Patents by Inventor Yusuke Kawasaki

Yusuke Kawasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11948472
    Abstract: A popularity estimation device includes: an acquisition unit configured to acquire a first map image including a first particular point and to acquire a plurality of second map images including a second particular point which is a particular point; a generation unit configured to generate a first feature vector and a second feature vector by inputting the first map image and the second map images to a geographical feature generation model with a map image as an input and with a feature vector indicating geographical features of the map image as an output; a score calculating unit configured to calculate a popularity score of the first particular point from a popularity score of the second particular point based on a degree of similarity between the first feature vector and the second feature vector; and an output unit configured to output the popularity score of the first particular point.
    Type: Grant
    Filed: July 22, 2020
    Date of Patent: April 2, 2024
    Assignee: NTT DOCOMO, INC.
    Inventors: Anna Oonishi, Satoshi Kawasaki, Yusuke Fukazawa
  • Patent number: 11935784
    Abstract: A vertical layer stack including a bit-line-level dielectric layer and an etch stop dielectric layer can be formed over an array region. Bit-line trenches are formed through the vertical layer stack. Bit-line-trench fill structures are formed in the bit-line trenches. Each of the bit-line-trench fill structures includes a stack of a bit line and a capping dielectric strip. At least one via-level dielectric layer can be formed over the vertical layer stack. A bit-line-contact via cavity can be formed through the at least one via-level dielectric layer and one of the capping dielectric strips. A bit-line-contact via structure formed in the bit-line-contact via cavity includes a stepped bottom surface including a top surface of one of the bit lines, a sidewall segment of the etch stop dielectric layer, and a segment of a top surface of the etch stop dielectric layer.
    Type: Grant
    Filed: June 11, 2021
    Date of Patent: March 19, 2024
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Fumitaka Amano, Yusuke Osawa, Kensuke Ishikawa, Mitsuteru Mushiga, Motoki Kawasaki, Shinsuke Yada, Masato Miyamoto, Syo Fukata, Takashi Kashimura, Shigehiro Fujino
  • Publication number: 20240083692
    Abstract: A component supply control system includes a state recognition section configured to derive a supply state of a component for each of multiple areas set in advance in a supply region based on image data acquired by imaging the supply region in a state in which a bulk feeder has conveyed multiple components to the supply region by vibration, and a conveyance control section configured to control a conveyance operation of the components in the bulk feeder based on the supply state for each of the multiple areas.
    Type: Application
    Filed: January 29, 2021
    Publication date: March 14, 2024
    Applicant: FUJI CORPORATION
    Inventors: Yuji KAWASAKI, Masayoshi MORIYAMA, Yusuke YAMAZAKI
  • Publication number: 20240075743
    Abstract: A water-based maintenance liquid is used for a recording apparatus, the recording apparatus is an apparatus to perform recording by ejecting at least two types of water-based ink compositions from an ink jet head, the ink jet head has a nozzle surface in which nozzles to eject the water-based ink compositions are formed, the nozzles are formed in the nozzle surface respectively for the at least two types of water-based ink compositions, the maintenance liquid is used to moisturize the nozzle surface by being supplied to a cap portion which covers the nozzle surface and includes water and a moisturizing agent component which contains at least one type of moisturizing agent, the moisturizing agent component is a water-soluble organic compound, and a content A (percent by mass) of the moisturizing agent component with respect to a total mass of the moisturizing agent component and the water satisfies a predetermined equation.
    Type: Application
    Filed: August 30, 2023
    Publication date: March 7, 2024
    Inventors: Miki UCHIDA, Yusuke MIZUTAKI, Yuko HISHIDA, Hiromichi TAKANASHI, Tomohiro KAWASAKI
  • Publication number: 20240076133
    Abstract: A bulk feeder includes a feeder main body, a receiving member provided on the feeder main body and formed with a receiving region configured to receive a component discharged from a component case accommodating multiple components, a track member provided to be vibratable with respect to the feeder main body and formed with a conveyance path through which the multiple components are conveyed and a supply region that communicates with the conveyance path and opens upward to collect the multiple components, an excitation device configured to apply vibration to the track member so that the multiple components are conveyed along the conveyance path, and a connection member having flexibility and configured to connect between the receiving region and the conveyance path so that the multiple components flows through.
    Type: Application
    Filed: January 29, 2021
    Publication date: March 7, 2024
    Applicant: FUJI CORPORATION
    Inventors: Yusuke YAMAZAKI, Hideyuki HASEGAWA, Yuji KAWASAKI
  • Publication number: 20240076136
    Abstract: A bulk feeder includes a feeder main body, a track member provided to be vibratable with respect to the feeder main body and formed with a conveyance path through which multiple components are conveyed and a supply region that communicates with the conveyance path and opens upward to collect the multiple components, an excitation device configured to apply vibration to the track member so that the multiple components are conveyed along the conveyance path, a shutter provided above the track member to close an opening of the supply region, and a driving device configured to open or close the shutter to separate the shutter from the track member when the shutter shifts from a closed state to an open state.
    Type: Application
    Filed: January 29, 2021
    Publication date: March 7, 2024
    Applicant: FUJI CORPORATION
    Inventors: Yusuke YAMAZAKI, Yuji KAWASAKI
  • Publication number: 20240076134
    Abstract: A bulk feeder includes a feeder main body, a track member provided vibratably with respect to the feeder main body and formed with a conveyance path through which multiple components are conveyed, an excitation device configured to apply vibration to the track member so that the multiple components are conveyed along the conveyance path, and a vibration sensor configured to detect a vibration value indicating a vibration state of the track member that vibrates by the excitation of the excitation device.
    Type: Application
    Filed: January 29, 2021
    Publication date: March 7, 2024
    Applicant: FUJI CORPORATION
    Inventors: Yusuke YAMAZAKI, Toshihiro NONOMURA, Yuji KAWASAKI
  • Publication number: 20240066874
    Abstract: A maintenance liquid is used to maintain an ink jet head of a printing apparatus configured to eject an ink for printing from the ink jet head. The maintenance liquid is aqueous and subject to detection by a conductivity-based sensor. The maintenance liquid includes at least one selected from the group consisting of inorganic alkalis and ethylenediaminetetraacetic acid compounds and at least one selected from the group consisting of organic acids and organic alkalis. The maintenance liquid has an electrical conductivity of 100 ?S/cm or more and a pH of 6.0 to 11.
    Type: Application
    Filed: August 28, 2023
    Publication date: February 29, 2024
    Inventors: Yuko HISHIDA, Miki UCHIDA, Yusuke MIZUTAKI, Hiromichi TAKANASHI, Tomohiro KAWASAKI
  • Patent number: 11914601
    Abstract: Provided is a re-ranking device that enables a re-ranking process with less possibility of decrease in accuracy due to shortage of data. A re-ranking device 100 includes an input unit 101 that receives a search query from one user, a re-ranking model storage unit 106 that stores a plurality of re-ranking models prepared in accordance with common information of a plurality of users, a search unit 102 that performs a search on the basis of the search query and obtains a search result, and a re-ranking processing unit 107 that selects one re-ranking model on the basis of common information of the one user and performs a re-ranking process on the search result using the one re-ranking model.
    Type: Grant
    Filed: August 7, 2020
    Date of Patent: February 27, 2024
    Assignee: NTT DOCOMO, INC.
    Inventors: Anna Oonishi, Satoshi Kawasaki, Yusuke Fukazawa
  • Patent number: 11914119
    Abstract: An ultraviolet optical system includes an objective lens group that captures ultraviolet light for each angle from an ultraviolet light source and forms an intermediate image, and an imaging lens group that re-images the intermediate image. Neither the objective lens group nor the imaging lens group has a cemented surface, and all lenses included in the objective lens group and in the imaging lens group are single lenses that transmit ultraviolet light having a wavelength of 300 nm or shorter. A light distribution measuring apparatus includes the ultraviolet optical system and a sensor, and outputs light distribution of the ultraviolet light source by using a signal obtained by the sensor. The ultraviolet optical system is positioned such that the intermediate image is re-imaged on a light receiving sensor surface, and the sensor has light receiving sensitivity to ultraviolet light having a wavelength of 300 nm or shorter.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: February 27, 2024
    Assignee: KONICA MINOLTA, INC.
    Inventors: Yusuke Hirao, Takashi Kawasaki
  • Patent number: 11897081
    Abstract: Provided are a polishing method that can be commonly applied to different types of silicon substrates varying in resistivity as well as a polishing composition set used in the polishing method. The silicon substrate polishing method provided by this invention comprises supplying a first polishing slurry S1 and a second polishing slurry S2 to a silicon substrate to be polished, switching them in this order midway through polishing the silicon substrate. The first polishing slurry S1 comprises an abrasive A1 and a water-soluble polymer P1. The polishing removal rate of the first polishing slurry S1 is higher than that of the second polishing slurry S2.
    Type: Grant
    Filed: February 13, 2017
    Date of Patent: February 13, 2024
    Assignee: FUJIMI INCORPORATED
    Inventors: Shinichiro Takami, Yusuke Kawasaki
  • Patent number: 11767224
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Grant
    Filed: September 22, 2022
    Date of Patent: September 26, 2023
    Assignee: FUJIMI INCORPORATED
    Inventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
  • Publication number: 20230100540
    Abstract: An object is to provide an electrode active material having a novel structure, said electrode active material enabling Li2S to be used as an electrode. The problem is solved by a solid solution with an antifluorite crystal structure comprising Li, Cu, and S as main constituents.
    Type: Application
    Filed: March 3, 2021
    Publication date: March 30, 2023
    Inventors: Atsushi SAKUDA, Yusuke KAWASAKI, Akitoshi HAYASHI, Masahiro TATSUMISAGO
  • Publication number: 20230056027
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Application
    Filed: September 22, 2022
    Publication date: February 23, 2023
    Applicant: FUJIMI INCORPORATED
    Inventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
  • Publication number: 20230016801
    Abstract: The surface-modified colloidal silica according to an aspect of the present invention contains colloidal silica, and a surface-modifying group for modifying a surface of the colloidal silica, which has a polyoxyalkylene chain having a weight average molecular weight of 20,000 or more.
    Type: Application
    Filed: June 23, 2022
    Publication date: January 19, 2023
    Applicant: Fujimi Incorporated
    Inventors: Shogo Tsubota, Masaaki Ito, Keiji Ashitaka, Jun Shinoda, Yusuke Kawasaki
  • Patent number: 11518682
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: December 6, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
  • Publication number: 20210087067
    Abstract: There is provided a method for producing a silica sol including: a first step of adding an organic acid to at least one of liquid (A) containing an alkaline catalyst, water, and a first organic solvent and liquid (C) containing water; and a second step of mixing the liquid (A) with liquid (B) containing an alkoxysilane or its condensate and a second organic solvent, and the liquid (C) to make a reaction liquid after the first step.
    Type: Application
    Filed: September 16, 2020
    Publication date: March 25, 2021
    Applicant: FUJIMI INCORPORATED
    Inventors: Keiji ASHITAKA, Yusuke KAWASAKI, Masaaki ITO, Jun SHINODA, Shogo TSUBOTA
  • Publication number: 20200308009
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Application
    Filed: March 13, 2020
    Publication date: October 1, 2020
    Applicant: FUJIMI INCORPORATED
    Inventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
  • Publication number: 20190061095
    Abstract: Provided are a polishing method that can be commonly applied to different types of silicon substrates varying in resistivity as well as a polishing composition set used in the polishing method. The silicon substrate polishing method provided by this invention comprises supplying a first polishing slurry S1 and a second polishing slurry S2 to a silicon substrate to be polished, switching them in this order midway through polishing the silicon substrate. The first polishing slurry S1 comprises an abrasive A1 and a water-soluble polymer P1. The polishing removal rate of the first polishing slurry S1 is higher than that of the second polishing slurry S2.
    Type: Application
    Filed: February 13, 2017
    Publication date: February 28, 2019
    Applicant: FUJIMI INCORPORATED
    Inventors: Shinichiro TAKAMI, Yusuke KAWASAKI
  • Patent number: 10176348
    Abstract: A tag access apparatus accesses an RFID tag provided with a first antenna having a radio wave directivity along a longitudinal direction of a plurality of test tubes arranged at a predetermined interval. The tag access apparatus has a multi-filler helical antenna which is provided in a direction opposite to the radio wave directivity of the first antenna and which maintains an electric field strength at a central part of the multi-filler helical antenna at a level that allows access to the RFID tag, at the time of access to the RFID tag.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: January 8, 2019
    Assignee: FUJITSU FRONTECH LIMITED
    Inventor: Yusuke Kawasaki