Patents by Inventor Yushin Sasaki

Yushin Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6638666
    Abstract: A substrate for a transfer mask, which comprises a first silicon layer formed of monocrystalline silicon, a silicon oxide film formed on the first silicon layer and having a thickness ranging from 0.2 to 0.8 &mgr;m, and a second silicon layer formed on the silicon oxide film. A transfer mask which is manufactured by making use of this substrate is featured in that it is possible to prevent a transfer pattern from being cracked or destroyed due to stress from the silicon oxide film on the occasion of manufacturing the transfer mask, thereby providing a defect-free transfer mask.
    Type: Grant
    Filed: January 23, 2002
    Date of Patent: October 28, 2003
    Assignee: Toppan Printing Co., Ltd.
    Inventors: Toshio Konishi, Akira Tamura, Kojiro Ito, Yushin Sasaki, Hideyuki Eguchi
  • Publication number: 20020060297
    Abstract: A substrate for a transfer mask, which comprises a first silicon layer formed of monocrystalline silicon, a silicon oxide film formed on the first silicon layer and having a thickness ranging from 0.2 to 0.8 &mgr;m, and a second silicon layer formed on the silicon oxide film. A transfer mask which is manufactured by making use of this substrate is featured in that it is possible to prevent a transfer pattern from being cracked or destroyed due to stress from the silicon oxide film on the occasion of manufacturing the transfer mask, thereby providing a defect-free transfer mask.
    Type: Application
    Filed: January 23, 2002
    Publication date: May 23, 2002
    Applicant: Toppan Printing Co., Ltd.
    Inventors: Toshio Konishi, Akira Tamura, Kojiro Ito, Yushin Sasaki, Hideyuki Eguchi