Abstract: A charged particle beam application apparatus includes a beam separator. The beam separator includes a first magnetic pole, a second magnetic pole facing the first magnetic pole, a first electrode and a second electrode that extend along an optical axis of a primary beam and are arranged in a first direction perpendicular to the optical axis, on a first surface of the first magnetic pole which faces the second magnetic pole, and a third electrode and a fourth electrode that extend along the optical axis and face the first electrode and the second electrode, respectively, on a second surface of the second magnetic pole which faces the first magnetic pole.

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample; a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed.

Abstract: This marker has: an optically transparent convex plastic lens section having a first surface that includes convex surface sections and flat surface sections, and a second surface that includes first regions and second regions other than the first regions, the second surface being disposed in a position on the reverse side to the first surface; a section to be detected that is formed in the first regions and/or the second regions; and a positioning section formed in those regions of the second surface that correspond to the flat surface sections, the positioning section indicating positions in the first regions that correspond to the convex surface sections. The first regions are concave sections or convex sections disposed in those regions of the second surface that correspond to the convex surface sections.

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

Abstract: A charged particle beam application apparatus includes a beam separator. The beam separator includes a first magnetic pole, a second magnetic pole facing the first magnetic pole, a first electrode and a second electrode that extend along an optical axis of a primary beam and are arranged in a first direction perpendicular to the optical axis, on a first surface of the first magnetic pole which faces the second magnetic pole, and a third electrode and a fourth electrode that extend along the optical axis and face the first electrode and the second electrode, respectively, on a second surface of the second magnetic pole which faces the first magnetic pole.

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

Abstract: To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.

Abstract: A transparent resin is injection molded to create a marker (10) as an integrally molded article (lenticular lens portion (11)) including convex surfaces (112) and recesses (113) formed on the rear side of the convex surfaces. The recesses (113) are filled with coating films (115) formed by applying and curing a fluid coating material. Each recess (113) is arranged corresponding to a convex surface (112) so that the coating films (115) can be observed as optically distinguishable from the side of the convex surfaces (112).

Abstract: The present invention enlarges a range of movement of field of view by beam deflection with a simple deflector configuration and suppresses deterioration of a signal electron detection rate caused by the beam deflection. A scanning electron microscope according to the present invention is provided with a first deflection field setting module that sets plural deflectors to move a scanning area on a specimen by a primary electron beam to a position deviated from an axis extended from an electron source toward the center of an objective lens and a second deflection field setting module that sets the plural deflectors so that trajectories of signal electrons are corrected without changing the scanning area set by the first deflection field setting module. The control unit controls the plural deflectors by adding a setting value set by the second deflection field setting module to a setting value set by the first deflection field setting module.

Abstract: A transparent resin is injection molded to create a marker (10) as an integrally molded article (lenticular lens portion (11)) including convex surfaces (112) and recesses (113) formed on the rear side of the convex surfaces. The recesses (113) are filled with coating films (115) formed by applying and curing a fluid coating material. Each recess (113) is arranged corresponding to a convex surface (112) so that the coating films (115) can be observed as optically distinguishable from the side of the convex surfaces (112).

Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample: a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed.

Abstract: This marker comprises a plurality of convex-surface section disposed along the X-axis direction and a plurality of detection sections disposed so as to face the convex-surface sections. Each of the detection sections is located, in the protruding direction of the convex-surface sections, closer to the convex-surface section side than a focal point on an image surface of the convex-surface section of the first optical unit in the X direction and is located on a single plane located further on the opposite side from the protruding direction than the edge of the image surface. The image surface extends from the first optical unit to the nth optical unit in the X direction, where n is at least 2.

Abstract: The present invention provides a marker capable of reducing noises other than a detection target image. The marker (100) of the present invention includes a lens main body (101) that includes multiple lens units (102) and a substrate (106). The lens units (102) are arranged successively in a planar direction. The lens main body (101) has lens portions (103) on one surface side and has multiple detectable portions (105) that can be detected from the one surface side on the other surface side. The lens main body (101) is arranged on the substrate (106). The marker (100) further includes a non-scattering layer (108) between a surface of the substrate (106) on the lens main body (101) side and a surface of the lens main body (101) on the substrate (106) side.

Abstract: Cycle characteristics of a nonaqueous secondary battery are to be improved. An active material including: a first active material that contains a nano silicon produced by heating a layered polysilane represented by a composition formula (SiH)n and having a structure in which multiple six-membered rings formed from silicon atoms are connected; and a second active material that contains a graphite, is used in a negative electrode. With this, expansion and contraction due to stress during charging and discharging can be mitigated, and thereby cycle characteristics improve.

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

Abstract: This marker comprises a plurality of convex-surface section disposed along the X-axis direction and a plurality of detection sections disposed so as to face the convex-surface sections. Each of the detection sections is located, in the protruding direction of the convex-surface sections, closer to the convex-surface section side than a focal point on an image surface of the convex-surface section of the first optical unit in the X direction and is located on a single plane located further on the opposite side from the protruding direction than the edge of the image surface. The image surface extends from the first optical unit to the nth optical unit in the X direction, where n is at least 2.

Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.