Patents by Inventor Yunqiang Zhang Zhang

Yunqiang Zhang Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Generalization of the photo process window and its application to OPC test pattern design
    Patent number: 7568180
    Abstract: A method comprises the steps of: (a) simulating on a processor a fabrication of a plurality of layout patterns by a lithographic process; (b) determining sensitivities of the layout patterns to a plurality of parameters based on the simulation; (c) using the sensitivities to calculate deviations of the patterns across a range of each respective one of the parameters; and (d) selecting ones of the patterns having maximum or near-maximum deviations to be used as test patterns.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: July 28, 2009
    Assignee: PDF Solutions
    Inventors: Hans Eisenmann, Kai Peter, Dennis Ciplickas, Jonathan O. Burrows, Yunqiang Zhang Zhang
  • Generalization of the Photo Process Window and Its Application to Opc Test Pattern Design
    Publication number: 20080295061
    Abstract: A method comprises the steps of: (a) simulating on a processor a fabrication of a plurality of layout patterns by a lithographic process; (b) determining sensitivities of the layout patterns to a plurality of parameters based on the simulation; (c) using the sensitivities to calculate deviations of the patterns across a range of each respective one of the parameters; and (d) selecting ones of the patterns having maximum or near-maximum deviations to be used as test patterns.
    Type: Application
    Filed: February 22, 2005
    Publication date: November 27, 2008
    Inventors: Hans Eisenmann, Kai Peter, Dennis Ciplickas, Jonathan O. Burrows, Yunqiang Zhang Zhang