Abstract: In a method, a mask is formed on a microstructure over a substrate. The mask includes a first pattern over a first region of the microstructure and a second pattern over a second region of the microstructure. A first etching process is performed to etch the microstructure by providing an etching gas and applying a first bias voltage to the substrate according to the first and second patterns of the mask. A protective layer is subsequently formed by providing a deposition gas and applying a second bias voltage to the substrate to cover the first pattern of the mask. A second etching process is performed to transfer the second pattern of the mask further into the second region of the microstructure. The deposition gas has a higher carbon to fluorine ratio than the etching gas, and the second bias voltage is smaller than the first bias voltage.

Abstract: In a method, a mask is formed on a microstructure over a substrate. The mask includes a first pattern over a first region of the microstructure and a second pattern over a second region of the microstructure. A first etching process is performed to etch the microstructure by providing an etching gas and applying a first bias voltage to the substrate according to the first and second patterns of the mask. A protective layer is subsequently formed by providing a deposition gas and applying a second bias voltage to the substrate to cover the first pattern of the mask. A second etching process is performed to transfer the second pattern of the mask further into the second region of the microstructure. The deposition gas has a higher carbon to fluorine ratio than the etching gas, and the second bias voltage is smaller than the first bias voltage.

Abstract: In the disclosed method, a mask is formed on a microstructure. The mask includes a first pattern positioned over a first region of the microstructure and a second pattern positioned over a second region of the microstructure. A first etching process is performed to etch the microstructure according to the first and second patterns formed in the mask. The first etching process transfers the first and second patterns of the mask into the first and second regions of the microstructure, respectively. A protective layer is subsequently formed over the first pattern of the mask that is positioned over the first region of the microstructure. When the protective layer is formed, a second etching process is performed to etch the microstructure and transfer the second pattern of the mask further into the second region of the microstructure. The method also includes removing the mask and the protective layer from the microstructure.

Abstract: Embodiments of methods for forming channel holes in 3D memory devices using a nonconformal sacrificial layer are disclosed. In an example, a dielectric stack including interleaved first dielectric layers and second dielectric layers is formed on a substrate. An opening extending vertically through the dielectric stack is formed. A nonconformal sacrificial layer is formed along a sidewall of the opening, such that a variation of a diameter of the opening decreases. The nonconformal sacrificial layer and part of the dielectric stack abutting the nonconformal sacrificial layer are removed. A channel structure is formed in the opening after removing the nonconformal sacrificial layer and part of the dielectric stack.

Abstract: In the disclosed method, a mask is formed on a microstructure. The mask includes a first pattern positioned over a first region of the microstructure and a second pattern positioned over a second region of the microstructure. A first etching process is performed to etch the microstructure according to the first and second patterns formed in the mask. The first etching process transfers the first and second patterns of the mask into the first and second regions of the microstructure, respectively. A protective layer is subsequently formed over the first pattern of the mask that is positioned over the first region of the microstructure. When the protective layer is formed, a second etching process is performed to etch the microstructure and transfer the second pattern of the mask further into the second region of the microstructure. The method also includes removing the mask and the protective layer from the microstructure.

Abstract: Embodiments of methods for forming channel holes in 3D memory devices using a nonconformal sacrificial layer are disclosed. In an example, a dielectric stack including interleaved first dielectric layers and second dielectric layers is formed on a substrate. An opening extending vertically through the dielectric stack is formed. A nonconformal sacrificial layer is formed along a sidewall of the opening, such that a variation of a diameter of the opening decreases. The nonconformal sacrificial layer and part of the dielectric stack abutting the nonconformal sacrificial layer are removed. A channel structure is formed in the opening after removing the nonconformal sacrificial layer and part of the dielectric stack.

Abstract: A computer input device includes a body and a trace-detecting module coupled to the body. The body has a micro control unit (MCU), and the trace-detecting module has at least a light pervious area, and a trace-detecting unit. The trace-detecting unit further has at least a light source and a sensor. The sensor senses a reflected light beam caused by movement of a user's digit movement on the light pervious area at a velocity which can be sensed by the sensor. If the velocity exceeds a threshold stored in the MCU, the MCU executes automatically scrolling.

Abstract: A computer input device includes a body and a trace-detecting module coupled to the body. The body has a micro control unit (MCU), and the trace-detecting module has at least a light pervious area, and a trace-detecting unit. The trace-detecting unit further has at least a light source and a sensor. The sensor senses a reflected light beam caused by movement of a user's digit movement on the light pervious area at a velocity which can be sensed by the sensor. If the velocity exceeds a threshold stored in the MCU, the MCU executes automatically scrolling.

Abstract: A computer input device includes a body and a trace-detecting module coupled to the body. The body has a micro control unit (MCU), and the trace-detecting module has at least a light pervious area, and a trace-detecting unit. The trace-detecting unit further has at least a light source and a sensor. The sensor senses a reflected light beam caused by movement of a user's digit movement on the light pervious area at a velocity which can be sensed by the sensor. If the velocity exceeds a threshold stored in the MCU, the MCU executes automatically scrolling at a predetermined scrolling speed.

Abstract: The present invention relates to a positioning device, and in particular to a mechanism using an image detecting module. The present invention comprises a base having an image detecting module, a control circuit, and a driving module therein. The base has a rotateable plate on the base for carrying an object. The base further has a light pervious area for receiving a light beam coming from a remote control. A convex reflector is located within the base to reflect the image to the image detecting module.

Abstract: A pointing device includes a first convex lens on a housing of the pointing device and arranged such that when a user's finger slides over the lens, an image of the user's finger is sensed to generate a cursor-moving or scrolling signal for a computer.

Abstract: An optical sensing unit includes a circuit board on which is situated a first row of light detecting sensors and discrete a second row of light detecting sensors. The first row of light detecting sensors detects changes in light intensity indicative of relative movement along a first axis, and the second row of light detecting sensors detects changes in reflected light intensity indicative of relative movement along a second axis. Therefore, a cursor or content of the display of the computer system will be moved or scrolled accordingly.

Abstract: A computer input device includes a body and a trace-detecting module coupled to the body. The body has a micro control unit (MCU), and the trace-detecting module has at least a light pervious area, and a trace-detecting unit. The trace-detecting unit further has at least a light source and a sensor. The sensor senses a reflected light beam caused by movement of a user's digit movement on the light pervious area at a velocity which can be sensed by the sensor. If the velocity exceeds a threshold stored in the MCU, the MCU executes automatically scrolling at a predetermined scrolling speed.

Abstract: A pointing device includes a first convex lens on a housing of the pointing device and arranged such that when a user's finger slides over the lens, an image of the user's finger is sensed to generate a cursor-moving or scrolling signal for a computer.