Patents by Inventor Yuriy V. Melnik

Yuriy V. Melnik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11953390
    Abstract: Exemplary backpressure monitoring apparatuses may include a fluid supply source having a fluid port. The backpressure monitoring apparatuses may include a flow control mechanism fluidly coupled with the fluid port. The backpressure monitoring apparatuses may include a delivery tube fluidly coupled with the flow control mechanism and the fluid port. The backpressure monitoring apparatuses may include a pressure differential gauge fluidly coupled with the delivery tube. The pressure differential gauge may include an interface mechanism that is engageable with an outlet of a fluid flow device.
    Type: Grant
    Filed: November 30, 2021
    Date of Patent: April 9, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Sukti Chatterjee, David Masayuki Ishikawa, Yuriy V. Melnik, David A. Britz, Lance A. Scudder
  • Publication number: 20230168139
    Abstract: Exemplary backpressure monitoring apparatuses may include a fluid supply source having a fluid port. The backpressure monitoring apparatuses may include a flow control mechanism fluidly coupled with the fluid port. The backpressure monitoring apparatuses may include a delivery tube fluidly coupled with the flow control mechanism and the fluid port. The backpressure monitoring apparatuses may include a pressure differential gauge fluidly coupled with the delivery tube. The pressure differential gauge may include an interface mechanism that is engageable with an outlet of a fluid flow device.
    Type: Application
    Filed: November 30, 2021
    Publication date: June 1, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Sukti Chatterjee, David Masayuki Ishikawa, Yuriy V. Melnik, David A. Britz, Lance A. Scudder
  • Publication number: 20220372620
    Abstract: Exemplary methods of forming a coating of material on a substrate may include forming a plasma of a first precursor and an oxygen-containing precursor. The first precursor and the oxygen-containing precursor may be provided in a first flow rate ratio. The methods may include depositing a first layer of material on the substrate. While maintaining the plasma, the methods may include adjusting the first flow rate ratio to a second flow rate ratio. The methods may include depositing a second layer of material on the substrate.
    Type: Application
    Filed: May 10, 2022
    Publication date: November 24, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Lance A. Scudder, Sukti Chatterjee, David Masayuki Ishikawa, Yuriy V. Melnik, Vibhas Singh
  • Publication number: 20220375723
    Abstract: Exemplary methods of forming a coating of material on a substrate may include forming a plasma of a first precursor and an oxygen-containing precursor. The first precursor and the oxygen-containing precursor may be provided in a first flow rate ratio. The methods may include depositing a first layer of material on the substrate. While maintaining the plasma, the methods may include adjusting the first flow rate ratio to a second flow rate ratio. The methods may include depositing a second layer of material on the substrate.
    Type: Application
    Filed: May 10, 2022
    Publication date: November 24, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Lance A. Scudder, Sukti Chatterjee, David Masayuki Ishikawa, Yuriy V. Melnik, Vibhas Singh