Abstract: Provided is an electronic pen that includes a body portion housing of an electronic pen body portion has housed therein a refill body and a circuit board having a side switch formed by a push button switch mounted thereon, and has a pen-point opening portion through which a pen point of the refill body protrudes. A pressing member is provided in a side opening portion of the body portion housing such that the pressing member is disposed on the side switch in such a manner as to be prevented by an engagement portion from protruding outwardly from a side surface of the body portion housing. The side switch of the circuit board is operated through the pressing member of the electronic pen body portion when an operation unit of the outer housing having the electronic pen body portion installed therein is pressed.

Abstract: A resist underlayer film for a resist pattern formation by developing a resist with organic solvent after exposure of resist. Method for manufacturing a semiconductor includes: applying onto a substrate a resist underlayer film forming composition including hydrolyzable silanes, hydrolysis products of hydrolyzable silanes, hydrolysis-condensation products of hydrolyzable silanes, or a combination thereof. Hydrolyzable silanes being silane of Formulas (1), (2) and (3).

Abstract: A liquid crystal cured layer formed of a cured product of a liquid crystal composition, wherein the liquid crystal composition contains a polymerizable liquid crystal compound having a reverse wavelength dispersion property, and a copolymer containing a monomer unit A including a monovalent group containing an aromatic ring and a monomer unit B containing a monovalent aliphatic hydrocarbon group optionally having a substituent, a main chain mesogen of the polymerizable liquid crystal compound in the liquid crystal cured layer is oriented at a tilt angle of 85° to 90° with respect to a layer plane of the liquid crystal cured layer.

Abstract: There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising a hydrolyzable organosilane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof as a silane, wherein a silane having a cyclic amino group is contained in an amount of less than 1% by mole, preferably 0.01 to 0.95% by mole. A film forming composition comprising a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. A resist underlayer film forming composition for lithography comprising a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The cyclic amino group may be a secondary amino group or a tertiary amino group.

Abstract: Provided is a charge transporting composition that gives a charge transporting thin film having high transparency and excellent flatness. Also provided is an organic EL device that exhibits excellent characteristics. A charge transporting thin film prepared using a composition containing a polythiophene compound, metal oxide nanoparticles, a nonionic fluorine-containing surfactant and an organic solvent has high transparency and excellent flatness, and use of the charge transporting thin film as a hole injection layer allows an organic EL device having excellent characteristics to be obtained.

Abstract: A liquid crystal cured layer formed of a cured product of a liquid crystal composition, wherein the liquid crystal composition contains a polymerizable liquid crystal compound having a reverse wavelength dispersion property, and a copolymer containing a monomer unit A including a monovalent group containing an aromatic ring and a monomer unit B containing a monovalent aliphatic hydrocarbon group optionally having a substituent, a main chain mesogen of the polymerizable liquid crystal compound in the liquid crystal cured layer is oriented at a tilt angle of 85° to 90° with respect to a layer plane of the liquid crystal cured layer.

Abstract: The present invention relates to a non-aqueous ink composition containing (a) a polythiophene containing a repeating unit complying with formula (I); (b) metal oxide nanoparticles containing at least (b-1) a first metal oxide nanoparticle having an average primary particle diameter d1 and (b-2) a second metal oxide nanoparticle having an average primary particle diameter d2, wherein d1<d2; and (c) a liquid carrier containing one or more organic solvents, as well as a pile-up suppressor and a lifetime extension agent for an organic EL device, containing metal oxide nanoparticles containing at least the (b-1) and (b-2) described above, wherein d1<d2.

Abstract: A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.

Abstract: A cured-film formation composition that forms a cured film exhibiting excellent liquid-crystal orientation properties and excellent light transmission properties when the cured-film formation composition is used as an orientation material and a layer of a polymerizable liquid crystal is arranged thereon. A cured-film formation composition including a component (A) that is a compound obtained by reacting a cinnamic acid compound of Formula (1) below with a compound having at least one epoxy group in one molecule, wherein R1, R2, R3, R4, and R5 are each independently a substituent selected from a hydrogen atom, a halogen atom, a C1-6 alkyl, a C1-6 haloalkyl, a C1-6 alkoxy, a C1-6 haloalkoxy, cyano, and nitro; and a component (B) that is a cross-linking agent, an orientation material which is obtained from the composition, and a retardation material which is obtained from the composition.

Abstract: A liquid crystal alignment agent for photo-alignment for providing an aligning member has excellent photoreaction efficiency and is capable of aligning polymerizable liquid crystals with high sensitivity. A liquid crystal alignment agent for photo-alignment includes (A) a resin having a side chain including a structure of Formula (1) and (B) a compound of Formula (2), an alignment member obtained from the liquid crystal alignment agent, and a retardation member: wherein X1 is a benzene ring which may be arbitrarily substituted with an substituent, R is a substituent selected from OH and NH2, R1, R2, R3, R4 and R5 are each independently a substituent selected from a hydrogen atom, a halogen atom, C1-6 alkyl, C1-6 haloalkyl, etc., and n is an integer of 0 or 1.

Abstract: A resist underlayer film forming composition for lithography for a resist underlayer film usable as a hardmask. A resist underlayer film forming composition for lithography, including: as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1) or a hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2), and a content of the hydrolyzable silane of Formula (1) or the hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2) in all silanes is less than 50% by mole, R1aR2bSi(R3)4?(a+b)??Formula (1) R4a1R5b1Si(R6)4?(a1+b1)??Formula (2).

Abstract: A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.

Abstract: A cured-film formation composition suitable to form a cured film having liquid-crystal alignment properties. A cured-film formation composition including a component (A) that is one or more monomers having a group having a photo-alignment moiety and thermally reactive moiety, and a polymerizable group; component (B) that is at least one polymer selected from the group of components (B-1) to (B-3) (the component (B-1) being a polymer having, in a quantity of at least two of at least one group selected from the group of hydroxy group, carboxyl group, amide group, amino group, an alkoxysilyl group and group of Formula (2), component (B-2) being a polymer capable of thermally reacting with thermally reactive moiety of component (A) and is self-cross-linkable, and component (B-3) being a melamine formaldehyde resin); and component (C) that is a cross-linking agent; and an orientation material and retardation material which are formed of the cured-film formation composition.

Abstract: A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable liquid crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.

Abstract: A resist underlayer film composition for lithography, including: a silane: at least one among a hydrolyzable organosilane, a hydrolysis product thereof, and a hydrolysis-condensation product thereof, wherein the silane includes a silane having a cyclic organic group containing as atoms making up the ring, a carbon atom, a nitrogen atom, and a hetero atom other than a carbon and nitrogen atoms. The hydrolyzable organosilane may be a hydrolyzable organosilane of Formula (1), wherein, at least one group among R1, R2, and R3 is a group wherein a —Si(X)3 group bonds to C1-10 alkylene group, and other group(s) among R1, R2, and R3 is(are) a hydrogen atom, C1-10 alkyl group, or C6-40 aryl group; a cyclic organic group of 5-10 membered ring containing atoms making up the ring, a carbon atom, at least one of nitrogen, sulfur or oxygen atoms; and X is an alkoxy group, acyloxy group, or halogen atom.

Abstract: A liquid crystal alignment agent for photo-alignment for providing an aligning member has excellent photoreaction efficiency and is capable of aligning polymerizable liquid crystals with high sensitivity. A liquid crystal alignment agent for photo-alignment includes (A) a resin having a side chain including a structure of Formula (1) and (B) a compound of Formula (2), an alignment member obtained from the liquid crystal alignment agent, and a retardation member: wherein X1 is a benzene ring which may be arbitrarily substituted with an substituent, R is a substituent selected from OH and NH2, R1, R2, R3, R4 and R5 are each independently a substituent selected from a hydrogen atom, a halogen atom, C1-6 alkyl, C1-6 haloalkyl, etc., and n is an integer of 0 or 1.

Abstract: A cured-film formation composition that forms a cured film exhibiting excellent liquid-crystal orientation properties and excellent light transmission properties when the cured-film formation composition is used as an orientation material and a layer of a polymerizable liquid crystal is arranged thereon.

Abstract: There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising: a hydrolyzable organosilane having a urea group; a hydrolysis product thereof; or a hydrolysis-condensation product thereof.

Abstract: A cured-film formation composition suitable to form a cured film having liquid-crystal alignment properties. A cured-film formation composition including a component (A) that is one or more monomers having a group having a photo-alignment moiety and thermally reactive moiety, and a polymerizable group; component (B) that is at least one polymer selected from the group of components (B-1) to (B-3) (the component (B-1) being a polymer having, in a quantity of at least two of at least one group selected from the group of hydroxy group, carboxyl group, amide group, amino group, an alkoxysilyl group and group of Formula (2), component (B-2) being a polymer capable of thermally reacting with thermally reactive moiety of component (A) and is self-cross-linkable, and component (B-3) being a melamine formaldehyde resin); and component (C) that is a cross-linking agent; and an orientation material and retardation material which are formed of the cured-film formation composition.

Abstract: A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable liquid crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.