Patents by Inventor Yung-Yu Yin

Yung-Yu Yin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9260364
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: February 16, 2016
    Assignee: YUAN-SHIN MATERIALS TECHNOLOGY CORP.
    Inventors: Chun-Hsu Lin, Chien-Yi Sun, Yung-Yu Yin, Chun-Shih Li, Yo-Chun Chou
  • Publication number: 20150218067
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Application
    Filed: April 15, 2015
    Publication date: August 6, 2015
    Inventors: Chun-Hsu LIN, Chien-Yi SUN, Yung-Yu YIN, Chun-Shih LI, Yo-Chun CHOU
  • Patent number: 9056809
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Grant
    Filed: September 21, 2012
    Date of Patent: June 16, 2015
    Assignee: YUAN-SHIN MATERIALS TECHNOLOGY CORP.
    Inventors: Chun-Hsu Lin, Chien-Yi Sun, Yung-Yu Yin, Chun-Shih Li, Yo-Chun Chou
  • Patent number: 9056810
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 16, 2015
    Assignee: YUAN-SHIN MATERIALS TECHNOLOGY CORP.
    Inventors: Chun-Hsu Lin, Chien-Yi Sun, Yung-Yu Yin, Chun-Shih Li, Yo-Chun Chou
  • Patent number: 8816139
    Abstract: The present invention relates to a facile method of preparing 1,4-bis(chlorodifluoromethyl)benzene, comprising the steps of: (A) providing a reactant liquid of 1,4-bis(difluoromethyl)benzene; optionally (B) providing a light source for UV radiation; and (C) introducing chlorine gas into the reactant liquid at a temperature of 50-90° C. under a pressure above 1 atm to obtain 1,4-Bis(chlorodifluoromethyl)benzene. The invented facile method can be utilized in a batch process or a continuous process for effective production of 1,4-bis(chlorodifluoromethyl)benzene.
    Type: Grant
    Filed: May 22, 2012
    Date of Patent: August 26, 2014
    Assignees: Yuan-Shin Materials Technology Corp., Chung-Shan Institute of Science and Technology, Armaments Bureau, M.N.D.
    Inventors: Chun Hsu Lin, Hung Cheng Yin, Chien Yi Sun, Yung Yu Yin, Chuan Yu Chou
  • Publication number: 20140221632
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Application
    Filed: April 7, 2014
    Publication date: August 7, 2014
    Inventors: Chun-Hsu LIN, Chian-Yi SUN, Yung-Yu YIN, Chun-Shih LI, Yo-Chun CHOU
  • Publication number: 20140011986
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Application
    Filed: September 21, 2012
    Publication date: January 9, 2014
    Inventors: Chun-Hsu LIN, Chien-Yi SUN, Yung-Yu YIN, Chun-Shih LI, Yo-Chun CHOU
  • Publication number: 20130116482
    Abstract: The present invention relates to a facile method of preparing 1,4-bis(chlorodifluoromethyl)benzene, comprising the steps of: (A) providing a reactant liquid of 1,4-bis(difluoromethyl)benzene; optionally (B) providing a light source for UV radiation; and (C) introducing chlorine gas into the reactant liquid at a temperature of 50-90° C. under a pressure above 1 atm to obtain 1,4-Bis(chlorodifluoromethyl)benzene. The invented facile method can be utilized in a batch process or a continuous process for effective production of 1,4-bis(chlorodifluoromethyl)benzene.
    Type: Application
    Filed: May 22, 2012
    Publication date: May 9, 2013
    Applicants: Chung-shan Institute of Science and Technology. Armaments Bureau. M.N.D., Yuan-Shin Materials Technology Corp.
    Inventors: Chun-Hsu LIN, Hung-Cheng Yin, Chien-Yi Sun, Yung-Yu Yin, Chuan-Yu Chou