Patents by Inventor Yuri Johannes Van De Vijver

Yuri Johannes Van De Vijver has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20060017894
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.
    Type: Application
    Filed: July 22, 2004
    Publication date: January 26, 2006
    Applicant: ASML NETHERLAND B.V.
    Inventors: Tjarko Adriaan Van Empel, Erik Loopstra, Antonius Van Der Net, Yuri Johannes Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse