Patents by Inventor Yuta FUKUSHIMA

Yuta FUKUSHIMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250004371
    Abstract: A chemically amplified positive resist composition is provided comprising a polymer comprising repeat units having a phenolic hydroxy group protected with a tertiary ether type acid labile group and an acid generator capable of generating a fluorinated aromatic sulfonic acid. A resist pattern with a high resolution, reduced LER, rectangularity, minimized influence of develop loading, and few development residue defects can be formed.
    Type: Application
    Filed: June 7, 2024
    Publication date: January 2, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Kenji Funatsu, Keiichi Masunaga, Masaaki Kotake, Yuta Matsuzawa
  • Patent number: 12179182
    Abstract: A method for making a functional structural body includes a skeletal body of a porous structure composed of a zeolite-type compound, and at least one type of metallic nanoparticles present in the skeletal body, the skeletal body having channels connecting with each other, the metallic nanoparticles being present at least in the channels of the skeletal body.
    Type: Grant
    Filed: April 19, 2023
    Date of Patent: December 31, 2024
    Assignees: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, FURUKAWA ELECTRIC CO., LTD.
    Inventors: Takao Masuda, Yuta Nakasaka, Takuya Yoshikawa, Sadahiro Kato, Masayuki Fukushima, Kojiro Inamori, Hiroko Takahashi, Yuichiro Banba, Kaori Sekine
  • Patent number: 12179183
    Abstract: A functional structure which can resist a decrease in the functions of the functional material caused by influences such as force and heat and thus have a long life. The functional structure includes supports each having a porous structure and including a zeolite-type compound, and at least one functional material present in the supports, in which each of the supports has channels communicating with one another, the functional material is present at least in the channel of each of the supports, the functional material present in the supports includes a metal element (M), and the content of the metal element (M) is more than 2.5 mass % with respect to the functional structure.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: December 31, 2024
    Assignees: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, FURUKAWA ELECTRIC CO., LTD.
    Inventors: Mai Nishii, Yuichiro Banba, Kaori Sekine, Yukako Nakai, Masayuki Fukushima, Sadahiro Kato, Takao Masuda, Yuta Nakasaka, Takuya Yoshikawa
  • Publication number: 20240427241
    Abstract: The chemically amplified negative resist composition has improved in resolution during pattern formation, which can form a resist pattern having improved LER, fidelity, and dose margin. The chemically amplified negative resist composition comprises a polymer comprising repeat units derived from a monomer having a dehydrating functional group is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER, fidelity, and dose margin.
    Type: Application
    Filed: May 31, 2024
    Publication date: December 26, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Keiichi Masunaga, Kenji Funatsu, Masaaki Kotake, Yuta Matsuzawa
  • Patent number: 12168222
    Abstract: A synthesis gas production catalyst structure or the like which can maintain stable high catalytic activity for a long period of time without degradation and can allow efficient production of a synthesis gas including carbon monoxide and hydrogen. The synthesis gas production catalyst structure 1 for use in producing a synthesis gas comprising carbon monoxide and hydrogen, the synthesis gas production catalyst structure 1 including: supports each having a porous structure and including a zeolite-type compound; and at least one catalytic material present in the support, in which each of the supports has channels communicating with one another, each of the supports has a ratio (L/d ratio) of long side dimension L to thickness dimension d of 5.0 or more, and the catalytic material is present at least in the channel of each of the supports.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: December 17, 2024
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Yuichiro Banba, Kaori Sekine, Yukako Nakai, Mai Nishii, Masayuki Fukushima, Sadahiro Kato, Atsushi Shimoyamada, Tomohiko Mori, Takao Masuda, Yuta Nakasaka, Takuya Yoshikawa
  • Publication number: 20240409095
    Abstract: An information processing device that generates information regarding vehicle driving, the information processing device periodically estimating a factor causing a first vehicle to stop based on information collected from a second vehicle preceding the first vehicle., determining whether or not the first vehicle needs to stop and the stopping position based on the result of the estimation; and when it is determined that the first vehicle needs to stop at the stopping position, the first vehicle It has a control unit that generates a driving plan including a deceleration pattern for stopping the vehicle at a stopping position, and executes the following, and the control unit is configured to shorten the estimation cycle when the certainty of the estimation is lower.
    Type: Application
    Filed: February 13, 2024
    Publication date: December 12, 2024
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Yusuke YAMAURA, Shintaro FUKUSHIMA, Takeyuki SASAI, Yuta FUKASAWA, Koichi SEKI, Jiawei YONG, Yuho YOKOI
  • Publication number: 20240402599
    Abstract: A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and an aromatic carboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.
    Type: Application
    Filed: April 30, 2024
    Publication date: December 5, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima, Masaaki Kotake, Yuta Matsuzawa
  • Publication number: 20240385517
    Abstract: A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and an aromatic carboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.
    Type: Application
    Filed: May 1, 2024
    Publication date: November 21, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima, Masaaki Kotake, Yuta Matsuzawa
  • Publication number: 20240385360
    Abstract: An optical film having good alignment properties of a liquid crystal compound in an optically anisotropic layer while suppressing an occurrence of bright point defects, an optically anisotropic layer, a composition for forming an alignment film, a method for producing an optical film, a polarizing plate, and an image display device. The optical film includes an alignment film and an optically anisotropic layer, in which the optically anisotropic layer is a layer formed of a composition for forming an optically anisotropic layer, containing a polymerizable liquid crystal compound, and the alignment film is a film formed of a composition for forming an alignment film, containing an additive having an alkyl group having 5 to 29 carbon atoms and a polymer having no alkyl group having 5 to 29 carbon atoms.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 21, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Yuta FUKUSHIMA, Shinpei YOSHIDA, Tomonori MIMURA, Shun KITAWAKI, Yuta TAKAHASHI
  • Patent number: 12145138
    Abstract: A catalyst structure that allows prevention of aggregation of fine particles of a functional material, suppresses decrease of catalyst activity, and thus enables the extension of the lifetime of the catalyst structure. A catalyst structure is provided with: a support that is formed from a zeolite-type compound and has a porous structure; and at least one functional material present in the support. The functional material includes a first element that is at least one metallic element selected from the group consisting of cobalt, nickel, and iron. The support has paths connected to each other. The functional material including the first element is present in at least the paths of the support.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: November 19, 2024
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Yukako Nakai, Yuichiro Banba, Kaori Sekine, Mai Nishii, Masayuki Fukushima, Sadahiro Kato, Takao Masuda, Yuta Nakasaka, Takuya Yoshikawa
  • Publication number: 20240377741
    Abstract: A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and a fluorocarboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.
    Type: Application
    Filed: April 30, 2024
    Publication date: November 14, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima, Masaaki Kotake, Yuta Matsuzawa
  • Publication number: 20240377738
    Abstract: A chemically amplified negative resist composition comprising (A) a quencher in the form of an onium salt containing an anion having a nitrogen-containing aliphatic heterocycle and a fluorocarboxylic acid structure and (B) a base polymer is provided. The resist composition forms a pattern of rectangular profile with improved LER, resolution, fidelity, and dose margin.
    Type: Application
    Filed: May 8, 2024
    Publication date: November 14, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima, Masaaki Kotake, Yuta Matsuzawa
  • Patent number: 12115523
    Abstract: To provide a functional structural body that can realize a long life time by suppressing the decline in function of the functional substance and that can attempt to save resources without requiring a complicated replacement operation, and to provide a method for making the functional structural body. The functional structural body (1) includes a skeletal body (10) of a porous structure composed of a zeolite-type compound, and at least one functional substance (20) present in the skeletal body (10), the skeletal body (10) has channels (11) connecting with each other, and the functional substance is present at least in the channels (11) of the skeletal body (10).
    Type: Grant
    Filed: February 17, 2023
    Date of Patent: October 15, 2024
    Assignees: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, FURUKAWA ELECTRIC CO., LTD.
    Inventors: Takao Masuda, Yuta Nakasaka, Takuya Yoshikawa, Sadahiro Kato, Masayuki Fukushima, Kojiro Inamori, Hiroko Takahashi, Yuichiro Banba, Kaori Sekine
  • Patent number: 12109556
    Abstract: A functional structure which can suppress functional degradation of a functional material to achieve longer life, which can save resources without complicated replacement operations, and which, used for example as a catalyst, exhibits excellent catalytic activity. The functional structure includes supports each having a porous structure and including a zeolite-type compound, and at least one functional material present in the supports and including a metal element (M), in which each of the supports has channels communicating with one another, the functional material is present at least in the channel of each of the supports, and the metal element (M) having constituted the functional material is partially substituted with an element having constituted the supports.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: October 8, 2024
    Assignees: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, FURUKAWA ELECTRIC CO., LTD.
    Inventors: Yuichiro Banba, Kaori Sekine, Yukako Nakai, Mai Nishii, Masayuki Fukushima, Sadahiro Kato, Hirokazu Sasaki, Shinsuke Nishida, Takao Masuda, Yuta Nakasaka, Takuya Yoshikawa
  • Publication number: 20240329532
    Abstract: An acetal modifier affording a triple bond-bearing group serving as a protective group for an aliphatic or aromatic hydroxy group is provided as well as a polymer adapted to turn alkali soluble as a result of deprotection under the action of acid, the polymer comprising repeat units A1 having on side chain a structure including an aromatic hydroxy group protected with a triple bond-bearing group acid labile group. A chemically amplified positive resist composition comprising the polymer is also provided.
    Type: Application
    Filed: March 8, 2024
    Publication date: October 3, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Kenji Funatsu, Keiichi Masunaga, Masaaki Kotake, Yuta Matsuzawa
  • Publication number: 20240329522
    Abstract: A chemically amplified negative resist composition comprising (A) a photoacid generator in the form of an onium salt of aromatic sulfonic acid whose anion has a ring structure fused to an aromatic ring having a sulfo group bonded thereto and another aromatic ring structure containing a bulky substituent and (B) a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER and fidelity.
    Type: Application
    Filed: March 20, 2024
    Publication date: October 3, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Keiichi Masunaga, Masaaki Kotake, Yuta Matsuzawa
  • Patent number: 12104124
    Abstract: An apparatus and method for producing hydrocarbons including aromatic hydrocarbons and lower olefins including propylene from CH4 and CO2 through CO and H2 with high activity and high selectivity.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: October 1, 2024
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Yuichiro Banba, Kaori Sekine, Yukako Nakai, Mai Nishii, Masayuki Fukushima, Sadahiro Kato, Takao Masuda, Yuta Nakasaka, Takuya Yoshikawa
  • Patent number: 12070740
    Abstract: A catalyst structure that allows prevention of aggregation of fine particles of a functional substance, suppresses decrease of catalyst activity, and thus enables extension of the lifetime of the catalyst structure. A catalyst structure has a carrier that is formed from a zeolite-type compound and has a porous structure. The functional substance includes a first element that is at least one metallic element selected from the group consisting of cobalt (Co), nickel (Ni), iron (Fe), and ruthenium (Ru), and at least one second element selected from the group consisting of metallic elements in group 1, group 2, group 4, group 7, and group 12 on the periodic table. The carrier has paths connected to each other. The functional substance is present in at least the paths of the carrier.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: August 27, 2024
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Kaori Sekine, Yuichiro Banba, Yukako Nakai, Mai Nishii, Masayuki Fukushima, Sadahiro Kato, Takao Masuda, Yuta Nakasaka, Takuya Yoshikawa
  • Patent number: 12075556
    Abstract: The first and second electronic components are mounted on a printed circuit board. A temperature indicating resin comes in contact with not the second electronic component but the first electronic component. The temperature indicating resin visually changes upon increase in the temperature. Alternatively, an electronic component is mounted on the printed circuit board. The temperature indicating resin comes in contact with not the electronic component but the printed circuit board. The temperature indicating resin visually changes upon increase in the temperature.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: August 27, 2024
    Assignee: Mitsubishi Electric Corporation
    Inventor: Yuta Fukushima
  • Publication number: 20240280900
    Abstract: This invention relates to an onium salt, a chemically amplified positive resist composition, and a resist pattern forming process. The invention provides an onium salt capable of generating an acid having an adequate acid strength and low diffusion, a chemically amplified positive resist composition comprising the onium salt, and a resist pattern forming process using the composition. The chemically amplified positive resist composition comprises an onium salt capable of generating an acid having an adequate acid strength and suppressed diffusion is provided.
    Type: Application
    Filed: January 4, 2024
    Publication date: August 22, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Keiichi Masunaga, Masaaki Kotake, Yuta Matsuzawa