Patents by Inventor Yusuke NAGATO

Yusuke NAGATO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240092061
    Abstract: A joined article including: a resin (1) having a linear expansion coefficient at 30° C. to 200° C. of 17 ppm/° C. or higher and a thickness of 5 to 100 ?m; and a metal joined to a surface of the resin (1) and having a thickness of 5 to 50 ?m. The resin (1) includes a heat-affected layer that is close to the metal and that occupies 80% or less of the thickness of the resin (1), and the joined article is a dielectric material for a substrate. Also disclosed is a substrate including the joined article and a resin (2) stacked on the joined article.
    Type: Application
    Filed: October 27, 2023
    Publication date: March 21, 2024
    Applicants: THE UNIVERSITY OF TOKYO, DAIKIN INDUSTRIES, LTD.
    Inventors: Keisuke NAGATO, Kota AONO, Yusuke EBIHARA, Masayuki NAKAO, Yuki UEDA, Shingo OKUNO, Hirokazu KOMORI, Akiyoshi YAMAUCHI, Yosuke KISHIKAWA
  • Publication number: 20200308103
    Abstract: Crystals of (2S)-2-((4-((4-((1S)-1,2-dihydroxyethyl)phenyl)ethynyl)benzoyl)(methyl)amino)-N-hydroxy-N?,2-dimethylmalonamide having diffraction peaks at diffraction angles (2?) of 3.8±0.2°, 7.7±0.2°, and 10.8±0.2°, etc., or 8.2±0.2°, 12.4±0.2°, and 13.3±0.2°, etc., in powder X-ray diffraction, a production method thereof, and a pharmaceutical composition.
    Type: Application
    Filed: March 30, 2017
    Publication date: October 1, 2020
    Applicant: TOYAMA CHEMICAL CO., LTD.
    Inventors: Yasutaka BABA, Yusuke NAGATO, Yu KOSEKI
  • Publication number: 20200308105
    Abstract: A novel method for production of hydroxamic acid derivative using a compound represented by the formula [12] as an intermediate, and intermediate therefor. wherein R1 represents a methyl group or the like; R2 represents a methyl group or the like; and R5 represents a hydrogen atom or the like.
    Type: Application
    Filed: March 30, 2017
    Publication date: October 1, 2020
    Applicant: FUJIFILM Toyama Chemical Co., Ltd.
    Inventors: Yusuke NAGATO, Yasutaka BABA
  • Publication number: 20200062789
    Abstract: An object of the present invention is to provide a compound or a salt thereof which shows strong antibacterial activity and has excellent solubility in water, and a lyophilized formulation, an LpxC inhibitor, and an antibacterial agent comprising the compound or a salt thereof. The present invention provides a compound represented by the Formula [1] or a salt thereof: wherein R1 represents a hydrogen atom or the like, R2 represents a hydrogen atom or the like, R3 represents a hydrogen atom or the like, R4 represents a hydrogen atom or the like, and n represents 0 or 1.
    Type: Application
    Filed: January 30, 2018
    Publication date: February 27, 2020
    Applicant: FUJIFILM Toyama Chemical Co., Ltd.
    Inventors: Muneo SHOJI, Yusuke NAGATO, Yuko SUZUMURA
  • Patent number: 10562862
    Abstract: An object of the present invention is to provide a method for industrially manufacturing a nitrogen-containing heterocyclic compound which shows excellent FLT3 inhibitory activity and is useful as a pharmaceutical active ingredient of pharmaceutical products. The present invention provides a manufacturing method of a compound represented by General Formula [14] or a salt thereof (in the formula, R1 represents a C1-6 alkyl group which may be substituted; and R8 represents a leaving group or the like).
    Type: Grant
    Filed: February 11, 2019
    Date of Patent: February 18, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Nagato, Shinsuke Mizumoto, Tatsuya Murakami, Tomoyuki Tanaka
  • Patent number: 10435377
    Abstract: An object of the present invention is to provide a method for industrially manufacturing a nitrogen-containing heterocyclic compound which shows excellent FLT3 inhibitory activity and is useful as a pharmaceutical active ingredient of pharmaceutical products. The present invention provides a manufacturing method of a compound represented by General Formula [14] or a salt thereof (in the formula, R1 represents a C1-6 alkyl group which may be substituted; and R8 represents a leaving group or the like).
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: October 8, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Nagato, Shinsuke Mizumoto, Tatsuya Murakami, Tomoyuki Tanaka
  • Publication number: 20190169133
    Abstract: An object of the present invention is to provide a method for industrially manufacturing a nitrogen-containing heterocyclic compound which shows excellent FLT3 inhibitory activity and is useful as a pharmaceutical active ingredient of pharmaceutical products. The present invention provides a manufacturing method of a compound represented by General Formula [14] or a salt thereof (in the formula, R1 represents a C1-6 alkyl group which may be substituted; and R8 represents a leaving group or the like).
    Type: Application
    Filed: February 11, 2019
    Publication date: June 6, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke NAGATO, Shinsuke MIZUMOTO, Tatsuya MURAKAMI, Tomoyuki TANAKA
  • Publication number: 20180127382
    Abstract: An object of the present invention is to provide a method for industrially manufacturing a nitrogen-containing heterocyclic compound which shows excellent FLT3 inhibitory activity and is useful as a pharmaceutical active ingredient of pharmaceutical products. The present invention provides a manufacturing method of a compound represented by General Formula [14] or a salt thereof (in the formula, R1 represents a C1-6 alkyl group which may be substituted; and R8 represents a leaving group or the like).
    Type: Application
    Filed: January 10, 2018
    Publication date: May 10, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke NAGATO, Shinsuke MIZUMOTO, Tatsuya MURAKAMI, Tomoyuki TANAKA