Patents by Inventor Yuta Iwasawa

Yuta Iwasawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11835857
    Abstract: A resist composition that contains a base material component (A), a first acid generator, and a second acid generator, the first acid generator is a compound represented by General Formula (b1), the second acid generator is a compound (B2) having an anion moiety having a molar volume of 250 cm3/mol or less, and the molar volume of the anion moiety of the compound (B2) is smaller than the molar volume of the anion moiety of the compound (B1). In the formula, Rb0 represents a specific condensed cyclic group, Yb0 represents a divalent linking group, Vb0 represents a single bond, Rc1 represents an aryl group having an electron-withdrawing group, Rc2 and Rc3 each independently represent an aryl group or are bonded to each other to form a ring together with a sulfur atom in the formula.
    Type: Grant
    Filed: June 23, 2021
    Date of Patent: December 5, 2023
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yuta Iwasawa, Yosuke Suzuki, Tasuku Matsumiya
  • Publication number: 20220121118
    Abstract: A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1) and containing a compound (D0) represented by General Formula (d0), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Mm+ represents an m-valent organic cation, and Rd0 represents a substituent
    Type: Application
    Filed: October 6, 2021
    Publication date: April 21, 2022
    Inventors: Masahito YAHAGI, Tasuku MATSUMIYA, Yosuke SUZUKI, Yuta IWASAWA, Takahiro KOJIMA, Koshi ONISHI
  • Publication number: 20220121116
    Abstract: A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formulae (a0-1) and one or more compounds selected from the group consisting of a compound (B01) represented by General Formula (b0-1) and a compound (B02) represented by General Formula (b0-2), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Rb1 and Rb4 represents an aryl group having a fluorine atom, Rb2, Rb3, and Rb5 represents an aryl group or the like which may have a substituent, and X01? and X02? represents a counter anion
    Type: Application
    Filed: October 11, 2021
    Publication date: April 21, 2022
    Inventors: Koshi ONISHI, Masatoshi ARAI, Masahito YAHAGI, Yosuke SUZUKI, Yuta IWASAWA
  • Publication number: 20210405527
    Abstract: A resist composition that contains a base material component (A), a first acid generator, and a second acid generator, the first acid generator is a compound represented by General Formula (b1), the second acid generator is a compound (B2) having an anion moiety having a molar volume of 250 cm3/mol or less, and the molar volume of the anion moiety of the compound (B2) is smaller than the molar volume of the anion moiety of the compound (B1).
    Type: Application
    Filed: June 23, 2021
    Publication date: December 30, 2021
    Inventors: Yuta IWASAWA, Yosuke SUZUKI, Tasuku MATSUMIYA
  • Patent number: 11029600
    Abstract: A resist composition including a resin component having more than 30 mol % of a structural unit represented by formula (a0-1), and an acid generator represented by formula (b1) in which R01 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Va01 represents an alkylene group; Ra01 represents an acid dissociable group; Rb01 represents an cyclic hydrocarbon group; Lb01 represents —O—C(?O)— or —C(?O)—O—; Yb01 represents a divalent linking group or a single bond; Vb01 represents a fluorinated alkylene group; Rb02 represents a fluorine atom or a hydrogen atom; provided that the total number of fluorine atoms contained in Vb01 and Rb02 is 2 or 3; and Mm+ represents an m-valent organic cation.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: June 8, 2021
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehito Seo, Tomoyuki Hirano, Yuta Iwasawa, Yusuke Itagaki
  • Publication number: 20210129410
    Abstract: A laminate including at least a heat-sensitive adhesive layer, a substrate layer, and a protective layer in this order, wherein the substrate layer has a thermoplastic resin film, the heat-sensitive adhesive layer contains a higher fatty acid amide, and the protective layer contains a silicone-based release agent. An in-mold label comprising this laminate. A molded body obtained by affixing this in-mold label. An in-mold label in the form of a roll obtained by winding this in-mold label. This invention provides an in-mold label that is less susceptible to dirt and scratches, excellent in decorativeness and visibility, less likely to cause friction when the labels are stacked on each other, and easy to handle, and has strong adhesive strength to a molded body.
    Type: Application
    Filed: March 29, 2019
    Publication date: May 6, 2021
    Applicant: YUPO Corporation
    Inventors: Yuta IWASAWA, Shunsuke HONDA, Masahiko UENO
  • Publication number: 20200081345
    Abstract: A resist composition including a resin component having more than 30 mol % of a structural unit represented by formula (a0-1), and an acid generator represented by formula (b1) in which R01 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Va01 represents an alkylene group; Ra01 represents an acid dissociable group; Rb01 represents an cyclic hydrocarbon group; Lb01 represents —O—C(?O)— or —C(?O)—O—; Yb01 represents a divalent linking group or a single bond; Vb01 represents a fluorinated alkylene group; Rb02 represents a fluorine atom or a hydrogen atom; provided that the total number of fluorine atoms contained in Vb01 and Rb02 is 2 or 3; and Mm+ represents an m-valent organic cation.
    Type: Application
    Filed: August 8, 2019
    Publication date: March 12, 2020
    Inventors: Takehito SEO, Tomoyuki HIRANO, Yuta IWASAWA, Yusuke ITAGAKI
  • Patent number: 10437147
    Abstract: A resist composition which includes a polymer compound including a structural unit which is derived from an acrylic ester in which the hydrogen atom bonded to an ?-position carbon atom may be substituted with a substituent and which has a lactone-containing cyclic group containing other electron withdrawing groups such as a cyano group at a side chain terminal, and a compound whose a conjugate acid has an acid dissociation constant (pKa) of less than 3.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: October 8, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi Nagamine, Yuta Iwasawa
  • Patent number: 10360823
    Abstract: A label containing a base layer (A) and an adhesive layer (C) provided in contact with one surface of the base layer (A), wherein the base layer (A) contains a thermoplastic resin and at least one of inorganic fine powder and an organic filler, and the base layer (A) is stretched in at least one direction, and the film has an internal bond strength measured according to TAPPI T569 of from 0.4 to 0.95 kg·cm on a side of the adhesive layer (C) and from 0.4 to 1.5 kg·cm on a side opposite thereto, is easily recognized by the naked eye for the fact that the film has been peeled from an adherend, and is difficult to be restored by re-adhering after peeling.
    Type: Grant
    Filed: May 19, 2015
    Date of Patent: July 23, 2019
    Assignee: YUPO CORPORATION
    Inventors: Yuta Iwasawa, Kazuhisa Kitamura, Takahiro Zama
  • Publication number: 20190009491
    Abstract: The present invention provides an easily peelable laminate label including a base layer A, a brittle layer B, a visually recognizable layer C, an inhibition layer D, and a pressure-sensitive adhesive layer E; the brittle layer B, the visually recognizable layer C, and the inhibition layer D being laminated in this order between the base layer A and the pressure-sensitive adhesive layer E; the brittle layer B and the visually recognizable layer C being in contact with each other, the visually recognizable layer C and the inhibition layer D being in contact with each other, the inhibition layer D being disposed in a discontinuous pattern; and a form of failure when the easily peelable laminate label is subjected to 180° peeling being delamination and/or adhesive failure at an interface between the inhibition layer D and the layer in contact with the inhibition layer D.
    Type: Application
    Filed: July 25, 2016
    Publication date: January 10, 2019
    Applicant: YUPO CORPORATION
    Inventors: Yuta IWASAWA, Takahiro ZAMA, Kazuhisa KITAMURA
  • Patent number: 9937742
    Abstract: Provided is a thermoplastic resin film comprising a base layer (A) containing a thermoplastic resin and a coating layer (B) provided on at least one surface of the base layer (A), the coating layer (B) containing components derived from (a) an emulsion containing resin particles formed from an olefin-based copolymer and (b) an ethyleneimine-based resin, wherein the thermoplastic resin film is characterized in that a volume-average particle size of the resin particles contained in the emulsion is from 0.1 to 0.72 ?m. The thermoplastic resin film has good coloring performance during printing using gold ink and/or silver ink, has conventional transferability and adhesiveness even in hot melt transfer, and shows little generation of paper dust.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: April 10, 2018
    Assignee: TUPO CORPORATION
    Inventors: Takahiro Zama, Yuta Iwasawa, Masahiro Yamada
  • Patent number: 9902182
    Abstract: Provided is a thermoplastic resin film comprising a base layer (A) containing a thermoplastic resin and a coating layer (B) provided on at least one surface of the base layer (A), the coating layer (B) containing components derived from (a) an emulsion containing resin particles formed from an olefin-based copolymer and (b) an ethyleneimine-based resin, wherein the thermoplastic resin film is characterized in that a volume-average particle size of the resin particles contained in the emulsion is from 0.1 to 0.72 ?m. The thermoplastic resin film has good coloring performance during printing using gold ink and/or silver ink, has conventional transferability and adhesiveness even in hot melt transfer, and shows little generation of paper dust.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: February 27, 2018
    Assignee: TUPO CORPORATION
    Inventors: Takahiro Zama, Yuta Iwasawa, Masahiro Yamada
  • Patent number: 9890233
    Abstract: A polymeric compound including a structural unit (a0) represented by general formula (a0-1) shown below and a polycyclic group-containing structural unit (a2m) other than the structural unit (a0), the structural unit (a2m) containing a lactone-containing polycyclic group, a —SO2-containing polycyclic group or a carbonate-containing polycyclic group, and a resist composition including the same: wherein R0 represents a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent, or a hydrogen atom; Ya0 represents a single bond or a divalent linking group; L represents an ester bond; and Ra0 represents a polycyclic group having a bridged ring polycyclic skeleton or a condensed ring polycyclic skeleton, which has in its skeleton —C(?O)O— or —SO2—, and at least one of an alkyl group, an alkoxy group, a halogen atom and a halogenated alkyl group.
    Type: Grant
    Filed: January 14, 2015
    Date of Patent: February 13, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Miki Shinomiya, Tomoyuki Hirano, Kotaro Endo, Yuta Iwasawa
  • Publication number: 20170285469
    Abstract: A resist composition which includes a polymer compound including a structural unit which is derived from an acrylic ester in which the hydrogen atom bonded to an ?-position carbon atom may be substituted with a substituent and which has a lactone-containing cyclic group containing other electron withdrawing groups such as a cyano group at a side chain terminal, and a compound whose a conjugate acid has an acid dissociation constant (pKa) of less than 3.
    Type: Application
    Filed: March 28, 2017
    Publication date: October 5, 2017
    Inventors: Takashi NAGAMINE, Yuta IWASAWA
  • Publication number: 20170140676
    Abstract: A label containing a base layer (A) and an adhesive layer (C) provided in contact with one surface of the base layer (A), wherein the base layer (A) contains a thermoplastic resin and at least one of inorganic fine powder and an organic filler, and the base layer (A) is stretched in at least one direction, and the film has an internal bond strength measured according to TAPPI T569 of from 0.4 to 0.95 kg·cm on a side of the adhesive layer (C) and from 0.4 to 1.5 kg·cm on a side opposite thereto, is easily recognized by the naked eye for the fact that the film has been peeled from an adherend, and is difficult to be restored by re-adhering after peeling.
    Type: Application
    Filed: May 19, 2015
    Publication date: May 18, 2017
    Applicant: YUPO CORPORATION
    Inventors: Yuta IWASAWA, Kazuhisa KITAMURA, Takahiro ZAMA
  • Patent number: 9494860
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, an acid generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound component (D), wherein the acid generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below, and the nitrogen-containing organic compound component (D) includes a compound (D1) represented by general formula (d1) shown below. In the formula, Y0 represents an alkylene group of 1 to 4 carbon atoms which may have a substituent, R0 represents an alkyl group, alkoxy group, halogen atom, halogenated alkyl group, hydroxyl group or oxygen atom (?O), p represents 0 or 1, and Z+ represents an organic cation.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: November 15, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Kurosawa, Kotaro Endo, Yuichi Suzuki, Yuta Iwasawa
  • Patent number: 9475330
    Abstract: Provided is a composition for a printing medium and a printing medium that can be suitably used for a plurality of printing methods, including a plurality of plateless printing methods such as thermal transfer printing, electrophotographic printing, and inkjet printing methods. A coating layer is provided on at least one surface of a support body, and includes (a) a cationic urethane-based resin, (b) an olefin copolymer emulsion, and (c) an ethyleneimine-based resin. The solid mass of the coating layer on one surface of the support body may be 0.01-5 g/m2.
    Type: Grant
    Filed: June 5, 2015
    Date of Patent: October 25, 2016
    Assignee: YUPO CORPORATION
    Inventors: Takahiro Zama, Yuta Iwasawa, Kazuyuki Kimura
  • Publication number: 20160250876
    Abstract: Provided is a thermoplastic resin film comprising a base layer (A) containing a thermoplastic resin and a coating layer (B) provided on at least one surface of the base layer (A), the coating layer (B) containing components derived from (a) an emulsion containing resin particles formed from an olefin-based copolymer and (b) an ethyleneimine-based resin, wherein the thermoplastic resin film is characterized in that a volume-average particle size of the resin particles contained in the emulsion is from 0.1 to 0.72 ?m. The thermoplastic resin film has good coloring performance during printing using gold ink and/or silver ink, has conventional transferability and adhesiveness even in hot melt transfer, and shows little generation of paper dust.
    Type: Application
    Filed: October 31, 2014
    Publication date: September 1, 2016
    Applicant: YUPO CORPORATION
    Inventors: Takahiro ZAMA, Yuta IWASAWA, Masahiro YAMADA
  • Patent number: 9244357
    Abstract: A method for forming a negative type resist pattern having a high residual film rate of exposed areas of a resist film by heating an exposed resist film and subjecting it to patterning by negative type development with a developing solution containing an organic solvent, in which a resist composition containing a high-molecular weight compound having a constituent unit represented by a particular general formula.
    Type: Grant
    Filed: January 14, 2014
    Date of Patent: January 26, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yuta Iwasawa, Kotaro Endo, Junichi Tsuchiya
  • Publication number: 20160009018
    Abstract: Problem: To provide an in-mold label for stretch blow molding having excellent adhesiveness of the label particularly after molding of a molded product. Furthermore, to provide a labeled stretch blow molded product that uses the label. Resolution Means: An in-mold label for stretch blow molding, the in-mold label comprising a substrate layer (I) and a heat sealable resin layer (II), the substrate layer (I) comprising a thermoplastic resin and an inorganic fine powder, the heat sealable resin layer (II) comprising a coating layer formed by applying a coating solution containing an ethylene-based copolymer on the substrate layer (I) and drying.
    Type: Application
    Filed: March 3, 2014
    Publication date: January 14, 2016
    Applicant: YUPO CORPORATION
    Inventors: Takashi FUNATO, Yuta IWASAWA