a pressure signal to the operation device according to the pressure of the gas in the second tube. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas in the second tube according to the control signal.
    Type: Grant
    Filed: October 9, 2014
    Date of Patent: December 25, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yi-Chao Chang, Pang-Ping Lo, Yi-Chen Wang, Yung-Long Chen, Chun-Feng Hsu
  • Patent number: 10161545
    Abstract: An apparatus includes a production tool and a pipe connected to the production tool. The pipe includes an inner pipe formed of a metal-free material, an outer pipe encircling the inner pipe, and an inlet connected to a channel between the inner pipe and the outer pipe. The apparatus further includes a chemical supply system connected to the pipe. The chemical supply system is configured to supply a chemical through a channel encircled by the inner pipe to the production tool.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: December 25, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Rong-Shyan Pan, Yung-Long Chen, Heng-Yi Tzeng, Shao-Yen Ku, Chih-Chiang Tseng
  • Patent number: 9632516
    Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.
    Type: Grant
    Filed: March 11, 2014
    Date of Patent: April 25, 2017
    Assignee: TAWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Yung-Long Chen, Chun-Feng Hsu, Heng-Yi Tseng, Chieh-Jan Huang, Chin-Hsing Su, Yung-Ching Chen
  • Publication number: 20170023158
    Abstract: An apparatus includes a production tool and a pipe connected to the production tool. The pipe includes an inner pipe formed of a metal-free material, an outer pipe encircling the inner pipe, and an inlet connected to a channel between the inner pipe and the outer pipe. The apparatus further includes a chemical supply system connected to the pipe. The chemical supply system is configured to supply a chemical through a channel encircled by the inner pipe to the production tool.
    Type: Application
    Filed: October 5, 2016
    Publication date: January 26, 2017
    Inventors: Rong-Shyan Pan, Yung-Long Chen, Heng-Yi Tzeng, Shao-Yen Ku, Chih-Chiang Tseng
  • Patent number: 9494261
    Abstract: An apparatus includes a production tool and a pipe connected to the production tool. The pipe includes an inner pipe formed of a metal-free material, an outer pipe encircling the inner pipe, and an inlet connected to a channel between the inner pipe and the outer pipe. The apparatus further includes a chemical supply system connected to the pipe. The chemical supply system is configured to supply a chemical through a channel encircled by the inner pipe to the production tool.
    Type: Grant
    Filed: February 11, 2013
    Date of Patent: November 15, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Rong-Shyan Pan, Yung-Long Chen, Heng-Yi Tzeng, Shao-Yen Ku, Chih-Chiang Tseng
  • Publication number: 20160089765
    Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.
    Type: Application
    Filed: September 30, 2014
    Publication date: March 31, 2016
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: I-Chen CHIANG, Hwai-Te CHIU, Yi-Tsang CHEN, Chih-Chiang TSENG, Yung-Long CHEN
  • Patent number: 9159573
    Abstract: Systems and methods are provided for preparing a plurality of slurry particles. The system includes: a tank configured to contain and provide the slurry particles, a sampling module configured to sample at least one slurry particle within the tank and obtain at least one parameter related to a particle size, and a controller coupled to the tank and the sampling module, configured to vibrate the slurry particles within the tank based on the at least one parameter.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: October 13, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: I-Chen Chiang, Yung-Long Chen, Chih-Chiang Tseng, Chi-Chan Yin
  • Publication number: 20150177745
    Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.
    Type: Application
    Filed: March 11, 2014
    Publication date: June 25, 2015
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Yung-Long CHEN, Chun-Feng HSU, Heng-Yi TSENG, Chieh-Jan HUANG, Chin-Hsing SU, Yung-Ching CHEN
  • Publication number: 20150176153
    Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container via a first tube, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a pressure transducer installed on a second tube connected to the gas flow controller and configured to generate a pressure signal to the operation device according to the pressure of the gas in the second tube. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas in the second tube according to the control signal.
    Type: Application
    Filed: October 9, 2014
    Publication date: June 25, 2015
    Inventors: Yi-Chao CHANG, Pang-Ping LO, Yi-Chen WANG, Yung-Long CHEN, Chun-Feng HSU
  • Publication number: 20150170929
    Abstract: Systems and methods are provided for preparing a plurality of slurry particles. The system includes: a tank configured to contain and provide the slurry particles, a sampling module configured to sample at least one slurry particle within the tank and obtain at least one parameter related to a particle size, and a controller coupled to the tank and the sampling module, configured to vibrate the slurry particles within the tank based on the at least one parameter.
    Type: Application
    Filed: December 18, 2013
    Publication date: June 18, 2015
    Applicant: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: I-CHEN CHIANG, YUNG-LONG CHEN, CHIH-CHIANG TSENG, CHI-CHAN YIN
  • Patent number: 8517802
    Abstract: A slurry feed system suitable for chemical mechanical planarization (CMP) processes in a semiconductor fabrication facility and related method. The slurry feed system includes a valve manifold box having a discharge piping header fluidly connected to at least one CMP station and a first slurry supply train. The first slurry supply train may include a slurry mixing tank, day tank, and at least two slurry feed pumps arranged in series pumping relationship. The first slurry supply train defines a first slurry piping loop. In one embodiment, a second slurry supply train defining a second slurry piping loop is provided. The valve manifold box is operable to supply slurry from either or both of the first and second slurry piping loops to the CMP station.
    Type: Grant
    Filed: September 27, 2012
    Date of Patent: August 27, 2013
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Chiang Tseng, Yung-Long Chen, Yi-Wen Huang, Liang-Chieh Huang
  • Patent number: 8297830
    Abstract: A slurry feed system suitable for chemical mechanical planarization (CMP) processes in a semiconductor fabrication facility and related method. The slurry feed system includes a valve manifold box having a discharge piping header fluidly connected to at least one CMP station and a first slurry supply train. The first slurry supply train may include a slurry mixing tank, day tank, and at least two slurry feed pumps arranged in series pumping relationship. The first slurry supply train defines a first slurry piping loop. In one embodiment, a second slurry supply train defining a second slurry piping loop is provided. The valve manifold box is operable to supply slurry from either or both of the first and second slurry piping loops to the CMP station.
    Type: Grant
    Filed: March 4, 2009
    Date of Patent: October 30, 2012
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Chiang Tseng, Yung-Long Chen, Liang-Chieh Huang, Yi-Wen Huang
  • Publication number: 20100224256
    Abstract: A slurry feed system suitable for chemical mechanical planarization (CMP) processes in a semiconductor fabrication facility and related method. The slurry feed system includes a valve manifold box having a discharge piping header fluidly connected to at least one CMP station and a first slurry supply train. The first slurry supply train may include a slurry mixing tank, day tank, and at least two slurry feed pumps arranged in series pumping relationship. The first slurry supply train defines a first slurry piping loop. In one embodiment, a second slurry supply train defining a second slurry piping loop is provided. The valve manifold box is operable to supply slurry from either or both of the first and second slurry piping loops to the CMP station.
    Type: Application
    Filed: March 4, 2009
    Publication date: September 9, 2010
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Chiang TSENG, Yung-Long CHEN, Liang-Chieh HUANG, Yi-Wen HUANG
  • Patent number: 6234593
    Abstract: A bezel mounting device is adapted to mount a bezel to a front panel of a computer casing. The bezel mounting device includes a rectangular frame having top and bottom sections connected by opposite side sections. Each side section defines elongate slots for movably receiving corresponding posts extending from the bezel for movably attaching the bezel mounting device to the bezel whereby the bezel mounting device is movable between a locking position and a releasing position. Arcuate resilient members are formed on the bottom section and supported by a bottom flange of the bezel for biasing the bezel mounting device toward the locking position. A plurality of barbs are formed on the top and side sections and received in corresponding slots defined in the front panel whereby the barbs simultaneously engage with the slots of the front panel by being biased by the arcuate resilient members to attach the bezel mounting device to the front panel.
    Type: Grant
    Filed: August 24, 1999
    Date of Patent: May 22, 2001
    Assignee: Hon Hai Precision Ind. Co., Ltd.
    Inventors: Yung-Long Chen, Yu-Tai Liu, Alvin Liu