Patents by Inventor YUNGHAO WANG

YUNGHAO WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11854800
    Abstract: Embodiment methods for performing a high pressure anneal process during the formation of a semiconductor device, and embodiment devices therefor, are provided. The high pressure anneal process may be a dry high pressure anneal process in which a pressurized environment of the anneal includes one or more process gases. The high pressure anneal process may be a wet anneal process in which a pressurized environment of the anneal includes steam.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: December 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Szu-Ying Chen, Ya-Wen Chiu, Cheng-Po Chau, Yi Che Chan, Chih Ping Liao, YungHao Wang, Sen-Hong Syue
  • Publication number: 20230386832
    Abstract: Embodiment methods for performing a high pressure anneal process during the formation of a semiconductor device, and embodiment devices therefor, are provided. The high pressure anneal process may be a dry high pressure anneal process in which a pressurized environment of the anneal includes one or more process gases. The high pressure anneal process may be a wet anneal process in which a pressurized environment of the anneal includes steam.
    Type: Application
    Filed: August 4, 2023
    Publication date: November 30, 2023
    Inventors: Szu-Ying Chen, Ya-Wen Chiu, Cheng-Po Chau, Yi Che Chan, Chih Ping Liao, YungHao Wang, Sen-Hong Syue
  • Publication number: 20210280414
    Abstract: Embodiment methods for performing a high pressure anneal process during the formation of a semiconductor device, and embodiment devices therefor, are provided. The high pressure anneal process may be a dry high pressure anneal process in which a pressurized environment of the anneal includes one or more process gases. The high pressure anneal process may be a wet anneal process in which a pressurized environment of the anneal includes steam.
    Type: Application
    Filed: May 25, 2021
    Publication date: September 9, 2021
    Inventors: Szu-Ying Chen, Ya-Wen Chiu, Cheng-Po Chau, Yi Che Chan, Chih Ping Liao, YungHao Wang, Sen-Hong Syue
  • Patent number: 11037781
    Abstract: Embodiment methods for performing a high pressure anneal process during the formation of a semiconductor device, and embodiment devices therefor, are provided. The high pressure anneal process may be a dry high pressure anneal process in which a pressurized environment of the anneal includes one or more process gases. The high pressure anneal process may be a wet anneal process in which a pressurized environment of the anneal includes steam.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: June 15, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Szu-Ying Chen, Ya-Wen Chiu, Cheng-Po Chau, Yi Che Chan, Chih Ping Liao, YungHao Wang, Sen-Hong Syue
  • Publication number: 20170286188
    Abstract: In accordance with an embodiment, described herein is a system and method for integrating a transactional middleware platform with a centralized audit framework for a SOA middleware platform. An audit provider in the centralized audit framework can be provided as a plug-in module to the transactional middleware platform, and registered as an internal audit service therein. The internal audit service can be advertised on an audit server, and can process audit requests from within the transactional middleware platform. One or more configuration files can be provided to the audit provider, for use in generating audit data for audit events occurring in one or more components in the transactional middleware platform. The audit provider itself can be configured to represent an audit aware component within the centralized audit framework, thereby utilizing a plurality of functionalities available in the centralized audit framework, including saving the audit data in a central data store.
    Type: Application
    Filed: June 27, 2016
    Publication date: October 5, 2017
    Inventors: YUNGHAO WANG, JIMIN (JIMMY) CAI, WEI LI, LIN YANG