Patents by Inventor Yusuke Yoshikane

Yusuke Yoshikane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11649558
    Abstract: An object of the invention is to provide a jig electrolytic stripper that can sufficiently remove palladium adhered to the current-conducting portion of a plating jig, that can remove palladium adhered to the insulating-material-coated portion of the jig, and that exhibits reduced erosion of the metal of the current-conducting portion of the jig. The jig electrolytic stripper comprises the following components (A) to (C): (A) at least one member selected from the group consisting of nitric acid and salts thereof, (B) at least one member selected from the group consisting of ammonia, ammonium salts, ethylene amine compounds, alkyl diamine compounds, and amino acids, and (C) a bromide.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: May 16, 2023
    Assignee: OKUNO CHEMICAL INDUSTRIES CO., LTD.
    Inventors: Yusuke Yoshikane, Koji Kita
  • Publication number: 20170283979
    Abstract: An object of the invention is to provide a jig electrolytic stripper that can sufficiently remove palladium adhered to the current-conducting portion of a plating jig, that can remove palladium adhered to the insulating-material-coated portion of the jig, and that exhibits reduced erosion of the metal of the current-conducting portion of the jig. The jig electrolytic stripper comprises the following components (A) to (C): (A) at least one member selected from the group consisting of nitric acid and salts thereof, (B) at least one member selected from the group consisting of ammonia, ammonium salts, ethylene amine compounds, alkyl diamine compounds, and amino acids, and (C) a bromide.
    Type: Application
    Filed: January 29, 2016
    Publication date: October 5, 2017
    Applicant: OKUNO CHEMICAL INDUSTRIES CO., LTD.
    Inventors: Yusuke Yoshikane, Koji Kita
  • Patent number: 8394289
    Abstract: A composition for the etching treatment of a resin molded article. The composition is composed of an aqueous solution containing 20 to 1,200 g/l of an inorganic acid, 0.01 to 10 g/l of a manganese salt, and 1 to 200 g/l of at least one component selected from the group consisting of halogen oxoacids, halogen oxoacid salts, persulfate salts, and bismuthate salts. The etching composition of the invention is an etching solution capable of forming a plating film having a good adhesion to various resin molded articles made of ABS resins or the like, and can be used in place of chromic acid mixtures. The composition is highly safe so that the liquid waste is easily disposed of.
    Type: Grant
    Filed: March 2, 2007
    Date of Patent: March 12, 2013
    Assignee: Okuno Chemicals Industries Co., Ltd.
    Inventors: Kazuya Satou, Yusuke Yoshikane
  • Publication number: 20100155255
    Abstract: The present invention provides a pretreatment process for electroless plating of a resin molded article, comprising etching the resin molded article using a manganate salt-containing etching solution, and then bringing the resin molded article into contact with an aqueous solution containing a reducing compound and an inorganic acid; and a plating process of a resin molded article comprising the pretreatment process. Further, the present invention provides various treatment agents for use in the plating process. According to the present invention, a plating layer with sufficient adhesion can be formed when an etching treatment is performed using a manganate salt-containing etching solution in an electroless plating treatment of a resin molded article.
    Type: Application
    Filed: May 16, 2008
    Publication date: June 24, 2010
    Applicant: OKUNO CHEMICAL INDUSTRIES CO., LTD.
    Inventors: Toshimitsu Nagao, Yusuke Yoshikane, Junji Yoshikawa, Toru Morimoto, Toshiya Murata, Kazuya Satou
  • Publication number: 20090092757
    Abstract: The present invention provides a composition for the etching treatment of a resin molded article. The composition is composed of an aqueous solution containing 20 to 1,200 g/l of an inorganic acid, 0.01 to 10 g/l of a manganese salt, and 1 to 200 g/l of at least one component selected from the group consisting of halogen oxoacids, halogen oxoacid salts, persulfate salts, and bismuthate salts. The etching composition of the invention is a novel etching solution capable of forming a plating film having a good adhesion to various resin molded articles made of ABS resins or the like, and can be used in place of chromic acid mixtures. The composition is highly safe so that the liquid waste is easily disposed of.
    Type: Application
    Filed: March 2, 2007
    Publication date: April 9, 2009
    Applicant: OKUNO CHEMICAL INDUSTRIES CO., LTD.
    Inventors: Kazuya Satou, Yusuke Yoshikane