Patents by Inventor Yusuke Uno

Yusuke Uno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7439196
    Abstract: The main object of the present invention is to provide a method for manufacturing efficiently a pattern formed structure which has a surface having a property-varied pattern and can be used to manufacture a color filter or the like. In order to achieve the object, the present invention provides a method for manufacturing a pattern formed structure, comprising: a patterning substrate preparing process of preparing a patterning substrate having a base material and a photocatalyst-containing property variable layer which is formed on the base material, comprises at least a photocatalyst and a binder, and has a property variable by action of the photocatalyst based on irradiation with energy; and an energy radiating process of radiating energy onto the patterning substrate at an intensity of 0.1 to 10 mW/cm2, thereby forming a property variable pattern in which the property of the photocatalyst-containing property variable layer is varied.
    Type: Grant
    Filed: April 6, 2005
    Date of Patent: October 21, 2008
    Assignee: DAI Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Yusuke Uno
  • Publication number: 20070259328
    Abstract: An object of the present invention is to provide an artificial tissue construct that has means for transporting nutrients, oxygen, waste products, or the like and is viable in vivo. The present invention relates to a tissue construct formed in vitro, which comprises a vascular layer, a basal membrane layer, and a tissue-forming cell layer.
    Type: Application
    Filed: May 31, 2005
    Publication date: November 8, 2007
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Ikuo Morita, Hideyuki Miyake, Hideshi Hattori, Hironori Kobayashi, Yusuke Uno
  • Publication number: 20070218215
    Abstract: The present invention provides a plasma processing method capable of being used for manufacturing color filters which are substantially free from defects such as white spots and color mixture of inks and color filters manufactured by using the same. A plasma processing device according to the present invention comprises a stage mainly acting also as a lower electrode; and a head electrode in which an upper electrode is stored and from which plasma raw material gas is ejected. By ejecting plasma raw material gas from the head electrode, applying voltage between the stage and the head electrode by an alternate power source to induce plasma electric discharge and by scanning over a workpiece material (glass substrate) by the head electrode, the workpiece material (glass substrate) is subjected to the plasma processing.
    Type: Application
    Filed: March 14, 2007
    Publication date: September 20, 2007
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hiroki Sakata, Yusuke Uno, Norikatsu Nakamura
  • Publication number: 20070210036
    Abstract: A plasma processing is performed by using a plasma processing apparatus which includes a first electrode and a second electrode disposed relatively movable to the first electrode between which an object to be processed is disposed, and a solid dielectric material disposed to be continuously connected to at least processing starting and final end sides of the object. A process gas is introduced between the first and second electrodes under a state in which the first electrode abuts on entire surfaces of the object and the solid dielectric material, and a voltage is applied between the first and second electrodes to thereby process the object by plasma discharge generated between the first and second electrodes while moving the second electrode relatively to the first electrode and the object.
    Type: Application
    Filed: March 1, 2007
    Publication date: September 13, 2007
    Inventors: Yusuke UNO, Norikatsu NAKAMURA, Hiroki SAKATA
  • Publication number: 20070207276
    Abstract: A plasma processing is performed by providing a first and a second electrodes to be relatively parallelly movable, disposing an object to be processed on the second electrode so as to face the first electrode and providing a blocking member to both end portions of the second electrode, so that a plasma processing space is blocked by the blocking member when the first and second electrodes are moved relatively with each other. A voltage is applied to both the first and the second electrodes and a process gas is introduced into the plasma processing space formed between the first and second electrodes, and the plasma is irradiated to the object. The blocking member is provided so as to extend from the second electrode to the first electrode, and an upper surface of the blocking member is raised higher than a surface level of the object to be processed.
    Type: Application
    Filed: March 1, 2007
    Publication date: September 6, 2007
    Inventors: Yusuke UNO, Norikatsu NAKAMURA, Hiroki SAKATA
  • Publication number: 20070190645
    Abstract: A vascular cell culture patterning substrate, which can efficiently form a plurality of blood vessels on one substrate. The vascular cell culture patterning substrate includes: a base material; a vascular cell adhesion portion formed in at least two substantially parallel lines on the base material, and having adhesive properties to a vascular cell which forms a blood vessel; and a vascular cell adhesion-inhibiting portion formed in between two adjacent vascular cell adhesion portions on the base material, and inhibiting adhesion to the vascular cell. The vascular cell adhesion-inhibiting portion contains a vascular cell adhesion-inhibiting material having vascular cell adhesion-inhibiting properties of inhibiting adhesion to the vascular cell.
    Type: Application
    Filed: March 10, 2005
    Publication date: August 16, 2007
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hideyuki Miyake, Hideshi Hattori, Hironori Kobayashi, Yusuke Uno
  • Publication number: 20060014086
    Abstract: The main object of the present invention is to provide a method for manufacturing efficiently a pattern formed structure which has a surface having a property-varied pattern and can be used to manufacture a color filter or the like. In order to achieve the object, the present invention provides a method for manufacturing a pattern formed structure, comprising: a patterning substrate preparing process of preparing a patterning substrate having a base material and a property variable layer which is formed on the base material and has a property variable by action of a photocatalyst based on irradiation with energy; and an energy radiating process of arranging a photocatalyst containing layer side substrate having a base body and a photocatalyst containing layer comprising at least the photocatalyst, and the patterning substrate so as to keep a given interval between the photocatalyst containing layer and the property variable layer, and then radiating energy onto the resultant at an intensity of 0.
    Type: Application
    Filed: April 6, 2005
    Publication date: January 19, 2006
    Inventors: Hironori Kobayashi, Yusuke Uno
  • Publication number: 20060006373
    Abstract: The main object of the present invention is to provide a method for manufacturing efficiently a pattern formed structure which has a surface having a property-varied pattern and can be used to manufacture a color filter or the like. In order to achieve the object, the present invention provides a method for manufacturing a pattern formed structure, comprising: a patterning substrate preparing process of preparing a patterning substrate having a base material and a photocatalyst-containing property variable layer which is formed on the base material, comprises at least a photocatalyst and a binder, and has a property variable by action of the photocatalyst based on irradiation with energy; and an energy radiating process of radiating energy onto the patterning substrate at an intensity of 0.1 to 10 mW/cm2, thereby forming a property variable pattern in which the property of the photocatalyst-containing property variable layer is varied.
    Type: Application
    Filed: April 6, 2005
    Publication date: January 12, 2006
    Inventors: Hironori Kobayashi, Yusuke Uno