Patents by Inventor Yusuke Shimizu

Yusuke Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250149316
    Abstract: A technology for reducing variation in an ion flux distribution will be provided. There is provided a plasma processing method for performing plasma processing in a plasma processing apparatus including a chamber and a substrate support disposed in the chamber, the plasma processing performed on a substrate placed at the substrate support by generating plasma in the chamber. The plasma processing method includes: (a) the step of storing, in memory, first distribution data that is data relating to a distribution of an ion flux that occurs between the plasma generated in the chamber and a first substrate placed at the substrate support; (b-a) the step of placing a second substrate at the substrate support; and (b-b) a plasma processing step of generating the plasma in the chamber based on the first distribution data to perform the plasma processing on the second substrate.
    Type: Application
    Filed: December 30, 2024
    Publication date: May 8, 2025
    Applicant: Tokyo Electron Limited
    Inventors: Naoki MATSUMOTO, Toshihisa OZU, Satoru NAKAMURA, Yusuke SHIMIZU
  • Publication number: 20250149315
    Abstract: An adjustment method includes: acquiring reference distribution data that is data on a distribution of an ion flux that occurs between plasma generated in a first chamber and a substrate placed at a first substrate support disposed in the first chamber in a first plasma processing apparatus including the first chamber and the first substrate support; acquiring distribution data that is data on a distribution of an ion flux that occurs between plasma generated in a second chamber and a substrate placed at a second substrate support disposed in the second chamber in a second plasma processing apparatus including the second chamber and the second substrate support; and adjusting an element capable of adjusting the ion flux in the second plasma processing apparatus based on the distribution data acquired in the second plasma processing apparatus and the reference distribution data acquired in the first plasma processing apparatus.
    Type: Application
    Filed: December 26, 2024
    Publication date: May 8, 2025
    Applicant: Tokyo Electron Limited
    Inventors: Naoki MATSUMOTO, Toshihisa OZU, Satoru NAKAMURA, Yusuke SHIMIZU
  • Patent number: 12269832
    Abstract: The present disclosure provides a lithium borate compound represented by the following Formula (I), an additive for a lithium secondary battery, which contains the lithium borate compound, a non-aqueous electrolyte solution for a lithium secondary battery, a lithium secondary battery precursor, and a lithium secondary battery and method of producing the same. In Formula (I), R represents a single bond or an alkylene group having from 1 to 4 carbon atoms.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: April 8, 2025
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Han Zhang, Yusuke Shimizu, Satoko Fujiyama, Kenichi Goto, Shigeru Mio
  • Publication number: 20250107755
    Abstract: Provided is a robot configured to naturally obtain biological information. The robot includes an external member; and an electromagnetic wave sensor that is provided internally of the external member and is configured to obtain biological information of a user by using electromagnetic waves.
    Type: Application
    Filed: January 25, 2023
    Publication date: April 3, 2025
    Inventors: Rihito FUKUSHIMA, Yusuke SHIMIZU, Yoshihiro TOYODA, Kengo YAMAUCHI
  • Patent number: 12259655
    Abstract: Provided is a manufacturing method of a flexographic printing plate, including a development step of subjecting a plate surface of a flexographic printing original plate including at least a support, a photosensitive resin composition layer, and an infrared ablation layer sequentially stacked to brushing with a brush while supplying an organic solvent-based developer to the plate surface, wherein the organic solvent-based developer includes 0.1% by mass or more and 10.0% by mass or less of a polymer gel.
    Type: Grant
    Filed: March 3, 2023
    Date of Patent: March 25, 2025
    Assignee: ASAHI KASEI KABUSHIKI KAISHA
    Inventors: Hiroki Akiyama, Akinao Nakamura, Takumi Ishii, Yusuke Shimizu
  • Publication number: 20250076769
    Abstract: Provided is a manufacturing method of a flexographic printing plate, including a development step of subjecting a plate surface of a flexographic printing original plate including at least a support, a photosensitive resin composition layer, and an infrared ablation layer sequentially stacked to brushing with a brush while supplying an organic solvent-based developer to the plate surface, wherein the organic solvent-based developer includes 0.1% by mass or more and 10.0% by mass or less of a polymer gel.
    Type: Application
    Filed: March 3, 2023
    Publication date: March 6, 2025
    Applicant: ASAHI KASEI KABUSHIKI KAISHA
    Inventors: Hiroki AKIYAMA, Akinao NAKAMURA, Takumi ISHII, Yusuke SHIMIZU
  • Publication number: 20250079173
    Abstract: Provided is a plasma processing method performed with a plasma processing apparatus including a chamber. This method includes: (a) preparing a substrate on a substrate support in the chamber, the substrate including an etching target film and a metal-containing film provided on the etching target film, the metal-containing film including an exposed first region and an unexposed second region; (b) reforming the metal-containing film using a first plasma formed from a first processing gas, the first processing gas including either a fluorine-containing gas or an oxygen-containing gas; and (c) selectively removing the first region of the reformed metal-containing film with respect to the second region using a second plasma formed from a second processing gas.
    Type: Application
    Filed: November 18, 2024
    Publication date: March 6, 2025
    Inventors: Daisuke YOSHIKOSHI, Yusuke SHIMIZU, Shigeru TAHARA
  • Publication number: 20250068092
    Abstract: An image forming apparatus includes a photosensitive member, a charging member, a charging voltage applying portion, an exposure unit, a developing member, a developing voltage applying portion, a transfer member, a transfer voltage applying portion, and a controller. In a discharging operation, an exposure surface is formed on a photosensitive member surface by exposing the photosensitive member surface to light by the exposure unit. The controller carries out control so that: a developing voltage on a side of a predetermined polarity relative to an exposure surface potential is applied to the developing member; a transfer voltage less than a discharge start voltage in absolute value of a potential difference between itself and the exposure surface potential of the is applied to the transfer portion; and a charging voltage on the side of the predetermined polarity relative to the exposure surface potential is applied to the charging member.
    Type: Application
    Filed: August 22, 2024
    Publication date: February 27, 2025
    Inventors: SHUNSUKE MIZUKOSHI, HIROKI SASAME, TOMOO AKIZUKI, YUSUKE SHIMIZU
  • Publication number: 20250068109
    Abstract: An image forming apparatus includes a photosensitive member, a charging member, an exposing unit to expose a surface of the photosensitive member, and a developing member to supply toner with normal polarity at a developing portion. A controller, during a non-image formation when a toner image is not formed on a surface of the photosensitive member, controls such that a developing voltage is changed in a predetermined voltage width by applying a first developing voltage while the area of the photosensitive member on which a first surface potential is formed passes through the developing portion and by applying a second developing potential of an opposite polarity side rather than the first developing voltage while the area of the photosensitive member on which a second surface potential is formed passes through the developing portion, and the controller controls such that the surface potential becomes a side of the normal polarity rather than the first developing voltage.
    Type: Application
    Filed: November 5, 2024
    Publication date: February 27, 2025
    Inventors: Tomoo Akizuki, Yusuke Shimizu
  • Publication number: 20250060393
    Abstract: A probe head including a probe and an insulating support provided with a tapered hole to support a plurality of portions of the probe.
    Type: Application
    Filed: November 2, 2022
    Publication date: February 20, 2025
    Applicant: YOKOWO CO., LTD.
    Inventors: Yusuke SHIMIZU, Katsuhiko SATO, Takayoshi OKUNO
  • Publication number: 20250050810
    Abstract: A video display apparatus includes: an imager that captures a video of surroundings of a vehicle; a transparent display panel installed in a window glass of the vehicle; an identification unit that identifies, from the captured video, a visible range where a passenger views an outside as a range displayed on the transparent display panel; an operation unit that is operable on a surface of the transparent display panel; a recording controller that records the captured video in a storage; a replay controller that replays the recorded video; and a display controller that causes the transparent display panel to display a video of the identified range, wherein when operation is started, the replay controller causes the transparent display panel to display a video at a start of the operation, and when an operation direction is along a travelling direction, the replay controller replays, in a reverse direction, the recorded video.
    Type: Application
    Filed: October 31, 2024
    Publication date: February 13, 2025
    Inventor: Yusuke Shimizu
  • Publication number: 20250040207
    Abstract: A semiconductor device includes a semiconductor layer that is of a first conductivity type, a body region of a second conductivity type, a source region to be separated inwardly from an outer edge of the body region, a drain region formed on a surface of the semiconductor layer so as to be separated from the body region in a first direction orthogonal to a thickness direction of the semiconductor layer, a gate insulating layer formed on a portion of the surface of the semiconductor layer between the source region and the drain region in the first direction, a gate electrode that is formed on the gate insulating layer, an exposed region that is formed in the body region at a different position from the source region and in which the semiconductor layer is exposed, and a metal layer that forms a Schottky junction with the exposed region.
    Type: Application
    Filed: October 17, 2024
    Publication date: January 30, 2025
    Applicant: ROHM CO., LTD.
    Inventor: Yusuke SHIMIZU
  • Publication number: 20250002394
    Abstract: A glass article includes a glass composition including mole percent (mol %) to 70 mol % of SiO2, 5 mol % to 15 mol % of Al2O3, 5 mol % to 15 mol % of Na2O, greater than 0 mol % and equal to or less than 5 mol % of K2O, 5 mol % to 15 mol % of Li2O, and greater than 0 mol % and equal to or less than 5 mol % of MgO, and satisfying Relation (1) below: 0.1?Al2O3/(sum of Na2O,K2O, and Li2O)?0.7??(1), where Al2O3, Na2O, K2O, and Li2O in the Relation (1) denote contents (mol %) of Al2O3, Na2O, K2O, and Li2O, respectively, in the glass composition, and the glass article has a thickness of 100 micrometers (?m) or less.
    Type: Application
    Filed: January 31, 2024
    Publication date: January 2, 2025
    Inventors: Seung Ho KIM, Yuta NAGANO, Takashi MURATA, Yusuke SHIMIZU, Ken YUKI, Kosuke KAWAMOTO, Seung KIM, Cheol Min PARK, Hui Yeon SHON, Gyu In SHIM, Jae Gil LEE, Jin Won JANG, So Mi JUNG
  • Patent number: 12170151
    Abstract: A reactor building includes a spent fuel pool, spent fuel racks, and traveling rails. The spent fuel racks are located in the spent fuel pool and are configured to store nuclear spent fuel. A protection slab is located above the spent fuel racks. The traveling rails are fixed to a lower surface of the protection slab. The rails are parallel to each other. The spent fuel racks are located between the rails. A fuel transfer machine is suspended from the rails.
    Type: Grant
    Filed: March 24, 2022
    Date of Patent: December 17, 2024
    Assignee: Hitachi-GE Nuclear Energy, Ltd.
    Inventor: Yusuke Shimizu
  • Patent number: 12164252
    Abstract: An image forming apparatus includes a photosensitive member, a charging member, an exposing unit to expose a surface of the photosensitive member, and a developing member to supply toner with normal polarity at a developing portion. A controller, during a non-image formation when a toner image is not formed on a surface of the photosensitive member, controls such that a developing voltage is changed in a predetermined voltage width by applying a first developing voltage while the area of the photosensitive member on which a first surface potential is formed passes through the developing portion and by applying a second developing potential of an opposite polarity side rather than the first developing voltage while the area of the photosensitive member on which a second surface potential is formed passes through the developing portion, and the controller controls such that the surface potential becomes a side of the normal polarity rather than the first developing voltage.
    Type: Grant
    Filed: January 24, 2023
    Date of Patent: December 10, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tomoo Akizuki, Yusuke Shimizu
  • Patent number: D1054058
    Type: Grant
    Filed: February 28, 2023
    Date of Patent: December 10, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Daichi Furukawa, Ai Masuda, Yusuke Shimizu, Yu Iijima, Taichiro Yamashita
  • Patent number: D1066719
    Type: Grant
    Filed: July 28, 2023
    Date of Patent: March 11, 2025
    Assignee: Hitachi High-Tech Corporation
    Inventors: Daichi Furukawa, Ai Masuda, Takayuki Kanda, Akimasa Osaka, Yusuke Shimizu, Shigeki Yamaguchi
  • Patent number: D1066720
    Type: Grant
    Filed: July 28, 2023
    Date of Patent: March 11, 2025
    Assignee: Hitachi High-Tech Corporation
    Inventors: Daichi Furukawa, Ai Masuda, Takayuki Kanda, Akimasa Osaka, Yusuke Shimizu, Shigeki Yamaguchi
  • Patent number: D1066721
    Type: Grant
    Filed: July 28, 2023
    Date of Patent: March 11, 2025
    Assignee: Hitachi High-Tech Corporation
    Inventors: Daichi Furukawa, Ai Masuda, Takayuki Kanda, Akimasa Osaka, Yusuke Shimizu, Shigeki Yamaguchi
  • Patent number: D1067458
    Type: Grant
    Filed: July 28, 2023
    Date of Patent: March 18, 2025
    Assignee: Hitachi High-Tech Corporation
    Inventors: Daichi Furukawa, Ai Masuda, Yusuke Shimizu, Yu Iijima, Taichiro Yamashita