Abstract: A wafer cleaning apparatus provided by the present invention comprises a rotary shaft, a chuck arranged on the top of the rotary shaft for retaining the wafer, a fixed shaft coaxially passed through the rotary shaft, and an upper end cover and a lower end cover that block the top and bottom of the fixed shaft respectively. Wherein, the fixed shaft is a hollow shaft with at least one circle of exhaust holes provided on the wall of the fixed shaft. The lower end cover is arranged with a gas inlet port, through which a protective gas is provided to the interior of the fixed shaft. The protective gas forms a positive pressure in the annular space between the fixed shaft and the rotary shaft through the at least one circle of exhaust holes. The present invention provides positive pressure protective gas to the spacing between the fixed shaft and the rotary shaft by opening exhaust holes on the wall of the fixed shaft.

Abstract: The invention discloses a hydrophilic anti-fog nano paint for endoscope, which includes the following according to the number of weight parts: plant polyphenols of 1-10 parts, metal ions of 0.1-2 parts, biomass molecules of 0.1-0.5 parts, additives of 10-20 parts and solvents of 250 parts; the paint is coated on the surface of the substrate, and the desired coating can be obtained after drying; the plant polyphenol and metal ions in the invention combine to form the plant polyphenol-metal nano complex, form hydrophilic nano-film with biomass molecules on the surface of the laparoscope, and cooperatively enhance the surface interface hydrophilicity of the lens; the formula of the invention has good biocompatibility, will not cause clinical side effects when it comes into contact with tissues, and can meet the needs of clinical use.