Patents by Inventor Yusuke Fujito

Yusuke Fujito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7402376
    Abstract: A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)acrylate compound having two or more of (meth)acryloyl groups per molecule whose acid value of less than 10 mg KOH/g, an alkali soluble polymer compound, a photopolymerization initiator and a photopolymerizable compound (D) including in the structure thereof a structural unit represented by the formula (I) gives such a well-balanced properties.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: July 22, 2008
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Syunji Nakazato, Ryuma Mizusawa, Hiroyuki Obiya, Takashi Ono, Yusuke Fujito
  • Publication number: 20050238998
    Abstract: A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)acrylate compound having two or more of (meth)acryloyl groups per molecule whose acid value of less than 10 mg KOH/g, an alkali soluble polymer compound, a photopolymerization initiator and a photopolymerizable compound (D) including in the structure thereof a structural unit represented by the formula (I) gives such a well-balanced properties.
    Type: Application
    Filed: April 5, 2005
    Publication date: October 27, 2005
    Inventors: Syunji Nakazato, Ryuma Mizusawa, Hiroyuki Obiya, Takashi Ono, Yusuke Fujito