Patents by Inventor Yurii Sidelnikov

Yurii Sidelnikov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070001126
    Abstract: A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Robert Gayazov, Vadim Banine, Vladimir Ivanov, Evgenii Korob, Konstantin Koshelev, Givi Zukavishvili, Yurii Sidelnikov
  • Publication number: 20050133727
    Abstract: An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.
    Type: Application
    Filed: December 22, 2003
    Publication date: June 23, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Levinus Bakker, Johannes Hubertus Moors, Lucas Henricus Johannes Stevens, Yurii Sidelnikov, Marcel Mathijs Dierichs, Marius Ravensbergen
  • Publication number: 20050077483
    Abstract: A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.
    Type: Application
    Filed: June 23, 2004
    Publication date: April 14, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Vadim Banine, Ralph Kurt, Frank Schuurmans, Yurii Sidelnikov