Abstract: The present invention provides an imprint apparatus for performing an imprint process of forming a pattern of an imprint material in a plurality of shot regions on a substrate using a mold, including a control unit configured to perform a first operation of, while driving the substrate such that a target shot region in the plurality of shot regions is located at a first position facing the mold, supplying a gas such that an amount of the gas between the mold and the target shot region becomes a reference amount, and a second operation of, after the first operation, if an error that it is estimated that the amount of the gas supplied between the mold and the target shot region does not reach the reference amount is generated, performing a process corresponding to the error.

Abstract: The present invention provides an imprint apparatus for performing an imprint process of forming a pattern of an imprint material in a plurality of shot regions on a substrate using a mold, including a control unit configured to perform a first operation of, while driving the substrate such that a target shot region in the plurality of shot regions is located at a first position facing the mold, supplying a gas such that an amount of the gas between the mold and the target shot region becomes a reference amount, and a second operation of, after the first operation, if an error that it is estimated that the amount of the gas supplied between the mold and the target shot region does not reach the reference amount is generated, performing a process corresponding to the error.