Patents by Inventor Yusuke Takamatsu
Yusuke Takamatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240129417Abstract: The image reading device includes a reading section configured to read an image from a document, a control section configured to perform control related to the reading of the image from the document, a display section configured to display information, and a USB coupling section configured to couple with a USB cable. The control section control to switch to any one of a plurality of mode types. When a power source is turned on, a control section determines one of a plurality of mode types based on USB negotiation, and then makes a liquid crystal display section display information that enables identifying the decided-on mode.Type: ApplicationFiled: October 10, 2023Publication date: April 18, 2024Inventors: Seiji TAKAMATSU, Yusuke FUKASAWA
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Patent number: 11955352Abstract: A substrate processing apparatus includes: a temperature raising part for raising a temperature of a first sulfuric acid; a mixing part for mixing the first sulfuric acid where the temperature is raised by the temperature raising part with a moisture-containing liquid to generate a mixed solution; and a discharging part for discharging the mixed solution onto a substrate inside a substrate processing part. The mixing part includes: a joining portion where a sulfuric acid supply line through which the first sulfuric acid where the temperature is raised by the temperature raising part flows and a liquid supply line through which the first sulfuric acid where the temperature is raised by the temperature raising part and the moisture-containing liquid flows are joined; and a reaction suppression mechanism for suppressing a reaction between the first sulfuric acid and the moisture-containing liquid in the joining portion.Type: GrantFiled: January 5, 2021Date of Patent: April 9, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Hiroki Sakurai, Daisuke Goto, Takashi Nakazawa, Yusuke Takamatsu, Yusuke Hashimoto
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Patent number: 11798819Abstract: A liquid processing apparatus includes a storage tank, a circulation line, a supply line, a return line and at least one filter. The storage tank stores a processing liquid therein. Through the circulation line, the processing liquid sent from the storage tank is returned back into the storage tank. The supply line connects the circulation line and a supply configured to supply the processing liquid onto a substrate. The return line is connected to the supply line, and the processing liquid is returned back into the storage tank from the supply line through the return line. The filter is provided in at least one of the supply line on an upstream side of a connection point between the return line and the supply line or the return line, and is configured to remove a foreign substance in the processing liquid.Type: GrantFiled: June 22, 2021Date of Patent: October 24, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuki Kosai, Yusuke Takamatsu, Taisei Inoue
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Publication number: 20230264233Abstract: A liquid processing apparatus includes: a storage tank that stores a processing liquid; a first circulation line that causes the processing liquid sent from the storage tank to pass through a first filter and to return to the storage tank; and at least one second circulation line that causes the processing liquid to pass through a second filter and to return to the storage tank, wherein the second circulation line is shorter in a flow path than the first circulation line, a second flow rate of the processing liquid flowing into the second circulation line is smaller than a first flow rate of the processing liquid flowing into the first circulation line at a downstream side of a location where the first circulation line and the second circulation line are joined, and the second filter is smaller in a filtration amount per unit time than the first filter.Type: ApplicationFiled: June 22, 2021Publication date: August 24, 2023Inventors: Kazuki KOSAI, Taisei INOUE, Yusuke TAKAMATSU, Takahisa OTSUKA, Masaru AMAI, Itaru KANNO, Hiroshi YANO
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Patent number: 11626298Abstract: A liquid supply device includes: a storage tank configured to store a processing liquid including a first processing liquid (sulfuric acid) and a second processing liquid (hydrogen peroxide solution); a circulation path having a first pipeline through which the processing liquid passes in a horizontal direction, and configured to circulate the processing liquid stored in the storage tank; a branch path configured to supply the processing liquid to a processing unit; and a branching part having an opening for allowing the processing liquid to flow out from the first pipeline to the branch path, wherein the opening is formed in the branching part and formed below a periphery of the first pipeline when the first pipeline is viewed in section.Type: GrantFiled: March 23, 2018Date of Patent: April 11, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Yusuke Takamatsu, Yasuhiro Takaki, Shinichi Umeno, Shogo Fukui
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Publication number: 20210398828Abstract: A liquid processing apparatus includes a storage tank, a circulation line, a supply line, a return line and at least one filter. The storage tank stores a processing liquid therein. Through the circulation line, the processing liquid sent from the storage tank is returned back into the storage tank. The supply line connects the circulation line and a supply configured to supply the processing liquid onto a substrate. The return line is connected to the supply line, and the processing liquid is returned back into the storage tank from the supply line through the return line. The filter is provided in at least one of the supply line on an upstream side of a connection point between the return line and the supply line or the return line, and is configured to remove a foreign substance in the processing liquid.Type: ApplicationFiled: June 22, 2021Publication date: December 23, 2021Inventors: Kazuki Kosai, Yusuke Takamatsu, Taisei Inoue
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Patent number: 11158525Abstract: A recovery route returns, to a retaining tank, mixed solution supplied to a substrate processing unit. A discarding route discards the supplied mixed solution to a place other than the retaining tank. A switching controller causes the supplied mixed solution to flow into the discarding route during a time interval until a first time interval has elapsed from a time point when the substrate processing unit starts to supply the mixed solution; causes the supplied mixed solution to flow into the recovery route during a time interval until a second time interval, which is decided based on a predetermined recovery rate, has elapsed after the first time interval elapses; and causes the supplied mixed solution to flow into the discarding route during a time interval until supply of the mixed solution has been ended from a time point when the second time interval elapses.Type: GrantFiled: January 20, 2017Date of Patent: October 26, 2021Assignee: TOKYO ELECTRON LIMITEDInventors: Yasuhiro Takaki, Shinichi Umeno, Takashi Nagai, Hisashi Morita, Nobuhiro Ogata, Yusuke Takamatsu, Jiro Higashijima
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Publication number: 20210210363Abstract: A substrate processing apparatus includes: a temperature raising part for raising a temperature of a first sulfuric acid; a mixing part for mixing the first sulfuric acid where the temperature is raised by the temperature raising part with a moisture-containing liquid to generate a mixed solution; and a discharging part for discharging the mixed solution onto a substrate inside a substrate processing part. The mixing part includes: a joining portion where a sulfuric acid supply line through which the first sulfuric acid where the temperature is raised by the temperature raising part flows and a liquid supply line through which the first sulfuric acid where the temperature is raised by the temperature raising part and the moisture-containing liquid flows are joined; and a reaction suppression mechanism for suppressing a reaction between the first sulfuric acid and the moisture-containing liquid in the joining portion.Type: ApplicationFiled: January 5, 2021Publication date: July 8, 2021Inventors: Hiroki SAKURAI, Daisuke GOTO, Takashi NAKAZAWA, Yusuke TAKAMATSU, Yusuke HASHIMOTO
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Publication number: 20210111043Abstract: A liquid supply device includes: a storage tank configured to store a processing liquid including a first processing liquid (sulfuric acid) and a second processing liquid (hydrogen peroxide solution); a circulation path having a first pipeline through which the processing liquid passes in a horizontal direction, and configured to circulate the processing liquid stored in the storage tank; a branch path configured to supply the processing liquid to a processing unit; and a branching part having an opening for allowing the processing liquid to flow out from the first pipeline to the branch path, wherein the opening is formed in the branching part and formed below a periphery of the first pipeline when the first pipeline is viewed in section.Type: ApplicationFiled: March 23, 2018Publication date: April 15, 2021Inventors: Yusuke TAKAMATSU, Yasuhiro TAKAKI, Shinichi UMENO, Shogo FUKUI
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Publication number: 20190067048Abstract: A recovery route returns, to a retaining tank, mixed solution supplied to a substrate processing unit. A discarding route discards the supplied mixed solution to a place other than the retaining tank. A switching controller causes the supplied mixed solution to flow into the discarding route during a time interval until a first time interval has elapsed from a time point when the substrate processing unit starts to supply the mixed solution; causes the supplied mixed solution to flow into the recovery route during a time interval until a second time interval, which is decided based on a predetermined recovery rate, has elapsed after the first time interval elapses; and causes the supplied mixed solution to flow into the discarding route during a time interval until supply of the mixed solution has been ended from a time point when the second time interval elapses.Type: ApplicationFiled: January 20, 2017Publication date: February 28, 2019Applicant: TOKYO ELECTRON LIMITEDInventors: Yasuhiro Takaki, Shinichi Umeno, Takashi Nagai, Hisashi Morita, Nobuhiro Ogata, Yusuke Takamatsu, Jiro Higashijima