Patents by Inventor Yusuke Kawasaki
Yusuke Kawasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12040111Abstract: A multilayer coil component includes an element body containing a plurality of metal magnetic particles and a resin existing between the plurality of metal magnetic particles and a coil disposed in the element body and configured to include a plurality of electrically interconnected coil conductors. At least one of the plurality of coil conductors has a spiral shape and has conductor portions adjacent to each other when viewed from a direction along a coil axis of the coil. The conductor portion includes a straight conductor portion extending in a straight line and a connecting conductor portion connecting the straight conductor portion and constituting a corner portion of the coil conductor. The metal magnetic particles between the connecting conductor portions adjacent to each other are lower in density than the metal magnetic particles between the straight conductor portions adjacent to each other.Type: GrantFiled: September 27, 2021Date of Patent: July 16, 2024Assignee: TDK CORPORATIONInventors: Yusuke Nagai, Takashi Suzuki, Kazuhiro Ebina, Kouichi Kakuda, Kunihiko Kawasaki, Shinichi Kondo, Shinichi Sato, Seiichi Nakagawa, Mitsuharu Koike, Kazuhiro Miura
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Patent number: 11897081Abstract: Provided are a polishing method that can be commonly applied to different types of silicon substrates varying in resistivity as well as a polishing composition set used in the polishing method. The silicon substrate polishing method provided by this invention comprises supplying a first polishing slurry S1 and a second polishing slurry S2 to a silicon substrate to be polished, switching them in this order midway through polishing the silicon substrate. The first polishing slurry S1 comprises an abrasive A1 and a water-soluble polymer P1. The polishing removal rate of the first polishing slurry S1 is higher than that of the second polishing slurry S2.Type: GrantFiled: February 13, 2017Date of Patent: February 13, 2024Assignee: FUJIMI INCORPORATEDInventors: Shinichiro Takami, Yusuke Kawasaki
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Patent number: 11767224Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.Type: GrantFiled: September 22, 2022Date of Patent: September 26, 2023Assignee: FUJIMI INCORPORATEDInventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
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Publication number: 20230100540Abstract: An object is to provide an electrode active material having a novel structure, said electrode active material enabling Li2S to be used as an electrode. The problem is solved by a solid solution with an antifluorite crystal structure comprising Li, Cu, and S as main constituents.Type: ApplicationFiled: March 3, 2021Publication date: March 30, 2023Inventors: Atsushi SAKUDA, Yusuke KAWASAKI, Akitoshi HAYASHI, Masahiro TATSUMISAGO
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Publication number: 20230056027Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.Type: ApplicationFiled: September 22, 2022Publication date: February 23, 2023Applicant: FUJIMI INCORPORATEDInventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
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Publication number: 20230016801Abstract: The surface-modified colloidal silica according to an aspect of the present invention contains colloidal silica, and a surface-modifying group for modifying a surface of the colloidal silica, which has a polyoxyalkylene chain having a weight average molecular weight of 20,000 or more.Type: ApplicationFiled: June 23, 2022Publication date: January 19, 2023Applicant: Fujimi IncorporatedInventors: Shogo Tsubota, Masaaki Ito, Keiji Ashitaka, Jun Shinoda, Yusuke Kawasaki
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Patent number: 11518682Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.Type: GrantFiled: March 13, 2020Date of Patent: December 6, 2022Assignee: FUJIMI INCORPORATEDInventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
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Publication number: 20210087067Abstract: There is provided a method for producing a silica sol including: a first step of adding an organic acid to at least one of liquid (A) containing an alkaline catalyst, water, and a first organic solvent and liquid (C) containing water; and a second step of mixing the liquid (A) with liquid (B) containing an alkoxysilane or its condensate and a second organic solvent, and the liquid (C) to make a reaction liquid after the first step.Type: ApplicationFiled: September 16, 2020Publication date: March 25, 2021Applicant: FUJIMI INCORPORATEDInventors: Keiji ASHITAKA, Yusuke KAWASAKI, Masaaki ITO, Jun SHINODA, Shogo TSUBOTA
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Publication number: 20200308009Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.Type: ApplicationFiled: March 13, 2020Publication date: October 1, 2020Applicant: FUJIMI INCORPORATEDInventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
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Publication number: 20190061095Abstract: Provided are a polishing method that can be commonly applied to different types of silicon substrates varying in resistivity as well as a polishing composition set used in the polishing method. The silicon substrate polishing method provided by this invention comprises supplying a first polishing slurry S1 and a second polishing slurry S2 to a silicon substrate to be polished, switching them in this order midway through polishing the silicon substrate. The first polishing slurry S1 comprises an abrasive A1 and a water-soluble polymer P1. The polishing removal rate of the first polishing slurry S1 is higher than that of the second polishing slurry S2.Type: ApplicationFiled: February 13, 2017Publication date: February 28, 2019Applicant: FUJIMI INCORPORATEDInventors: Shinichiro TAKAMI, Yusuke KAWASAKI
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Patent number: 10176348Abstract: A tag access apparatus accesses an RFID tag provided with a first antenna having a radio wave directivity along a longitudinal direction of a plurality of test tubes arranged at a predetermined interval. The tag access apparatus has a multi-filler helical antenna which is provided in a direction opposite to the radio wave directivity of the first antenna and which maintains an electric field strength at a central part of the multi-filler helical antenna at a level that allows access to the RFID tag, at the time of access to the RFID tag.Type: GrantFiled: May 29, 2014Date of Patent: January 8, 2019Assignee: FUJITSU FRONTECH LIMITEDInventor: Yusuke Kawasaki
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Patent number: 9819087Abstract: A planar antenna includes: first and second conductors each of which forms a microstrip line in combination with a ground electrode, and which are arranged in parallel with each other on a substrate; a plurality of first resonators disposed between the first conductor and the second conductor which electromagnetically couple the first conductor at one longitudinal end of each of the first resonators to generate electric fields which are in phase with each other; and at least one second resonator disposed between the first conductor and the second conductor which electromagnetically couples the second conductor at one longitudinal end of the at least one second resonator to generate an electric field which is in phase with the electric fields generated by the plurality of first resonators, wherein the at least one second resonator is arranged alternately with the plurality of first resonators.Type: GrantFiled: June 1, 2016Date of Patent: November 14, 2017Assignees: FUJITSU LIMITED, FUJITSU FRONTECH LIMITEDInventors: Takashi Yamagajo, Manabu Kai, Masahiko Shimizu, Yusuke Kawasaki
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Publication number: 20170005409Abstract: A planar antenna includes: first and second conductors each of which forms a microstrip line in combination with a ground electrode, and which are arranged in parallel with each other on a substrate; a plurality of first resonators disposed between the first conductor and the second conductor which electromagnetically couple the first conductor at one longitudinal end of each of the first resonators to generate electric fields which are in phase with each other; and at least one second resonator disposed between the first conductor and the second conductor which electromagnetically couples the second conductor at one longitudinal end of the at least one second resonator to generate an electric field which is in phase with the electric fields generated by the plurality of first resonators, wherein the at least one second resonator is arranged alternately with the plurality of first resonators.Type: ApplicationFiled: June 1, 2016Publication date: January 5, 2017Inventors: Takashi YAMAGAJO, Manabu KAI, Masahiko SHIMIZU, Yusuke KAWASAKI
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Publication number: 20140266628Abstract: A tag access apparatus accesses an RFID tag provided with a first antenna having a radio wave directivity along a longitudinal direction of a plurality of test tubes arranged at a predetermined interval. The tag access apparatus has a multi-filler helical antenna which is provided in a direction opposite to the radio wave directivity of the first antenna and which maintains an electric field strength at a central part of the multi-filler helical antenna at a level that allows access to the RFID tag, at the time of access to the RFID tag.Type: ApplicationFiled: May 29, 2014Publication date: September 18, 2014Applicant: FUJITSU FRONTECH LIMITEDInventor: Yusuke Kawasaki
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Patent number: 7657758Abstract: A processing apparatus including an internal circuit having a CPU and internal devices and an external circuit including external devices provided externally of the internal circuit, and the like, and is aimed to prevent illicit access and reverse engineering. The internal circuit including a CPU, internal devices and a bus line connecting the CPU to the internal devices and extending externally, and the external circuit including external devices provided externally of an externally extending portion of the bus line. The internal circuit further including a ciphering section 120 provided at an entrance to an external side and ciphering addresses and data on the bus line by ciphering patterns according to a plurality of regions divided from an address space allotted to the entire external devices.Type: GrantFiled: December 20, 2000Date of Patent: February 2, 2010Assignee: Fujitsu LimitedInventors: Yusuke Kawasaki, Hiroshi Sakurai, Shigeru Hashimoto, Koken Yamamoto
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Patent number: 7492812Abstract: An RFID transceiver device is capable of high sensitivity reception, by the reduction of noise, irrespective of the distance to the tag. The RFID transceiver device includes a delay circuit between a local oscillation circuit and a demodulation circuit, wherein the amount of delay of the delay circuit is set to a magnitude corresponding to the path difference between the path of leakage, via a duplexer into the demodulation circuit, of transmission signal output from the local oscillation circuit for transmission, and the path of direct input of the local oscillation signal from the local oscillation circuit to the demodulation circuit.Type: GrantFiled: August 24, 2005Date of Patent: February 17, 2009Assignee: Fujitsu LimitedInventors: Teruhisa Ninomiya, Yusuke Kawasaki, Osamu Kuroda, Yoshinori Tanaka
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Publication number: 20080032655Abstract: A wireless apparatus using the same carrier wave for transmission and reception is configured to store/hold, in a sample-hold circuit SH, a DC component generated by an interference wave, such as a carrier leakage, overlapped on a baseband signal demodulated by a demodulator DEM within a reception circuit of the apparatus, to remove the DC component, and to amplify a desired baseband signal at a high gain in a differential amplification circuit at the next stage.Type: ApplicationFiled: October 9, 2007Publication date: February 7, 2008Applicants: FUJITSU LIMITED, FUJITSU LIMITED FRONTECHInventors: Yusuke KAWASAKI, Teruhisa NINOMIYA
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Patent number: 7131427Abstract: A fuel injection device for supplying high-pressure fuel to an internal combustion engine includes a fuel supply pump, a first common rail and a second common rail. High-pressure fuel is directly supplied to the first common rail and then to the second common rail from the first common rail through a connecting passage having an orifice. The high-pressure fuel accumulated in the common rails is supplied to injectors and is injected into cylinders in a controlled manner. To suppress pressure wave propagation from the first common rail to the second common rail while providing an appropriate flow passage size, a passage diameter of the orifice is set to 0.9 mm–1.3 mm. In this manner, a pressure difference between the first common rail and the second common rail is minimized.Type: GrantFiled: November 12, 2004Date of Patent: November 7, 2006Assignee: Denso CorporationInventors: Yusuke Kawasaki, Ryo Suenaga, Mamoru Oki
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Publication number: 20060229032Abstract: An RFID transceiver device is capable of high sensitivity reception, by the reduction of noise, irrespective of the distance to the tag. The RFID transceiver device includes a delay circuit between a local oscillation circuit and a demodulation circuit, wherein the amount of delay of the delay circuit is set to a magnitude corresponding to the path difference between the path of leakage, via a duplexer into the demodulation circuit, of transmission signal output from the local oscillation circuit for transmission, and the path of direct input of the local oscillation signal from the local oscillation circuit to the demodulation circuit.Type: ApplicationFiled: August 24, 2005Publication date: October 12, 2006Inventors: Teruhisa Ninomiya, Yusuke Kawasaki, Osamu Kuroda, Yoshinori Tanaka
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Patent number: 7107377Abstract: An information processing apparatus includes a process part implementing an access to a designated address having an access level, an access detector detecting the access, and an access part being capable of changing the access level of the designated address when the access is detected by the access detector.Type: GrantFiled: March 12, 2002Date of Patent: September 12, 2006Assignee: Fujitsu LimitedInventors: Shimpei Komatsu, Yusuke Kawasaki