Abstract: An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. Each element is feed by a feeder coil.

Abstract: An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. Each element is feed by a feeder coil.

Abstract: An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals.

Abstract: An antenna adapted to apply a uniform electromagnetic field to a volume of gas and including an input terminal for receiving electrical energy into the antenna and an array of radiating elements connected to the input terminal thereof. In the illustrative embodiment, the antenna has four radiating elements. Each radiating element is a conductor wound in a rectangular spiral shape. Each radiating element is connected to the input terminal on one end and an output terminal on a second end thereof. The input terminal is equidistant from first, second, third and fourth output terminals connected to the first, second, third and fourth radiating elements, respectively. The inventive antenna affords a novel method for plasma processing a device including the steps of: mounting the device within a chamber; providing a gas the chamber; and applying an electromagnetic field to the gas via an array of antenna elements disposed relative to the gas to generate a uniform distribution of the plasma.

Abstract: A thin film head apparatus and method for forming such a thin film head. In one approach, the present invention recites forming a cavity in a dielectric layer. Next, a layer of high magnetic field saturation (HBsat) material is sputter-deposited over the dielectric layer such that the HBsat material is deposited into the cavity formed in the dielectric layer. The cavity in the dielectric layer functions as a mold or “stencil” for the HBsat material. The HBsat material deposited into the cavity is used to form the first core of a thin film head. After the formation of the first core of the thin film head, a gap layer of material is deposited above the dielectric layer and above the first core. Next, a layer of HBsat material is sputter-deposited above the gap layer of material and above the first core of the thin film head. The layer of HBsat material disposed above the gap layer of material and above the first core is used to form the second core of the thin film head.

Abstract: An antenna adapted to apply a uniform electromagnetic field with high energy density to a volume of gas. The antenna includes an input node for receiving electrical energy and a first coil for radiating electromagnetic energy into the gas. The first coil is connected to the input node on one end thereof and is grounded on the opposite side to cause flux to flow in a first direction. A second coil is included for radiating electromagnetic energy into the gas. The second coil is also connected to the input node on one end thereof and grounded on the opposite side to flow in the first direction. Multiple number of coils can be added to form an antenna. In an illustrative application, the antenna is used in a plasma processing system comprising a vacuum chamber, a gas disposed within the vacuum chamber, and a dielectric disposed around the vacuum chamber. The inventive antenna is mounted around the dielectric tube and radiates electromagnetic energy into the gas.

Abstract: A method and apparatus for securely clamping a substrate to an electrostatic chuck during processing of a substrate. The method generally includes the steps of forming an initial electrostatic clamping force between the electrostatic chuck and the substrate, modifying the initial electrostatic clamping force when an rf voltage is applied to the electrostatic chuck during processing, and restoring the initial electrostatic clamping force with an offset voltage applied to the electrostatic chuck. The present invention also includes an electrostatic chuck having at least one electrode and a dielectric on the surface of the electrode for supporting a substrate. A voltage source is coupled to the electrode for electrostatically clamping the substrate to the surface of the electrostatic chuck with an initial electrostatic force. An rf source is coupled to the electrode for applying rf voltage to the electrostatic chuck and causing a change in the initial electrostatic force.