Patents by Inventor Yuta MATSUSHIMA

Yuta MATSUSHIMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11337867
    Abstract: A disposable wearing article which enables the liquid absorbent structure to fit the body stably, without a shift in position of the waist opening edge part when worn. A liquid absorbent structure further has an end flap positioned between a front-end edge of the liquid absorbent structure and a front-end edge of an absorbent core. A front waist region has a stretchable sheet extending inward in a vertical direction Y from a waist opening edge and overlapping with the end flap, a plurality of waist elastic members extending in a lateral direction X and overlapping with at least the end flap, a first region positioned between the waist opening edge and the front-end edge of the liquid absorbent structure, and a second region including the stretchable sheet and the waist elastic members, at an inner side in the vertical direction Y of the front-end edge of the liquid absorbent structure.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: May 24, 2022
    Assignee: UNICHARM CORPORATION
    Inventors: Hideaki Maki, Takuya Inoue, Yuta Matsushima
  • Patent number: 11244849
    Abstract: Generation of dust from a peripheral portion of a substrate can be suppressed, and a processed substrate can be suppressed from being adversely affected by a pre-processed substrate. Further, an actual elevation state of the member configured to be moved up and down to support the substrate can be investigated. A substrate transfer device includes a first supporting portion, a second supporting portion and an elevating mechanism. The first supporting portion and the second supporting portion are configured to support a substrate from below the substrate. The elevating mechanism is configured to elevate the second supporting portion up and down between a first position higher than a height of the first supporting portion and a second position lower than the height of the first supporting portion. The substrate transfer device further includes a detecting mechanism configured to detect an elevation state of the second supporting portion.
    Type: Grant
    Filed: September 18, 2019
    Date of Patent: February 8, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Katsuhiro Morikawa, Yuta Matsushima
  • Publication number: 20200013666
    Abstract: Generation of dust from a peripheral portion of a substrate can be suppressed, and a processed substrate can be suppressed from being adversely affected by a pre-processed substrate. Further, an actual elevation state of the member configured to be moved up and down to support the substrate can be investigated. A substrate transfer device includes a first supporting portion, a second supporting portion and an elevating mechanism. The first supporting portion and the second supporting portion are configured to support a substrate from below the substrate. The elevating mechanism is configured to elevate the second supporting portion up and down between a first position higher than a height of the first supporting portion and a second position lower than the height of the first supporting portion. The substrate transfer device further includes a detecting mechanism configured to detect an elevation state of the second supporting portion.
    Type: Application
    Filed: September 18, 2019
    Publication date: January 9, 2020
    Inventors: Katsuhiro Morikawa, Yuta Matsushima
  • Patent number: 10460976
    Abstract: Generation of dust from a peripheral portion of a substrate can be suppressed, and a processed substrate can be suppressed from being adversely affected by a pre-processed substrate. Further, an actual elevation state of the member configured to be moved up and down to support the substrate can be investigated. A substrate transfer device includes a first supporting portion, a second supporting portion and an elevating mechanism. The first supporting portion and the second supporting portion are configured to support a substrate from below the substrate. The elevating mechanism is configured to elevate the second supporting portion up and down between a first position higher than a height of the first supporting portion and a second position lower than the height of the first supporting portion. The substrate transfer device further includes a detecting mechanism configured to detect an elevation state of the second supporting portion.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: October 29, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Katsuhiro Morikawa, Yuta Matsushima
  • Publication number: 20190247242
    Abstract: A disposable wearing article which enables the liquid absorbent structure to fit the body stably, without a shift in position of the waist opening edge part when worn. A liquid absorbent structure further has an end flap positioned between a front-end edge of the liquid absorbent structure and a front-end edge of an absorbent core. A front waist region has a stretchable sheet extending inward in a vertical direction Y from a waist opening edge and overlapping with the end flap, a plurality of waist elastic members extending in a lateral direction X and overlapping with at least the end flap, a first region positioned between the waist opening edge and the front-end edge of the liquid absorbent structure, and a second region including the stretchable sheet and the waist elastic members, at an inner side in the vertical direction Y of the front-end edge of the liquid absorbent structure.
    Type: Application
    Filed: November 21, 2017
    Publication date: August 15, 2019
    Inventors: Hideaki MAKI, Takuya INOUE, Yuta MATSUSHIMA
  • Publication number: 20170358479
    Abstract: Generation of dust from a peripheral portion of a substrate can be suppressed, and a processed substrate can be suppressed from being adversely affected by a pre-processed substrate. Further, an actual elevation state of the member configured to be moved up and down to support the substrate can be investigated. A substrate transfer device includes a first supporting portion, a second supporting portion and an elevating mechanism. The first supporting portion and the second supporting portion are configured to support a substrate from below the substrate. The elevating mechanism is configured to elevate the second supporting portion up and down between a first position higher than a height of the first supporting portion and a second position lower than the height of the first supporting portion. The substrate transfer device further includes a detecting mechanism configured to detect an elevation state of the second supporting portion.
    Type: Application
    Filed: June 6, 2017
    Publication date: December 14, 2017
    Inventors: Katsuhiro Morikawa, Yuta Matsushima
  • Publication number: 20130017143
    Abstract: An alkali-earth vanadate compound functioning as a phosphor is a reaction product of vanadium oxide and an alkaline-earth metal or salt thereof.
    Type: Application
    Filed: February 7, 2012
    Publication date: January 17, 2013
    Applicants: YAMAGATA UNIVERSITY, KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHO
    Inventors: Michimasa ITO, Yuta MATSUSHIMA, Masahiro HIRO-OKA