Abstract: Provided is fine fibrous cellulose capable of enhancing transparency and suppressing coloring, when the fine fibrous cellulose is processed into a dispersed solution or a sheet. Also provided are fine fibrous cellulose, in which the amount of substituents introduced is less than 0.5 mmol/g and the fiber width is 1 to 10 nm, a dispersed solution and a sheet, each of which comprises fine fibrous cellulose. Furthermore, provided is a method for producing fine fibrous cellulose, comprising: (A) removing at least a part of substituents from fine fibrous cellulose with a fiber width of 1000 nm or less having the substituents, and (B) performing a uniform dispersion treatment on the resulting fine fibrous cellulose after completion of the (A).

Abstract: Provided is a semiconductor element including: a multilayer structure including: a conductive substrate; and an oxide semiconductor film arranged directly on the conductive substrate or over the conductive substrate via a different layer, the oxide semiconductor film including an oxide, as a major component, containing gallium, the conductive substrate having a larger area than the oxide semiconductor film.

Abstract: It is an object of the present invention to provide fine fibrous cellulose capable of enhancing transparency and suppressing coloring, when the fine fibrous cellulose are processed into a dispersed solution or a sheet. The present invention relates to fine fibrous cellulose, in which the amount of substituents introduced is less than 0.5 mmol/g and the fiber width is 1 to 10 nm. Moreover, the present invention relates to a dispersed solution and a sheet, each of which comprises fine fibrous cellulose. Furthermore, the present invention relates to a method for producing fine fibrous cellulose, comprising: (A) removing at least a part of substituents from fine fibrous cellulose with a fiber width of 1000 nm or less having the substituents, and (B) performing a uniform dispersion treatment on the resulting fine fibrous cellulose after completion of the (A).

Abstract: Provided is a semiconductor element including: a multilayer structure including: a conductive substrate; and an oxide semiconductor film arranged directly on the conductive substrate or over the conductive substrate via a different layer, the oxide semiconductor film including an oxide, as a major component, having a corundum structure, the conductive substrate having a larger area than the oxide semiconductor film.

Abstract: Provided is a semiconductor element including: a multilayer structure including: a conductive substrate; and an oxide semiconductor film arranged directly on the conductive substrate or over the conductive substrate via a different layer, the oxide semiconductor film including an oxide, as a major component, having a corundum structure, the conductive substrate having a larger area than the oxide semiconductor film.

Abstract: Provided a semiconductor device including: a semiconductor layer with an extended depletion layer; and an electrode disposed on the semiconductor layer directly or via another layer, the semiconductor layer including a first region containing, as a major component, a crystalline oxide semiconductor containing gallium, and a second region containing, as a major component, an oxide containing gallium, the second region including a linear crystal defect region in a cross section perpendicular to an upper surface of the semiconductor layer.

Abstract: Provided a semiconductor device including: a semiconductor layer; and an electrode disposed on the semiconductor layer directly or via another layer, the semiconductor layer including a first region containing, as a major component, a crystalline oxide semiconductor containing gallium, and a second region containing, as a major component, an oxide containing gallium, the second region and the first region each containing an impurity element, a maximum value of a concentration of the impurity element in the second region being located at a depth of 1.0 ?m or more from an upper surface of the semiconductor layer and being greater than a maximum value of a concentration of the impurity element in the first region.

Abstract: Provided are a multilayer structure in which crystal defects due to stress concentration in a semiconductor layer caused by an insulator film are prevented and a semiconductor device using the multilayer structure, the multilayer structure and the semiconductor device that are particularly useful for power devices. A multilayer structure in which an insulator film is arranged on a part of a semiconductor film, wherein the semiconductor film has a corundum structure and contains a crystalline oxide semiconductor containing one or two or more metals selected from groups 9 and 13 of the periodic table, and wherein the insulator film has a taper angle of 20° or less.

Abstract: Provided is a semiconductor element including at least, a semiconductor layer including a crystalline oxide semiconductor as a major component; an electrode layer laminated on the semiconductor layer; and a conductive substrate laminated on the electrode layer directly or with another layer in between, the conductive substrate containing at least a first metal selected from the metals in group 11 in the periodic table and a second metal different from the first metal in coefficient of liner thermal expansion.

Abstract: Provided is a power conversion circuit and a control system in which radiated noise of the entire circuit is reduced. A power conversion circuit including at least: a switching element (e.g. a MOSFET, etc.) and a diode (e.g. a commutating diode, etc.): wherein the power conversion circuit is a single-switch power conversion; and the diode is a gallium oxide-based Schottky barrier diode.

Abstract: Provided is a semiconductor device including, a plurality of PN junction diodes each having a negative temperature characteristic and connected to each other in series; a Schottky barrier diode having a positive temperature characteristic and connected to the PN junction diodes in parallel; and a die pad on which at least one of the PN junction diodes and the Schottky barrier diode are mounted commonly.

Abstract: It is an object of the present invention to provide fine fibrous cellulose capable of enhancing transparency and suppressing coloring, when the fine fibrous cellulose are processed into a dispersed solution or a sheet. The present invention relates to fine fibrous cellulose, in which the amount of substituents introduced is less than 0.5 mmol/g and the fiber width is 1 to 10 nm. Moreover, the present invention relates to a dispersed solution and a sheet, each of which comprises fine fibrous cellulose. Furthermore, the present invention relates to a method for producing fine fibrous cellulose, comprising: (A) removing at least a part of substituents from fine fibrous cellulose with a fiber width of 1000 nm or less having the substituents, and (B) performing a uniform dispersion treatment on the resulting fine fibrous cellulose after completion of the (A).

Abstract: Provided is a semiconductor device including, a plurality of PN junction diodes each having a negative temperature characteristic and connected to each other in series; a plurality of resistance elements connected respectively to the PN junction diodes in parallel and connected to each other in series; and a Schottky barrier diode having a positive temperature characteristic and connected to the PN junction diodes in parallel.

Abstract: Provided is a power conversion circuit including at least: a switching element that opens and closes an inputted voltage via a reactor; and a commutating diode that passes a current in a direction of an electromotive force by a voltage including at least the electromotive force generated from the reactor when the switching element is turned off, the commutating diode including a gallium oxide-based Schottky barrier diode.

Abstract: Provided is a semiconductor element including: a multilayer structure including: a conductive substrate; and an oxide semiconductor film arranged directly on the conductive substrate or over the conductive substrate via a different layer, the oxide semiconductor film including an oxide, as a major component, having a corundum structure, the conductive substrate having a larger area than the oxide semiconductor film.

Abstract: Provided is a semiconductor element including: a multilayer structure including: a conductive substrate; and an oxide semiconductor film arranged directly on the conductive substrate or over the conductive substrate via a different layer, the oxide semiconductor film including an oxide, as a major component, containing gallium, the conductive substrate having a larger area than the oxide semiconductor film.

Abstract: An object of the disclosure is to provide a semiconductor device with low-loss and suppressed leakage current, which is particularly useful for power devices. A semiconductor device including a semiconductor layer, a dielectric film provided on the semiconductor layer and having an opening and provided over a distance of at least 0.25 ?m from the opening, and an electrode layer provided over a part or all of the dielectric film from the inside of the opening, wherein the dielectric film has a thickness of less than 50 nm from the opening to a distance of 0.25 ?m, and has relative permittivity of 5 or less.

Abstract: Provided is a semiconductor element including; a semiconductor film; and a porous layer disposed on a first surface side of the semiconductor film or a second surface side opposite from the first surface side, a porosity of the porous layer being no more than 10%.

Abstract: Provided is a semiconductor device in which crystal defects due to stress concentration in a semiconductor layer caused by an insulator film are prevented, the semiconductor device that is particularly useful for power devices. A semiconductor device including at least: a semiconductor layer; a Schottky electrode; and an insulator layer provided between a part of the semiconductor layer and the Schottky electrode, wherein the semiconductor layer contains a crystalline oxide semiconductor, and wherein the insulator layer has a taper angle of 10° or less.

Abstract: Provided are a multilayer structure in which crystal defects due to stress concentration in a semiconductor layer caused by an insulator film are prevented and a semiconductor device using the multilayer structure, the multilayer structure and the semiconductor device that are particularly useful for power devices. A multilayer structure in which an insulator film is arranged on a part of a semiconductor film, wherein the semiconductor film has a corundum structure and contains a crystalline oxide semiconductor containing one or two or more metals selected from groups 9 and 13 of the periodic table, and wherein the insulator film has a taper angle of 20° or less.