Abstract: The application provides an adjustment method and an adjustment apparatus for mutual parallelism of two back-to-back gratings, including parallelism adjustment of grating surfaces of the two gratings and parallelism adjustment of grating lines of the two gratings. Wherein a first grating and a second grating respectively disposed on both sides of the grating mounting plate are adjusted to be perpendicular to the same horizontal collimated light source respectively, so as to achieve the parallelism adjustment of the grating surfaces of the two gratings; light is emitted by a red light source, diffraction patterns formed by two gratings are displayed on a screen, more diffraction light spots are marked respectively, then marks are connected, and a mark connecting line of the first grating is adjusted to be parallel to a mark connecting line of the second grating, thereby completing the parallelism adjustment of the grating lines of the two gratings.

Abstract: The present application discloses a method for calibrating a parameter error of an electron probe microanalysis instrument. A one-dimensional grating standard template is prepared based on atom lithography technology. A theoretical grating period D of the one-dimensional grating standard template is calculated. The one-dimensional grating standard template is statically placed on a stage of the electron probe microanalysis instrument. The electron probe microanalysis instrument scans the one-dimensional grating standard template on the stage, performs image acquisition and measurement on a grid distance of the one-dimensional grating standard template to obtain a grating scanning distance measurement value L, and records a magnification ratio at this time. A calibration factor K under the magnification ratio is calculated according to D and L.