Abstract: In order to specify a dust emitting mechanism portion, a wafer must be provided near a mechanism portion in operation and the mechanism portion must be operated so that foreign matter sticks to a surface of the wafer. A mechanism that allows foreign matter to stick to a wafer by repeating operation of each of particular portions in a device and thus intentionally bringing about dust emission is provided. For example, the device includes a control device, a sample chamber in which a sample is processed, and a mechanism that loads and unloads a sample to and from the sample chamber, the mechanism has a plurality of portions, the control device has a script, and a particular portion of the plurality of portions of the mechanism is repeatedly operated as the control device executes the script.

Abstract: A charged particle beam device that appropriately maintains a throughput of the device for each of specimens different in a gas emission volume from each other is provided. A scanning electron microscope includes an electron source, a specimen stage, a specimen chamber, and an exchange chamber, and further includes a vacuum gauge that measures an internal pressure of the exchange chamber, a time counting unit that counts time taken when a measurement result by the vacuum gauge has reached a predetermined degree of vacuum, and an integral control unit that performs comparative calculation and determination based on a measurement result by the time counting unit and integral control based on a process flow. And, the integral control unit controls changing of a content of a subsequent process based on a shift of the degree of vacuum of the exchange chamber.

Abstract: In order to specify a dust emitting mechanism portion, a wafer must be provided near a mechanism portion in operation and the mechanism portion must be operated so that foreign matter sticks to a surface of the wafer. A mechanism that allows foreign matter to stick to a wafer by repeating operation of each of particular portions in a device and thus intentionally bringing about dust emission is provided. For example, the device includes a control device, a sample chamber in which a sample is processed, and a mechanism that loads and unloads a sample to and from the sample chamber, the mechanism has a plurality of portions, the control device has a script, and a particular portion of the plurality of portions of the mechanism is repeatedly operated as the control device executes the script.

Abstract: A charged particle beam device that appropriately maintains a throughput of the device for each of specimens different in a gas emission volume from each other is provided. A scanning electron microscope includes an electron source, a specimen stage, a specimen chamber, and an exchange chamber, and further includes a vacuum gauge that measures an internal pressure of the exchange chamber, a time counting unit that counts time taken when a measurement result by the vacuum gauge has reached a predetermined degree of vacuum, and an integral control unit that performs comparative calculation and determination based on a measurement result by the time counting unit and integral control based on a process flow.