Patents by Inventor Yusuke Kawasaki

Yusuke Kawasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12040111
    Abstract: A multilayer coil component includes an element body containing a plurality of metal magnetic particles and a resin existing between the plurality of metal magnetic particles and a coil disposed in the element body and configured to include a plurality of electrically interconnected coil conductors. At least one of the plurality of coil conductors has a spiral shape and has conductor portions adjacent to each other when viewed from a direction along a coil axis of the coil. The conductor portion includes a straight conductor portion extending in a straight line and a connecting conductor portion connecting the straight conductor portion and constituting a corner portion of the coil conductor. The metal magnetic particles between the connecting conductor portions adjacent to each other are lower in density than the metal magnetic particles between the straight conductor portions adjacent to each other.
    Type: Grant
    Filed: September 27, 2021
    Date of Patent: July 16, 2024
    Assignee: TDK CORPORATION
    Inventors: Yusuke Nagai, Takashi Suzuki, Kazuhiro Ebina, Kouichi Kakuda, Kunihiko Kawasaki, Shinichi Kondo, Shinichi Sato, Seiichi Nakagawa, Mitsuharu Koike, Kazuhiro Miura
  • Patent number: 11897081
    Abstract: Provided are a polishing method that can be commonly applied to different types of silicon substrates varying in resistivity as well as a polishing composition set used in the polishing method. The silicon substrate polishing method provided by this invention comprises supplying a first polishing slurry S1 and a second polishing slurry S2 to a silicon substrate to be polished, switching them in this order midway through polishing the silicon substrate. The first polishing slurry S1 comprises an abrasive A1 and a water-soluble polymer P1. The polishing removal rate of the first polishing slurry S1 is higher than that of the second polishing slurry S2.
    Type: Grant
    Filed: February 13, 2017
    Date of Patent: February 13, 2024
    Assignee: FUJIMI INCORPORATED
    Inventors: Shinichiro Takami, Yusuke Kawasaki
  • Patent number: 11767224
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Grant
    Filed: September 22, 2022
    Date of Patent: September 26, 2023
    Assignee: FUJIMI INCORPORATED
    Inventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
  • Publication number: 20230100540
    Abstract: An object is to provide an electrode active material having a novel structure, said electrode active material enabling Li2S to be used as an electrode. The problem is solved by a solid solution with an antifluorite crystal structure comprising Li, Cu, and S as main constituents.
    Type: Application
    Filed: March 3, 2021
    Publication date: March 30, 2023
    Inventors: Atsushi SAKUDA, Yusuke KAWASAKI, Akitoshi HAYASHI, Masahiro TATSUMISAGO
  • Publication number: 20230056027
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Application
    Filed: September 22, 2022
    Publication date: February 23, 2023
    Applicant: FUJIMI INCORPORATED
    Inventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
  • Publication number: 20230016801
    Abstract: The surface-modified colloidal silica according to an aspect of the present invention contains colloidal silica, and a surface-modifying group for modifying a surface of the colloidal silica, which has a polyoxyalkylene chain having a weight average molecular weight of 20,000 or more.
    Type: Application
    Filed: June 23, 2022
    Publication date: January 19, 2023
    Applicant: Fujimi Incorporated
    Inventors: Shogo Tsubota, Masaaki Ito, Keiji Ashitaka, Jun Shinoda, Yusuke Kawasaki
  • Patent number: 11518682
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: December 6, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
  • Publication number: 20210087067
    Abstract: There is provided a method for producing a silica sol including: a first step of adding an organic acid to at least one of liquid (A) containing an alkaline catalyst, water, and a first organic solvent and liquid (C) containing water; and a second step of mixing the liquid (A) with liquid (B) containing an alkoxysilane or its condensate and a second organic solvent, and the liquid (C) to make a reaction liquid after the first step.
    Type: Application
    Filed: September 16, 2020
    Publication date: March 25, 2021
    Applicant: FUJIMI INCORPORATED
    Inventors: Keiji ASHITAKA, Yusuke KAWASAKI, Masaaki ITO, Jun SHINODA, Shogo TSUBOTA
  • Publication number: 20200308009
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Application
    Filed: March 13, 2020
    Publication date: October 1, 2020
    Applicant: FUJIMI INCORPORATED
    Inventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
  • Publication number: 20190061095
    Abstract: Provided are a polishing method that can be commonly applied to different types of silicon substrates varying in resistivity as well as a polishing composition set used in the polishing method. The silicon substrate polishing method provided by this invention comprises supplying a first polishing slurry S1 and a second polishing slurry S2 to a silicon substrate to be polished, switching them in this order midway through polishing the silicon substrate. The first polishing slurry S1 comprises an abrasive A1 and a water-soluble polymer P1. The polishing removal rate of the first polishing slurry S1 is higher than that of the second polishing slurry S2.
    Type: Application
    Filed: February 13, 2017
    Publication date: February 28, 2019
    Applicant: FUJIMI INCORPORATED
    Inventors: Shinichiro TAKAMI, Yusuke KAWASAKI
  • Patent number: 10176348
    Abstract: A tag access apparatus accesses an RFID tag provided with a first antenna having a radio wave directivity along a longitudinal direction of a plurality of test tubes arranged at a predetermined interval. The tag access apparatus has a multi-filler helical antenna which is provided in a direction opposite to the radio wave directivity of the first antenna and which maintains an electric field strength at a central part of the multi-filler helical antenna at a level that allows access to the RFID tag, at the time of access to the RFID tag.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: January 8, 2019
    Assignee: FUJITSU FRONTECH LIMITED
    Inventor: Yusuke Kawasaki
  • Patent number: 9819087
    Abstract: A planar antenna includes: first and second conductors each of which forms a microstrip line in combination with a ground electrode, and which are arranged in parallel with each other on a substrate; a plurality of first resonators disposed between the first conductor and the second conductor which electromagnetically couple the first conductor at one longitudinal end of each of the first resonators to generate electric fields which are in phase with each other; and at least one second resonator disposed between the first conductor and the second conductor which electromagnetically couples the second conductor at one longitudinal end of the at least one second resonator to generate an electric field which is in phase with the electric fields generated by the plurality of first resonators, wherein the at least one second resonator is arranged alternately with the plurality of first resonators.
    Type: Grant
    Filed: June 1, 2016
    Date of Patent: November 14, 2017
    Assignees: FUJITSU LIMITED, FUJITSU FRONTECH LIMITED
    Inventors: Takashi Yamagajo, Manabu Kai, Masahiko Shimizu, Yusuke Kawasaki
  • Publication number: 20170005409
    Abstract: A planar antenna includes: first and second conductors each of which forms a microstrip line in combination with a ground electrode, and which are arranged in parallel with each other on a substrate; a plurality of first resonators disposed between the first conductor and the second conductor which electromagnetically couple the first conductor at one longitudinal end of each of the first resonators to generate electric fields which are in phase with each other; and at least one second resonator disposed between the first conductor and the second conductor which electromagnetically couples the second conductor at one longitudinal end of the at least one second resonator to generate an electric field which is in phase with the electric fields generated by the plurality of first resonators, wherein the at least one second resonator is arranged alternately with the plurality of first resonators.
    Type: Application
    Filed: June 1, 2016
    Publication date: January 5, 2017
    Inventors: Takashi YAMAGAJO, Manabu KAI, Masahiko SHIMIZU, Yusuke KAWASAKI
  • Publication number: 20140266628
    Abstract: A tag access apparatus accesses an RFID tag provided with a first antenna having a radio wave directivity along a longitudinal direction of a plurality of test tubes arranged at a predetermined interval. The tag access apparatus has a multi-filler helical antenna which is provided in a direction opposite to the radio wave directivity of the first antenna and which maintains an electric field strength at a central part of the multi-filler helical antenna at a level that allows access to the RFID tag, at the time of access to the RFID tag.
    Type: Application
    Filed: May 29, 2014
    Publication date: September 18, 2014
    Applicant: FUJITSU FRONTECH LIMITED
    Inventor: Yusuke Kawasaki
  • Patent number: 7657758
    Abstract: A processing apparatus including an internal circuit having a CPU and internal devices and an external circuit including external devices provided externally of the internal circuit, and the like, and is aimed to prevent illicit access and reverse engineering. The internal circuit including a CPU, internal devices and a bus line connecting the CPU to the internal devices and extending externally, and the external circuit including external devices provided externally of an externally extending portion of the bus line. The internal circuit further including a ciphering section 120 provided at an entrance to an external side and ciphering addresses and data on the bus line by ciphering patterns according to a plurality of regions divided from an address space allotted to the entire external devices.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: February 2, 2010
    Assignee: Fujitsu Limited
    Inventors: Yusuke Kawasaki, Hiroshi Sakurai, Shigeru Hashimoto, Koken Yamamoto
  • Patent number: 7492812
    Abstract: An RFID transceiver device is capable of high sensitivity reception, by the reduction of noise, irrespective of the distance to the tag. The RFID transceiver device includes a delay circuit between a local oscillation circuit and a demodulation circuit, wherein the amount of delay of the delay circuit is set to a magnitude corresponding to the path difference between the path of leakage, via a duplexer into the demodulation circuit, of transmission signal output from the local oscillation circuit for transmission, and the path of direct input of the local oscillation signal from the local oscillation circuit to the demodulation circuit.
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: February 17, 2009
    Assignee: Fujitsu Limited
    Inventors: Teruhisa Ninomiya, Yusuke Kawasaki, Osamu Kuroda, Yoshinori Tanaka
  • Publication number: 20080032655
    Abstract: A wireless apparatus using the same carrier wave for transmission and reception is configured to store/hold, in a sample-hold circuit SH, a DC component generated by an interference wave, such as a carrier leakage, overlapped on a baseband signal demodulated by a demodulator DEM within a reception circuit of the apparatus, to remove the DC component, and to amplify a desired baseband signal at a high gain in a differential amplification circuit at the next stage.
    Type: Application
    Filed: October 9, 2007
    Publication date: February 7, 2008
    Applicants: FUJITSU LIMITED, FUJITSU LIMITED FRONTECH
    Inventors: Yusuke KAWASAKI, Teruhisa NINOMIYA
  • Patent number: 7131427
    Abstract: A fuel injection device for supplying high-pressure fuel to an internal combustion engine includes a fuel supply pump, a first common rail and a second common rail. High-pressure fuel is directly supplied to the first common rail and then to the second common rail from the first common rail through a connecting passage having an orifice. The high-pressure fuel accumulated in the common rails is supplied to injectors and is injected into cylinders in a controlled manner. To suppress pressure wave propagation from the first common rail to the second common rail while providing an appropriate flow passage size, a passage diameter of the orifice is set to 0.9 mm–1.3 mm. In this manner, a pressure difference between the first common rail and the second common rail is minimized.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: November 7, 2006
    Assignee: Denso Corporation
    Inventors: Yusuke Kawasaki, Ryo Suenaga, Mamoru Oki
  • Publication number: 20060229032
    Abstract: An RFID transceiver device is capable of high sensitivity reception, by the reduction of noise, irrespective of the distance to the tag. The RFID transceiver device includes a delay circuit between a local oscillation circuit and a demodulation circuit, wherein the amount of delay of the delay circuit is set to a magnitude corresponding to the path difference between the path of leakage, via a duplexer into the demodulation circuit, of transmission signal output from the local oscillation circuit for transmission, and the path of direct input of the local oscillation signal from the local oscillation circuit to the demodulation circuit.
    Type: Application
    Filed: August 24, 2005
    Publication date: October 12, 2006
    Inventors: Teruhisa Ninomiya, Yusuke Kawasaki, Osamu Kuroda, Yoshinori Tanaka
  • Patent number: 7107377
    Abstract: An information processing apparatus includes a process part implementing an access to a designated address having an access level, an access detector detecting the access, and an access part being capable of changing the access level of the designated address when the access is detected by the access detector.
    Type: Grant
    Filed: March 12, 2002
    Date of Patent: September 12, 2006
    Assignee: Fujitsu Limited
    Inventors: Shimpei Komatsu, Yusuke Kawasaki