Patents by Inventor Yusuke KOMORI

Yusuke KOMORI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240248396
    Abstract: An object of the present invention is to provide a xanthene compound having high heat resistance and capable of shielding light up to a long-wavelength region of visible light as compared to a conventional xanthene compound. In order to solve the above problem, a xanthene compound (b) of the present invention is a xanthene compound (b) represented by Formula (1).
    Type: Application
    Filed: July 29, 2022
    Publication date: July 25, 2024
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Yusuke KOMORI, Hiroki NISHIOKA, Kazuto MIYOSHI
  • Patent number: 11953830
    Abstract: The present invention addresses the problem of providing a photosensitive resin composition which exhibits good imidization rate even in cases where the photosensitive resin composition is fired at a temperature of 200° C. or less, while having high pattern processability, and a cured film of which exhibits high long-term reliability if used in an organic EL display device. In order to solve the above-described problem, a photosensitive resin composition according to the present invention contains (a) a polyimide precursor, (b) a phenolic compound having an electron-withdrawing group and (c) a photosensitive compound; and the polyimide precursor (a) has a residue which is derived from a diamine that has an ionization potential of less than 7.1 eV.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: April 9, 2024
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Yusuke Komori, Takashi Sumi, Kazuto Miyoshi
  • Patent number: 11852973
    Abstract: The present invention relates to a photosensitive resin composition having high sensitivity, high bending resistance for the cured film, and high long-term reliability for an organic EL display device in which the cured film is used. The present invention is a photosensitive resin composition containing an alkali-soluble resin (a), a phenolic resin (b) having a halogen atom, and a photosensitive compound (c).
    Type: Grant
    Filed: September 4, 2019
    Date of Patent: December 26, 2023
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Yusuke Komori, Kazuto Miyoshi
  • Publication number: 20230098085
    Abstract: An object of the present invention is to provide an organic EL display device which does not undergo the decrease in luminance or pixel shrinkage and has excellent long-term reliability. The present invention is an organic EL display device constituting a cured product of a photosensitive resin composition containing an alkali-soluble resin (A) and a naphthoquinone diazide sulfonic acid ester compound (B), wherein an intensity ratio I(S)/I(TOTAL) is 0.0001 or more and 0.008 or less, where I(S) is a negative secondary ion intensity of sulfur, and I(TOTAL) is a sum total of negative secondary ion intensities of carbon, oxygen, fluorine, silicon and sulfur obtained by time-of-flight secondary ion mass spectrometry of the cured product. Alternatively, the present invention is a method for producing the cured product.
    Type: Application
    Filed: February 8, 2021
    Publication date: March 30, 2023
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Satoshi KAMEMOTO, Yusuke KOMORI, Kazuto MIYOSHI
  • Patent number: 11512199
    Abstract: The present invention provides a resin composition which is highly sensitive and exhibits high chemical resistance even in the case of being baked at a low temperature of 250° C. or less and can suppress the generation of outgas after curing. The present invention is a resin composition which contains (a) an alkali-soluble resin containing polyimide, polybenzoxazole, polyamide-imide, a precursor of any one of these compounds and/or a copolymer of these compounds and (b) an alkali-soluble resin having a monovalent or divalent group represented by the following general formula (1) in a structural unit and in which the modification rate of a phenolic hydroxyl group in the alkali-soluble resin (b) is 5% to 50%. (In general formula (1), O represents an oxygen atom. R1 represents a hydrogen atom or a hydrocarbon group which has 1 to 20 carbon atoms and may be substituted and R2 represents an alkyl group having 1 to 5 carbon atoms. s and t each independently represent an integer from 0 to 3.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: November 29, 2022
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Yusuke Komori, Kazuto Miyoshi
  • Publication number: 20220155680
    Abstract: The present invention addresses the problem of providing a photosensitive resin composition which exhibits good imidization rate even in cases where the photosensitive resin composition is fired at a temperature of 200° C. or less, while having high pattern processability, and a cured film of which exhibits high long-term reliability if used in an organic EL display device. In order to solve the above-described problem, a photosensitive resin composition according to the present invention contains (a) a polyimide precursor, (b) a phenolic compound having an electron-withdrawing group and (c) a photosensitive compound; and the polyimide precursor (a) has a residue which is derived from a diamine that has an ionization potential of less than 7.1 eV.
    Type: Application
    Filed: March 4, 2020
    Publication date: May 19, 2022
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Yusuke KOMORI, Takashi SUMI, Kazuto MIYOSHI
  • Patent number: 11199776
    Abstract: The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate.
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: December 14, 2021
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Yusuke Komori, Kazuto Miyoshi
  • Publication number: 20210332166
    Abstract: The present invention relates to a photosensitive resin composition having high sensitivity, high bending resistance for the cured film, and high long-term reliability for an organic EL display device in which the cured film is used. The present invention is a photosensitive resin composition containing an alkali-soluble resin (a), a phenolic resin (b) having a halogen atom, and a photosensitive compound (c).
    Type: Application
    Filed: September 4, 2019
    Publication date: October 28, 2021
    Applicant: TORAY Industries, Inc.
    Inventors: Yusuke KOMORI, Kazuto MIYOSHI
  • Publication number: 20210284839
    Abstract: The present invention provides a resin composition which is highly sensitive and exhibits high chemical resistance even in the case of being baked at a low temperature of 250° C. or less and can suppress the generation of outgas after curing. The present invention is a resin composition which contains (a) an alkali-soluble resin containing polyimide, polybenzoxazole, polyamide-imide, a precursor of any one of these compounds and/or a copolymer of these compounds and (b) an alkali-soluble resin having a monovalent or divalent group represented by the following general formula (1) in a structural unit and in which the modification rate of a phenolic hydroxyl group in the alkali-soluble resin (b) is 5% to 50%. (In general formula (1), O represents an oxygen atom. R1 represents a hydrogen atom or a hydrocarbon group which has 1 to 20 carbon atoms and may be substituted and R2 represents an alkyl group having 1 to 5 carbon atoms. s and t each independently represent an integer from 0 to 3.
    Type: Application
    Filed: October 31, 2017
    Publication date: September 16, 2021
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Yusuke KOMORI, Kazuto MIYOSHI
  • Publication number: 20190241716
    Abstract: The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate.
    Type: Application
    Filed: July 25, 2017
    Publication date: August 8, 2019
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Yusuke KOMORI, Kazuto MIYOSHI
  • Patent number: 10199548
    Abstract: The purpose of the present invention is to provide a photosensitive resin composition for thin film transistors, a cured film of which generates an extremely small amount of an outgas, and which is capable of forming an insulating layer for thin film transistors having excellent drive performance. In order to achieve the above-described purpose, the present invention has the configuration described below. Namely, a photosensitive resin composition for thin film transistors, which contains (A) an alkali-soluble resin having an amide group and/or an imide group, (B) a photosensitive compound and (C) organic solvents, and wherein the content of an organic solvent having nitrogen atoms in the organic solvents (C) is 1% by mass or less relative to the total mass of the organic solvents.
    Type: Grant
    Filed: March 16, 2016
    Date of Patent: February 5, 2019
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Satoshi Kamemoto, Yusuke Komori, Kazuto Miyoshi
  • Patent number: 9897915
    Abstract: The present invention provides a photosensitive resin composition which uses a polyimide precursor that has excellent solubility in organic solvents and is capable of reducing the viscosity of a resin composition obtained therefrom. The solution according to the present invention is a photosensitive resin composition which contains: an aromatic amide resin that has, as a main repeating unit, a specific structure having an amide group, a trifluoromethyl group and an aromatic ring; (b) a sensitizer; and (c) a solvent.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: February 20, 2018
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Yusuke Komori, Mika Koshino, Kazuto Miyoshi
  • Publication number: 20180017867
    Abstract: The purpose of the present invention is to provide a photosensitive resin composition for thin film transistors, a cured film of which generates an extremely small amount of an outgas, and which is capable of forming an insulating layer for thin film transistors having excellent drive performance. In order to achieve the above-described purpose, the present invention has the configuration described below. Namely, a photosensitive resin composition for thin film transistors, which contains (A) an alkali-soluble resin having an amide group and/or an imide group, (B) a photosensitive compound and (C) organic solvents, and wherein the content of an organic solvent having nitrogen atoms in the organic solvents (C) is 1% by mass or less relative to the total mass of the organic solvents.
    Type: Application
    Filed: March 16, 2016
    Publication date: January 18, 2018
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Satoshi KAMEMOTO, Yusuke KOMORI, Kazuto MIYOSHI
  • Publication number: 20170334837
    Abstract: Provided are a photosensitive resin composition which has excellent pattern processabilities (high sensitivity and high resolution) and is excellent in chemical resistance and thermal resistance after thermally treated; a heat-resistant resin or heat-resistant resin precursor used for the composition; and a diamine compound which is a raw material of the resin and the precursor. The diamine compound is a diamine compound represented by a general formula (1).
    Type: Application
    Filed: August 7, 2017
    Publication date: November 23, 2017
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Yusuke KOMORI, Satoshi KAMEMOTO, Kazuto MIYOSHI
  • Publication number: 20150301453
    Abstract: The present invention provides a photosensitive resin composition which uses a polyimide precursor that has excellent solubility in organic solvents and is capable of reducing the viscosity of a resin composition obtained therefrom. The solution according to the present invention is a photosensitive resin composition which contains: an aromatic amide resin that has, as a main repeating unit, a specific structure having an amide group, a trifluoromethyl group and an aromatic ring; (b) a sensitizer; and (c) a solvent.
    Type: Application
    Filed: December 13, 2013
    Publication date: October 22, 2015
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Yusuke KOMORI, Mika KOSHINO, Kazuto MIYOSHI