Patents by Inventor Yun Seong Lee
Yun Seong Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11943490Abstract: The method comprises registering at least one of an internet protocol (IP) address and a media access control (MAC) address of the security devices, generating a plurality of public key and private key pairs, encrypting and storing private keys comprised in the plurality of public key and private key pairs using a master key provided from a master key management unit, selecting any one of a plurality of public key and private key pairs when the access of the security device is approved and providing a certificate comprising the selected public key to the security device, receiving a symmetric key encrypted with the public key of the certificate from the security device, and decrypting the private key using the master key provided from the master key management unit.Type: GrantFiled: January 11, 2022Date of Patent: March 26, 2024Assignee: DUDU Information Technologies, Inc.Inventors: Young Sun Park, Su Man Nam, Jin Woo Lee, Jun Geol Kim, Yun Seong Kim, Yoon Jeong Kim
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Patent number: 11935725Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: October 28, 2022Date of Patent: March 19, 2024Assignee: EN2CORE TECHNOLOGY INC.Inventors: Sae Hoon Uhm, Yun Seong Lee
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Publication number: 20240072249Abstract: A negative electrode includes a lithium-alkaline earth metal alloy, and can be used in a lithium-sulfur battery. Furthermore, a method to obtain said negative electrode, and a lithium-sulfur battery containing the negative electrode.Type: ApplicationFiled: August 31, 2023Publication date: February 29, 2024Applicant: LG Energy Solution, Ltd.Inventors: Myeong-Seong Kim, Ki-Hyun Kim, Yun-Jung Kim, Do-Joong Lee
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Publication number: 20240072238Abstract: A negative electrode includes a lithium-lanthanum alloy. The negative electrode can be applied to a negative electrode for a lithium-sulfur battery. The lithium-sulfur battery including the alloy negative electrode has improved life characteristics and improved electrochemical efficiency.Type: ApplicationFiled: August 31, 2023Publication date: February 29, 2024Applicant: LG Energy Solution, Ltd.Inventors: Yun-Jung Kim, Ki-Hyun Kim, Myeong-Seong Kim, Do-Joong Lee
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Publication number: 20240006150Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: ApplicationFiled: September 12, 2023Publication date: January 4, 2024Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Patent number: 11791133Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: GrantFiled: November 15, 2022Date of Patent: October 17, 2023Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
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Publication number: 20230170185Abstract: According to one embodiment of the present specification, there can be provided an apparatus for generating plasma, comprising: a chamber configured to provide a generating space for the plasma; an antenna module placed adjacent to the chamber and configured to be connected to a first power source and generate induced electric field in the chamber; an electrode placed adjacent to the chamber and configured to be connected to a second power source and assist in a generation of the plasma; a sensor configured to obtain sensing information related to a status of the plasma; and a controller configured to control the first power source and the second power source.Type: ApplicationFiled: June 29, 2021Publication date: June 1, 2023Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Publication number: 20230136018Abstract: According to one embodiment of the present disclosure, there can be provided a plasma generating device for performing plasma discharge, the plasma generating device having multiple operation modes including a first mode and a second mode, and including: a first power supply capable of changing a frequency within a first frequency range; a second power supply capable of changing a frequency within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound around the dielectric tube at least one time, a second unit coil wound around the dielectric tube at least one time, and a first capacitor connected in series between the first unit coil and the second unit coil.Type: ApplicationFiled: December 26, 2022Publication date: May 4, 2023Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK, Ji Hoon KIM
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Publication number: 20230139675Abstract: This invention is an antenna structure inducing plasma in a chamber with applied alternative power, comprising: a first antenna segment and a second antenna segment arranged based on a virtual central axis to have a first curvature radius and a second curvature radius respectively, the central axis crossing a first plane, and a first capacitive load electrically connecting the first antenna segment and the second antenna segment, wherein the first antenna segment extends from one end of the first capacitive load with the first curvature radius having a first length and the second antenna segment extends from other end of the first capacitive load with the second curvature radius having a second length, and wherein a sum of the first length and the second length is shorter than a circumference of the first curvature radius or the second curvature radius.Type: ApplicationFiled: February 19, 2021Publication date: May 4, 2023Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Publication number: 20230083958Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: ApplicationFiled: November 15, 2022Publication date: March 16, 2023Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Publication number: 20230080526Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: ApplicationFiled: October 28, 2022Publication date: March 16, 2023Inventors: Sae Hoon UHM, Yun Seong LEE
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Patent number: 11532455Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: GrantFiled: December 27, 2019Date of Patent: December 20, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae-Hoon Uhm, Yun-Seong Lee, Yeong-Hoon Sohn, Se-Hong Park
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Patent number: 11521829Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: December 15, 2020Date of Patent: December 6, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae Hoon Uhm, Yun Seong Lee
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Publication number: 20210319979Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: ApplicationFiled: December 27, 2019Publication date: October 14, 2021Inventors: Sae-Hoon UHM, Yun-Seong LEE, Yeong-Hoon SOHN, Se-Hong PARK
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Publication number: 20210142981Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: ApplicationFiled: December 15, 2020Publication date: May 13, 2021Inventors: Sae Hoon UHM, Yun Seong LEE
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Patent number: 10903046Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: December 4, 2019Date of Patent: January 26, 2021Assignee: EN2CORE technology, Inc.Inventors: Sae Hoon Uhm, Yun Seong Lee
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Patent number: 10896806Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: December 4, 2019Date of Patent: January 19, 2021Assignee: EN2CORE technology, Inc.Inventors: Sae Hoon Uhm, Yun Seong Lee
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Publication number: 20200161096Abstract: Provided are a plasma generating apparatus and a substrate treating apparatus. The plasma generating apparatus includes a plurality of ground electrodes arranged inside a vacuum container and extending parallel to each other and power electrodes arranged between the ground electrodes. An area where a distance between the ground electrode and the power electrode is constant exists, and the power electrodes are tapered in a direction facing the substrate. The power electrodes are connected to an RF power source, and height of the power electrode is greater than that of the ground electrode in the direction facing the substrate.Type: ApplicationFiled: November 19, 2019Publication date: May 21, 2020Applicants: Jusung Engineering Co., Ltd., Korea Advanced Institute of Science and TechnologyInventors: Hong-Young CHANG, Sang-Hun Seo, Yun-Seong Lee
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Publication number: 20200111641Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: ApplicationFiled: December 4, 2019Publication date: April 9, 2020Inventors: Sae Hoon UHM, Yun Seong LEE
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Publication number: 20200105502Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: ApplicationFiled: December 4, 2019Publication date: April 2, 2020Inventors: Sae Hoon UHM, Yun Seong LEE