Patents by Inventor Yusuke Teramoto

Yusuke Teramoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220220166
    Abstract: In order to improve aggregation property of a PPR protein, the A6 amino acid of the 1st PPR motif from the N-terminus (M1) is made more hydrophilic. Further, the A9 amino acid of M1 is made to be a hydrophilic amino acid or glycine. The A6 amino acid is preferably asparagine or aspartic acid, and the A9 amino acid is preferably glutamine, glutamic acid, lysine, or glycine. Proteins containing such a PPR motif as M1 motif may have not only improved aggregation property, but also high binding power to a target nucleic acid.
    Type: Application
    Filed: May 29, 2020
    Publication date: July 14, 2022
    Applicants: EditForce, Inc., KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
    Inventors: Yusuke Yagi, Takayoshi Imai, Takayuki Tamai, Takahiro Nakamura, Takamasa Teramoto
  • Patent number: 10672584
    Abstract: A X-ray generating device includes a chamber, a rotating body in the chamber, a starting material storage vessel for storing a target starting material in liquid form, and a starting material supply mechanism for applying the target starting material onto a surface of the rotating body. The X-ray generating device also includes an energy beam inlet window disposed at an opening of the chamber and configured to transmit an energy beam, which will be directed onto the target starting material on the surface of the rotating body and introduce the energy beam from the exterior of the chamber to the interior of the chamber, and an X-ray outlet window disposed at the opening of the chamber and configured to transmit the X-rays, which are generated upon irradiating the target starting material with the energy beam, and allow the X-rays to proceed to the exterior of the chamber.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: June 2, 2020
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke Teramoto, Takahiro Shirai
  • Publication number: 20190259557
    Abstract: A X-ray generating device includes a chamber, a rotating body in the chamber, a starting material storage vessel for storing a target starting material in liquid form, and a starting material supply mechanism for applying the target starting material onto a surface of the rotating body. The X-ray generating device also includes an energy beam inlet window disposed at an opening of the chamber and configured to transmit an energy beam, which will be directed onto the target starting material on the surface of the rotating body and introduce the energy beam from the exterior of the chamber to the interior of the chamber, and an X-ray outlet window disposed at the opening of the chamber and configured to transmit the X-rays, which are generated upon irradiating the target starting material with the energy beam, and allow the X-rays to proceed to the exterior of the chamber.
    Type: Application
    Filed: May 30, 2017
    Publication date: August 22, 2019
    Applicant: Ushio Denki Kabushiki Kaisha
    Inventors: Yusuke TERAMOTO, Takahiro SHIRAI
  • Patent number: 10285253
    Abstract: An extreme ultraviolet light source device includes a pair of disk-shaped discharge electrodes which face each other with their peripheral portions being spaced from each other, a pulsed power supply unit for supplying pulsed power to the discharge electrodes, a raw material supply unit for supplying onto the discharge electrodes raw materials that emit extreme ultraviolet light, and an energy beam irradiation unit for irradiating the raw materials on curved surfaces of the discharge electrodes with an energy beam to vaporize the raw materials. At least one of the paired discharge electrodes has a tapered surface at a peripheral portion of at least one of two circular surfaces thereof. The tapered surface inclines radially outward such that the thickness of the discharge electrode decreases in the radially outward direction.
    Type: Grant
    Filed: April 1, 2016
    Date of Patent: May 7, 2019
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke Teramoto, Akihisa Nagano, Hideyuki Urakami
  • Patent number: 10143075
    Abstract: An extreme ultraviolet light source device includes two discharge electrodes, two plasma raw material containers associated with the discharge electrodes, respectively, and two supply units associated with the containers, respectively. The supply units supply the plasma raw materials from the containers onto the discharge electrodes upon rotations of the discharge electrodes. The light source device also includes an energy beam irradiating unit configured to irradiate the plasma raw material on a circumferential surface of one of the discharge electrodes with an energy beam to vaporize the plasma raw material such that electric discharge takes place between the discharge electrodes to generate the plasma. The light source device also includes two film thickness regulating units associated with the discharge electrodes, respectively.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: November 27, 2018
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke Teramoto, Hideyuki Urakami, Akihisa Nagano
  • Publication number: 20180139830
    Abstract: An extreme ultraviolet light source device includes a pair of disk-shaped discharge electrodes which face each other with their peripheral portions being spaced from each other, a pulsed power supply unit for supplying pulsed power to the discharge electrodes, a raw material supply unit for supplying onto the discharge electrodes raw materials that emit extreme ultraviolet light, and an energy beam irradiation unit for irradiating the raw materials on curved surfaces of the discharge electrodes with an energy beam to vaporize the raw materials. At least one of the paired discharge electrodes has a tapered surface at a peripheral portion of at least one of two circular surfaces thereof. The tapered surface inclines radially outward such that the thickness of the discharge electrode decreases in the radially outward direction.
    Type: Application
    Filed: April 1, 2016
    Publication date: May 17, 2018
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke TERAMOTO, Akihisa NAGANO, Hideyuki URAKAMI
  • Patent number: 9686846
    Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: June 20, 2017
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke Teramoto, Gota Niimi, Takahiro Hiraoka, Pieter Goldhoorn
  • Publication number: 20160345419
    Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
    Type: Application
    Filed: August 3, 2016
    Publication date: November 24, 2016
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke TERAMOTO, Gota NIIMI, Takahiro HIRAOKA, Pieter GOLDHOORN
  • Patent number: 9480136
    Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: October 25, 2016
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke Teramoto, Gota Niimi, Takahiro Hiraoka, Pieter Goldhoorn
  • Publication number: 20160295674
    Abstract: An extreme ultraviolet light source device includes two discharge electrodes, two plasma raw material containers associated with the discharge electrodes, respectively, and two supply units associated with the containers, respectively. The supply units supply the plasma raw materials from the containers onto the discharge electrodes upon rotations of the discharge electrodes. The light source device also includes an energy beam irradiating unit configured to irradiate the plasma raw material on a circumferential surface of one of the discharge electrodes with an energy beam to vaporize the plasma raw material such that electric discharge takes place between the discharge electrodes to generate the plasma. The light source device also includes two film thickness regulating units associated with the discharge electrodes, respectively.
    Type: Application
    Filed: March 29, 2016
    Publication date: October 6, 2016
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke TERAMOTO, Hideyuki URAKAMI, Akihisa NAGANO
  • Publication number: 20160073486
    Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
    Type: Application
    Filed: April 24, 2014
    Publication date: March 10, 2016
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Yusuke TERAMOTO, Gota NIIMI, Takahiro HIRAOKA, Pieter GOLDHOORN
  • Patent number: 7626188
    Abstract: Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes a raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment.
    Type: Grant
    Filed: July 30, 2007
    Date of Patent: December 1, 2009
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Takahiro Shirai, Hiroto Sato, Kazunori Bessho, Yusuke Teramoto
  • Publication number: 20080048134
    Abstract: Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes a raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment.
    Type: Application
    Filed: July 30, 2007
    Publication date: February 28, 2008
    Applicant: USHIODENKI KABUSHIKI KAISHA
    Inventors: Takahiro SHIRAI, Hiroto SATO, Kazunori BESSHO, Yusuke TERAMOTO
  • Patent number: 6982421
    Abstract: To both increase the efficiency of conversion into EUV radiation energy and also increase the amount of emerging EUV radiation in an EUV source a discharge tube is connected to a gas supply space for supply of the discharge gas which in located radially with respect to an optical axis. The discharge gas is supplied to the discharge space through the gas supply space, passes through the center opening of the anode, emerges from the discharge part and is afterwards evacuated from an evacuation opening. The anode and the cathode are connected to a pulse current source. Discharge plasma is produced and EUV radiation is formed by a heavy current pulse from the pulse current source within the discharge space of the discharge tube. The EUV radiation which has formed passes through a through-opening of the anode and is emitted to the outside.
    Type: Grant
    Filed: December 8, 2004
    Date of Patent: January 3, 2006
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Hiroto Sato, Kazunori Bessho, Yusuke Teramoto, Daiki Yamatani
  • Publication number: 20050151455
    Abstract: To both increase the efficiency of conversion into EUV radiation energy and also increase the amount of emerging EUV radiation in an EUV source a discharge tube is connected to a gas supply space for supply of the discharge gas which in located radially with respect to an optical axis. The discharge gas is supplied to the discharge space through the gas supply space, passes through the center opening of the anode, emerges from the discharge part and is afterwards evacuated from an evacuation opening. The anode and the cathode are connected to a pulse current source. Discharge plasma is produced and EUV radiation is formed by a heavy current pulse from the pulse current source within the discharge space of the discharge tube. The EUV radiation which has formed passes through a through-opening of the anode and is emitted to the outside.
    Type: Application
    Filed: December 8, 2004
    Publication date: July 14, 2005
    Applicant: Ushiodenki Kabushiki Kaisha
    Inventors: Hiroto Sato, Kazunori Bessho, Yusuke Teramoto, Daiki Yamatani