Patents by Inventor Yung-Yen Hsieh

Yung-Yen Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11937903
    Abstract: A blood pressure device includes a first blood pressure measuring device, a second blood pressure measuring device, and a controller. The first blood pressure measuring device is to be worn on a first position of a wrist so as to obtain a first blood pressure information of the first position. The second blood pressure measuring device is to be worn on a second position of the wrist so as to obtain a second blood pressure information of the second position. The controller is electrically coupled to the first blood pressure measuring device and the second blood pressure measuring device so as to adjust tightness between the expanders and the user's skin, respectively. The controller receives, processes, and calculates a pulse transit time between the first blood pressure information and the second blood pressure information, and the controller obtains at least one blood pressure value based on the pulse transit time.
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: March 26, 2024
    Assignee: MICROJET TECHNOLOGY CO., LTD.
    Inventors: Hao-Jan Mou, Yung-Lung Han, Chi-Feng Huang, Chang-Yen Tsai, Wei-Ming Lee, Chun-Yi Kuo, Chin-Wen Hsieh
  • Publication number: 20050087268
    Abstract: A copper film containing tungsten carbide is adapted to be formed on a substrate and contains a copper layer having tungsten carbide in atomic ratios of 0.4 to 12.2% in tungsten and of 0.7 to 7.4% in carbon. To achieve the copper film, a manufacturing method has the acts of: adjusting a non-overlapping area between a copper target and a tungsten carbide target; co-sputtering the copper target and the tungsten carbide target to form the copper film containing tungsten carbide; and optionally annealing the copper film containing tungsten carbide to change the microstructure of the copper film. By sputtering the tungsten carbide with copper, the achieved copper film has excellent electrical conductivity, thermal stability at high temperatures and hardness properties.
    Type: Application
    Filed: October 20, 2004
    Publication date: April 28, 2005
    Inventors: Jinn Chu, Yung-Yen Hsieh