Abstract: A light source apparatus includes a disk-shaped rotation body, a raw material supply mechanism, a chamber body, and a foil trap. The raw material supply mechanism supplies a front surface of the rotation body with liquid raw material that is irradiated with an energy beam to generate plasma. The chamber body includes a beam introduction section that introduces the energy beam, a radiation extraction section that extracts radiation from the plasma that has been generated, and a plasma generation section that accommodates the rotation body. The foil trap includes a shaft member rotatably disposed in the chamber body and a plurality of foils radially arranged around the shaft member, and the plurality of foils is arranged between the rotation body and the radiation extraction section to capture debris that has been generated from the plasma.

Abstract: A light source apparatus, in which an energy beam transforms a liquid raw material into plasma to extract radiation, includes a rotation body, a raw material supply section, and a layer thickness adjustment section. The rotation body is disposed at a position onto which the energy beam is incident, and includes a groove overlapping with an incident area of the energy beam. The raw material supply section supplies the groove with the liquid raw material. The layer thickness adjustment section adjusts a layer thickness of the liquid raw material such that a front surface of the liquid raw material forms a concave surface in response to the groove in the incident area of the energy beam.

Abstract: A light source apparatus, in which an energy beam transforms a liquid raw material into plasma to extract radiation, includes a rotation body, a raw material supply section, and an electric field applying section. The rotation body is disposed at a position onto which the energy beam is incident. The raw material supply section supplies the liquid raw material to the rotation body. The electric field applying section is set to a potential different from a potential of the liquid raw material that has been supplied to the rotation body, and applies an electric field to a plasma generation area in which plasma is to be generated by irradiation of the energy beam.

Abstract: A light source apparatus includes a beam introduction section, a plate member, a raw material supply section, and a radiation extraction section. The beam introduction section introduces an energy beam. The plate member has a front surface and a back surface, is disposed at a location where the introduced energy beam is incident onto the front surface, and is rotatable around a direction orthogonal to the front surface as its rotation axis direction. The raw material supply section supplies plasma raw material to an incident area in the front surface to generate plasma. The radiation extraction section extracts and emits radiation from the generated plasma. The plate member is disposed such that the normal axis of the incident area in the front surface is off from a between-axes area configured between an incident axis of the energy beam incident onto the incident area and an emission axis of the radiation.

Abstract: A X-ray generating device includes a chamber, a rotating body in the chamber, a starting material storage vessel for storing a target starting material in liquid form, and a starting material supply mechanism for applying the target starting material onto a surface of the rotating body. The X-ray generating device also includes an energy beam inlet window disposed at an opening of the chamber and configured to transmit an energy beam, which will be directed onto the target starting material on the surface of the rotating body and introduce the energy beam from the exterior of the chamber to the interior of the chamber, and an X-ray outlet window disposed at the opening of the chamber and configured to transmit the X-rays, which are generated upon irradiating the target starting material with the energy beam, and allow the X-rays to proceed to the exterior of the chamber.

Abstract: A X-ray generating device includes a chamber, a rotating body in the chamber, a starting material storage vessel for storing a target starting material in liquid form, and a starting material supply mechanism for applying the target starting material onto a surface of the rotating body. The X-ray generating device also includes an energy beam inlet window disposed at an opening of the chamber and configured to transmit an energy beam, which will be directed onto the target starting material on the surface of the rotating body and introduce the energy beam from the exterior of the chamber to the interior of the chamber, and an X-ray outlet window disposed at the opening of the chamber and configured to transmit the X-rays, which are generated upon irradiating the target starting material with the energy beam, and allow the X-rays to proceed to the exterior of the chamber.

Abstract: An extreme ultraviolet light source device includes a pair of disk-shaped discharge electrodes which face each other with their peripheral portions being spaced from each other, a pulsed power supply unit for supplying pulsed power to the discharge electrodes, a raw material supply unit for supplying onto the discharge electrodes raw materials that emit extreme ultraviolet light, and an energy beam irradiation unit for irradiating the raw materials on curved surfaces of the discharge electrodes with an energy beam to vaporize the raw materials. At least one of the paired discharge electrodes has a tapered surface at a peripheral portion of at least one of two circular surfaces thereof. The tapered surface inclines radially outward such that the thickness of the discharge electrode decreases in the radially outward direction.

Abstract: An extreme ultraviolet light source device includes two discharge electrodes, two plasma raw material containers associated with the discharge electrodes, respectively, and two supply units associated with the containers, respectively. The supply units supply the plasma raw materials from the containers onto the discharge electrodes upon rotations of the discharge electrodes. The light source device also includes an energy beam irradiating unit configured to irradiate the plasma raw material on a circumferential surface of one of the discharge electrodes with an energy beam to vaporize the plasma raw material such that electric discharge takes place between the discharge electrodes to generate the plasma. The light source device also includes two film thickness regulating units associated with the discharge electrodes, respectively.

Abstract: An extreme ultraviolet light source device includes a pair of disk-shaped discharge electrodes which face each other with their peripheral portions being spaced from each other, a pulsed power supply unit for supplying pulsed power to the discharge electrodes, a raw material supply unit for supplying onto the discharge electrodes raw materials that emit extreme ultraviolet light, and an energy beam irradiation unit for irradiating the raw materials on curved surfaces of the discharge electrodes with an energy beam to vaporize the raw materials. At least one of the paired discharge electrodes has a tapered surface at a peripheral portion of at least one of two circular surfaces thereof. The tapered surface inclines radially outward such that the thickness of the discharge electrode decreases in the radially outward direction.

Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.

Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.

Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.

Abstract: An extreme ultraviolet light source device includes two discharge electrodes, two plasma raw material containers associated with the discharge electrodes, respectively, and two supply units associated with the containers, respectively. The supply units supply the plasma raw materials from the containers onto the discharge electrodes upon rotations of the discharge electrodes. The light source device also includes an energy beam irradiating unit configured to irradiate the plasma raw material on a circumferential surface of one of the discharge electrodes with an energy beam to vaporize the plasma raw material such that electric discharge takes place between the discharge electrodes to generate the plasma. The light source device also includes two film thickness regulating units associated with the discharge electrodes, respectively.

Abstract: An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.

Abstract: Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes a raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment.

Abstract: Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes a raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment.

Abstract: To both increase the efficiency of conversion into EUV radiation energy and also increase the amount of emerging EUV radiation in an EUV source a discharge tube is connected to a gas supply space for supply of the discharge gas which in located radially with respect to an optical axis. The discharge gas is supplied to the discharge space through the gas supply space, passes through the center opening of the anode, emerges from the discharge part and is afterwards evacuated from an evacuation opening. The anode and the cathode are connected to a pulse current source. Discharge plasma is produced and EUV radiation is formed by a heavy current pulse from the pulse current source within the discharge space of the discharge tube. The EUV radiation which has formed passes through a through-opening of the anode and is emitted to the outside.

Abstract: To both increase the efficiency of conversion into EUV radiation energy and also increase the amount of emerging EUV radiation in an EUV source a discharge tube is connected to a gas supply space for supply of the discharge gas which in located radially with respect to an optical axis. The discharge gas is supplied to the discharge space through the gas supply space, passes through the center opening of the anode, emerges from the discharge part and is afterwards evacuated from an evacuation opening. The anode and the cathode are connected to a pulse current source. Discharge plasma is produced and EUV radiation is formed by a heavy current pulse from the pulse current source within the discharge space of the discharge tube. The EUV radiation which has formed passes through a through-opening of the anode and is emitted to the outside.