Abstract: A composition for forming a silicon-containing resist underlayer film contains a compound shown by the following general formula (A-1) and a thermally crosslinkable polysiloxane. R1 represents a methyl group, an ethyl group, a propyl group, an allyl group, or a propargyl group. R2 represents a hydrogen atom, an acetyl group, an acryloyl group, a methacryloyl group, a benzoyl group, a naphthoyl group, or an anthranoyl group. R3 represents a methyl group, an ethyl group, a propyl group, an allyl group, a propargyl group, or a group shown by the following general formula (A-2), where a broken line represents a bonding arm, and R1 and R2 are as defined above. An object of the present invention is to provide a silicon-containing resist underlayer film capable of exhibiting high effect of suppressing ultrafine pattern collapse and forming a resist pattern with favorable pattern profile in multilayer resist methods.

Abstract: A sensor element includes: an element base including: a ceramic body made of an oxygen-ion conductive solid electrolyte, and having an inlet at one end portion thereof; at least one internal chamber located inside the ceramic body, and communicating with the inlet under predetermined diffusion resistance; an electrochemical pump cell including an electrode located on an outer surface of the ceramic body, an electrode facing the internal chamber, and a solid electrolyte located therebetween; and a heater buried in the ceramic body; and a porous leading-end protective layer surrounding a first range at least including a leading end surface and a region to be coped with water-induced cracking specified in advance. A single heat insulating space is interposed between the leading-end protective layer and a whole side surface of the element base at least in the above region.

Abstract: A driving force transmitting apparatus includes first and second planetary gear units and switching and urging members. The first planetary gear unit includes a first mesh gear and a first locked gear provided with first locked portions. The second planetary gear unit includes a second locked gear provided with second locked portions, and a second mesh gear meshing with the first mesh gear. The switching member includes first and second locking portions and can move to (i) a first stop position at which the first locking portion stop the first locked gear, and, urged by the urging member, (ii) a second stop position at which the second locking portion stops the second locked gear. An interval between the second locked portions in a rotational direction of the second locked gear is larger than an interval between the first locked portions in a rotational direction of the first locked gear.

Abstract: A material for forming an adhesive film formed between a silicon-containing middle layer and a resist upper layer film, containing: (A) a resin having structural units shown by formula (1) and formula (2); (B) a thermal acid generator; and (C) an organic solvent, in the component (A), the structural unit shown by formula (1) having a molar fraction of 5% or more and the structural unit shown by formula (2) having a molar fraction of 30% or more. An objective is to provide a material for forming an adhesive film in a fine patterning process by a multilayer resist method in a semiconductor device manufacturing process, where the material gives an adhesive film that has high adhesiveness to a resist upper layer film, has an effect of suppressing fine pattern collapse, and also makes it possible to form an excellent pattern profile; a patterning process using the material.

Abstract: The present invention is a composition for forming a silicon-containing resist underlayer film, containing one or both of a hydrolysis product and a hydrolysis condensate of one or more silicon compounds (A-1) shown by the following general formula (1). This provides: a composition for forming a silicon-containing resist underlayer film with which it is possible to form a resist underlayer film having favorable adhesiveness to resist patterns regardless of whether in negative development or positive development, and also having favorable adhesiveness to finer patterns as in EUV photo-exposure; a patterning process; and a silicon compound.

Abstract: A composition for forming a silicon-containing resist underlayer film contains a compound shown by the following general formula (A-1) and a thermally crosslinkable polysiloxane. R1 represents a methyl group, an ethyl group, a propyl group, an allyl group, or a propargyl group. R2 represents a hydrogen atom, an acetyl group, an acryloyl group, a methacryloyl group, a benzoyl group, a naphthoyl group, or an anthranoyl group. R3 represents a methyl group, an ethyl group, a propyl group, an allyl group, a propargyl group, or a group shown by the following general formula (A-2), where a broken line represents a bonding arm, and R1 and R2 are as defined above. An object of the present invention is to provide a silicon-containing resist underlayer film capable of exhibiting high effect of suppressing ultrafine pattern collapse and forming a resist pattern with favorable pattern profile in multilayer resist methods.

Abstract: An image forming apparatus includes an apparatus body including a mounting portion, a drive transmission member provided on the apparatus body, and a cover portion configured to cover the drive transmission member. The mounting portion is configured to accommodate a cartridge including an input coupling portion and an input gear portion. The drive transmission member includes an output coupling portion configured to engage with the input coupling portion, and an output gear portion configured to engage with the input gear portion. The cover portion is located between the mounting portion and the drive transmission member and includes a first opening configured to expose the output coupling portion, and a second opening configured to expose the output gear portion.

Abstract: A driving force transmitting apparatus includes first and second planetary gear units and switching and urging members. The first planetary gear unit includes a first mesh gear and a first locked gear provided with first locked portions. The second planetary gear unit includes a second locked gear provided with second locked portions, and a second mesh gear meshing with the first mesh gear. The switching member includes first and second locking portions and can move to (i) a first stop position at which the first locking portion stop the first locked gear, and, urged by the urging member, (ii) a second stop position at which the second locking portion stops the second locked gear. An interval between the second locked portions in a rotational direction of the second locked gear is larger than an interval between the first locked portions in a rotational direction of the first locked gear.

Abstract: A driving device includes a motor including a rotating shaft, a drive transmission member attached to the rotating shaft and including a contact portion, and a drive output member including a contacted portion with which the contact portion comes into contact, and configured to be rotated around the rotating shaft when the rotating shaft of the motor is driven and the drive transmission member is rotated together with the rotation shaft in a first direction. The drive transmission member further includes an engaging portion. The drive output member includes an engaged portion with which the engaging portion is to be engaged when the drive output member is rotated relative to the drive transmission member in a second direction opposite to the first direction. A driving force is transmittable to the drive output member whether the drive transmission member is rotated in the first direction or the second direction.

Abstract: A driving device for driving a driven member includes a driving source; a driving gear fixed to a rotation shaft of the driving source; at least one gear for transmitting rotational motion of the driving gear to the driven member; a rotation detection gear engaged with the at least one gear; a detector for detecting rotation of the rotation detection gear; and a controller for detecting an angular speed and a rotational phase of the rotation detection gear on the basis of information from the detector and for controlling the rotational speed of the driving source such that a rotation period of the rotation detection gear is a non-integer multiple of a rotation period of the driving gear.

Abstract: An image forming apparatus includes an apparatus body including a mounting portion, a drive transmission member provided on the apparatus body, and a cover portion configured to cover the drive transmission member. The mounting portion is configured to accommodate a cartridge including an input coupling portion and an input gear portion. The drive transmission member includes an output coupling portion configured to engage with the input coupling portion, and an output gear portion configured to engage with the input gear portion. The cover portion is located between the mounting portion and the drive transmission member and includes a first opening configured to expose the output coupling portion, and a second opening configured to expose the output gear portion.

Abstract: A composition for forming a silicon-containing resist underlayer film contains at least one or more kinds of a quaternary ammonium salt shown by the following general formula (A-1), and a thermally crosslinkable polysiloxane (Sx), where Ar1 represents an aromatic group having 6 to 20 carbon atoms, or a heteroaromatic group having 4 to 20 carbon atoms. R11 represents an alkyl group, alkenyl group, oxoalkyl group, or oxoalkenyl group having 1 to 12 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aralkyl group or aryloxoalkyl group having 7 to 12 carbon atoms. Some or all of hydrogen atoms of these groups are optionally substituted. Z? represents an organic or inorganic anion as a counterion of the quaternary ammonium cation. An object is to provide a silicon-containing resist underlayer film having high effect of suppressing ultrafine pattern collapse and appropriate etching rate in multilayer resist methods.

Abstract: A driving device includes a motor including a rotating shaft, a drive transmission member attached to the rotating shaft and including a contact portion, and a drive output member including a contacted portion with which the contact portion comes into contact, and configured to be rotated around the rotating shaft when the rotating shaft of the motor is driven and the drive transmission member is rotated together with the rotation shaft in a first direction. The drive transmission member further includes an engaging portion. The drive output member includes an engaged portion with which the engaging portion is to be engaged when the drive output member is rotated relative to the drive transmission member in a second direction opposite to the first direction. A driving force is transmittable to the drive output member whether the drive transmission member is rotated in the first direction or the second direction.

Abstract: A driving device for driving a driving member includes a driving source; a driving gear fixed to a rotation shaft of the driving source; at least one gear for transmitting rotational motion of the driving gear to the driven member; a rotation detection gear engaged with the at least one gear; a detector for detecting rotation of the rotation detection gear; and a controller for detecting an angular speed and a rotational phase of the rotation detection gear on the basis of information from the detector and for controlling the rotational speed of the driving source such that a rotation period of the rotation detection gear is a non-integer multiple of a rotation period of the driving gear.

Abstract: Provided is a cathode material which becomes an alternative material of a cathode material formed of a W—ThO2 alloy and is formed of a tungsten alloy that does not include thorium which is a radioactive element. When particles of a rare earth oxide and tungsten carbide are finely dispersed in a tungsten cathode material used as a discharge cathode material used in TIG, plasma spraying, plasma cutting, electrical discharge machining, discharge lamps and the like, reduction and diffusion of the rare earth oxide are accelerated, and supply of rare earth elements to a cathode surface is ensured, thereby improving discharge characteristics.