Abstract: The present invention provides a gas filling apparatus and gas filling port thereof. The gas filling apparatus is connected with the air feed apparatus which is introduced the gas into the first inlet port of the semiconductor device or reticle storage apparatus. The gas filling apparatus includes a supporting base which is provided to hold the storage apparatus thereon, and at least one second inlet port which is disposed on the first inlet port of the storage apparatus so as to the gas is flowed into the storage apparatus through the second inlet port. The second inlet port includes a first base, a second base, a first elastic element, a fixing element, and a switch device. Both of the first base and second base have through holes, and opposite to each other. The first elastic element is used to maintain the airtight and is disposed on the second base and opposite to the first inlet port of the storage apparatus used to maintain the airtight.

Abstract: A photomask cleaner includes a clamp assembly using clamping plates with an elastic buffer device for clamping a photomask to be cleaned positively, a displacement mechanism for moving the clamp assembly among workstations subject to a predetermined track, a cleaning unit installed in one workstation for cleaning the photomask carried by the clamp assembly, and an air dryer installed in one workstation for drying the well-cleaned photomask carried.

Abstract: The present invention provides a gas filling apparatus and gas filling port thereof. The gas filling apparatus is connected with the air feed apparatus which is introduced the gas into the first inlet port of the semiconductor device or reticle storage apparatus. The gas filling apparatus includes a supporting base which is provided to hold the storage apparatus thereon, and at least one second inlet port which is disposed on the first inlet port of the storage apparatus so as to the gas is flowed into the storage apparatus through the second inlet port. The second inlet port includes a first base, a second base, a first elastic element, a fixing element, and a switch device. Both of the first base and second base have through holes, and opposite to each other. The first elastic element is used to maintain the airtight and is disposed on the second base and opposite to the first inlet port of the storage apparatus used to maintain the airtight.

Abstract: A gas filling apparatus for connecting a gas feeding device to introduce a gas into a storage apparatus for storing a semiconductor element or a reticle comprises a base and at least one gas filling port, in which the gas filling port comprises a foundation, an elastic element and a fixing element for fixing the elastic element.

Abstract: A semiconductor substrate cleaning and reticle cleaning apparatus, and more particularly, a cleaning apparatus used to remove contaminants from the surface of the semiconductor substrate and the reticle in the semiconductor process, is disclosed in the present invention. The cleaning apparatus comprises a working platform, a base unit, and an adjustable cleaning unit. The base unit is composed of two vertical baseboards in parallel to each other and each vertical baseboard has a bottom end and a top end. The bottom ends of two vertical baseboards are placed on the working platform. The adjustable cleaning unit is pivotally disposed on the top ends of two vertical baseboards, wherein the adjustable cleaning unit comprises at least a long slot for transmitting a fluid to a surface of a semiconductor substrate or a reticle.

Abstract: A photomask cleaner includes a clamp assembly using clamping plates with an elastic buffer device for clamping a photomask to be cleaned positively, a displacement mechanism for moving the clamp assembly among workstations subject to a predetermined track, a cleaning unit installed in one workstation for cleaning the photomask carried by the clamp assembly, and an air dryer installed in one workstation for drying the well-cleaned photomask carried.

Abstract: A gas filling system includes a work platform installed in a pod storage cabinet and defining an accommodation chamber for holding a photomask pod, a pod detaching mechanism disposed in one side of the work platform and controllable to unlock the locking members of the photomask pod for allowing removal of a cover member of the photomask pod from its support tray, and a displacement mechanism mounted in a second side of the work platform and controllable to separate the support tray and the cover member of the photomask pod for allowing filling of an inert gas into the accommodation chamber.