Patents by Inventor Yuta SHIGENOI
Yuta SHIGENOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12195579Abstract: The present invention provides a cell adhesion sheet in which the adhesion of platelets is suppressed and the adhesion of cells is excellent. The cell adhesion sheet according to the embodiment of the present invention is formed of a composition containing a compound represented by Formula (1).Type: GrantFiled: July 7, 2021Date of Patent: January 14, 2025Assignees: FUJIFILM Corporation, Kyushu University, National University CorporationInventors: Yosuke Yamamoto, Yuta Shigenoi, Atsushi Sugasaki, Masaru Tanaka, Shingo Kobayashi
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Publication number: 20240425754Abstract: An object of the present invention is to provide a composition for manufacturing a semiconductor, which is capable of selectively removing silicon in a case of being applied to an object to be treated containing silicon-germanium and silicon; a method for treating an object to be treated using the composition for manufacturing a semiconductor; and a method for manufacturing a semiconductor element using the composition for manufacturing a semiconductor. The composition for manufacturing a semiconductor according to the present invention is a composition which includes a specific compound having two or more sulfur atoms and one or more heteroatoms other than a sulfur atom, an organic solvent, and water, and is alkaline.Type: ApplicationFiled: August 19, 2024Publication date: December 26, 2024Applicant: FUJIFILM CorporationInventors: Yuta SHIGENOI, Atsushi MIZUTANI, Tomonori TAKAHASHI
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Publication number: 20240228876Abstract: An object of the present invention is to provide a treatment liquid for producing a semiconductor, which is capable of selectively removing Si in a case of being applied to an object to be treated containing SiGe and Si. The treatment liquid for manufacturing a semiconductor according to the present invention includes: a nitrogen-containing polymer; a quaternary ammonium hydroxide; an organic solvent having an SP value of 25 MPa1/2 or more; and water. Polyalkyleneimine is excluded from the nitrogen-containing polymer.Type: ApplicationFiled: March 13, 2024Publication date: July 11, 2024Applicant: FUJIFILM CorporationInventors: Yuta SHIGENOI, Atsushi Mizutani, Tomonori Takahashi
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Publication number: 20240026254Abstract: An object of the present invention is to provide a cleaning liquid for a semiconductor substrate, which has excellent cleaning performance and excellent ruthenium oxide dissolving ability in a case of being applied as a cleaning liquid after a CMP treatment of a semiconductor substrate including a metal film. A cleaning liquid for a semiconductor substrate according to the present invention is a cleaning liquid for a semiconductor substrate, which is used for cleaning a semiconductor substrate, where the cleaning liquid contains at least one purine compound selected from the group consisting of purine and a purine derivative and a compound represented by Formula (A).Type: ApplicationFiled: July 21, 2023Publication date: January 25, 2024Applicant: FUJIFILM CorporationInventors: Shimpei YAMADA, Tetsuya KAMIMURA, Naoko OUCHI, Naotsugu MURO, Nobuaki SUGIMURA, Yuta SHIGENOI
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Publication number: 20230420266Abstract: The present invention provides a composition for treating a semiconductor in which etching of silicon germanium is suppressed and a ratio of an etching rate of silicon to an etching rate of silicon germanium is large. In addition, the present invention provides a method for treating an object to be treated using a composition for treating a semiconductor. The composition for treating a semiconductor according to the present invention is a composition for treating a semiconductor including a quaternary ammonium salt having a hydroxyl group, a polar organic solvent, at least one nitrogen-containing compound selected from the group consisting of a compound represented by Formula (1), a compound represented by Formula (2), and salts thereof, and water, in which the mass ratio of the nitrogen-containing compound to the quaternary ammonium salt is 0.00001 to 0.1.Type: ApplicationFiled: September 8, 2023Publication date: December 28, 2023Applicant: FUJIFILM CorporationInventors: Yuta SHIGENOI, Atsushi Mizutani, Tomonori Takahashi
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Publication number: 20230416605Abstract: Provided is a chemical liquid that has an excellent etching ability for an Al oxide on a substrate and excellent etching selectivity between Al oxide and a specific metal oxide. Also provided is a treatment method using the chemical liquid. The chemical liquid contains at least one hydroxy acid selected from the group consisting of a hydroxy acid and a salt thereof, a quaternary ammonium compound, a trialkylamine, and water, and is alkaline.Type: ApplicationFiled: September 7, 2023Publication date: December 28, 2023Applicant: FUJIFILM CorporationInventors: Yuta SHIGENOI, Atsushi MIZUTANI, Tomonori TAKAHASHI
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Publication number: 20230166013Abstract: A first object of the present invention is to provide an antithrombotic cell adhesion sheet having excellent antithrombotic properties and cell adhesion properties. In addition, a second object of the present invention is to provide a medical device with a sheet using the antithrombotic cell adhesion sheet. The antithrombotic cell adhesion sheet of the present invention is a sheet formed b using a compound represented by General Formula (1). In General Formula (1), R1 and R4 each independently represent a hydrogen atom or a methyl group. R2 and R3 each independently represent —CH2CH(RA1)CH2—. p and r represent 1. q represents 0 or 1. m and n each independently represent an integer of 2 to 6. RA1 represents a hydrogen atom or a methyl group.Type: ApplicationFiled: January 13, 2023Publication date: June 1, 2023Applicants: FUJIFILM Corporation, KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATIONInventors: Atsushi SUGASAKI, Yosuke Yamamoto, Yuta Shigenoi, Masaru Tanaka, Shingo Kobayashi
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Publication number: 20230112048Abstract: A chemical liquid contains phosphoric acid or a salt thereof, a polar aprotic solvent, water, and a compound that has a carboxy group and does not have a hydroxyl group or a salt of the compound, in which a content of the phosphoric acid or a salt thereof is 5.0% by mass or less with respect to a total mass of the chemical liquid, a content of the polar aprotic solvent is 50.0% by mass or more with respect to the total mass of the chemical liquid, and a content of the water is 2.0% by mass or more and less than 50.0% by mass with respect to the total mass of the chemical liquid.Type: ApplicationFiled: August 25, 2022Publication date: April 13, 2023Applicant: FUJIFILM CorporationInventors: Atsushi MIZUTANI, Yuta SHIGENOI
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Patent number: 11400026Abstract: The present invention provides a laminate having excellent bacteria adhesion suppression performance. The present invention also provides a kit and a method for producing a laminate. A laminate according to the present invention includes a base material, an undercoat layer formed of an undercoat layer forming composition containing a polymer containing a repeating unit containing a polymerizable group and a repeating unit containing a polar group, and a cured film formed of a curable composition containing at least one compound selected from the group consisting of a compound represented by Formula (I), a compound represented by Formula (II), a compound represented by Formula (IV), and a compound represented by Formula (V) in this order.Type: GrantFiled: November 6, 2019Date of Patent: August 2, 2022Assignee: FUJIFILM CorporationInventor: Yuta Shigenoi
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Patent number: 11396568Abstract: A curable composition contains a betaine monomer having a predetermined structure and a polyfunctional (meth)acrylamide compound having a predetermined structure.Type: GrantFiled: March 24, 2020Date of Patent: July 26, 2022Assignee: FUJIFILM CorporationInventors: Yosuke Yamamoto, Yuta Shigenoi, Atsushi Sugasaki
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Publication number: 20210332239Abstract: The present invention provides a composition which is used to form a cured film that is disposed on a medical device and a medical device with a cured film, which are capable of suppressing both the adhesion of platelets and the adhesion of cells. A composition according to the embodiment of the present invention is a composition which is used to form a cured film that is disposed on a medical device, and which contains a compound represented by Formula (1).Type: ApplicationFiled: July 7, 2021Publication date: October 28, 2021Applicants: FUJIFILM Corporation, KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATIONInventors: Yosuke Yamamoto, Yuta Shigenoi, Atsushi Sugasaki, Masaru Tanaka, Shingo Kobayashi
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Publication number: 20210332180Abstract: The present invention provides a cell adhesion sheet in which the adhesion of platelets is suppressed and the adhesion of cells is excellent. The cell adhesion sheet according to the embodiment of the present invention is formed of a composition containing a compound represented by Formula (1).Type: ApplicationFiled: July 7, 2021Publication date: October 28, 2021Applicants: FUJIFILM Corporation, KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATIONInventors: Yosuke YAMAMOTO, Yuta SHIGENOI, Atsushi SUGASAKI, Masaru TANAKA, Shingo KOBAYASHI
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Patent number: 11130831Abstract: A curable composition contains one or more betaine monomers selected from the group consisting of a compound represented by Formula (1) and a compound represented by Formula (2).Type: GrantFiled: March 31, 2020Date of Patent: September 28, 2021Assignee: FUJIFILM CorporationInventors: Yosuke Yamamoto, Yuta Shigenoi, Atsushi Sugasaki
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Patent number: 10945928Abstract: A denture base coating composition includes at least one selected from the group consisting of a first compound represented by Formula (1-0) and a second compound represented by Formula (2-0).Type: GrantFiled: June 12, 2019Date of Patent: March 16, 2021Assignee: FUJIFILM CorporationInventors: Yosuke Yamamoto, Akihito Amao, Kiyotaka Fukagawa, Yuta Shigenoi, Natsumi Yokokawa, Chiaki Tsutsumi, Noriyuki Wakabayashi, Kazuo Takakuda
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Patent number: 10889778Abstract: A manufacturing method of a lubricant composition includes mixing a composite ester A that contains polyester obtained by condensing trihydric or more polyhydric alcohol a1, a divalent or more polyvalent carboxylic acid a2, and at least one selected from monohydric alcohol a3 or a monovalent carboxylic acid a4, with a compound B having a hydroxyl number of greater than 50 mgKOH/g. A lubricant composition contains the composite ester A and the compound B.Type: GrantFiled: February 21, 2019Date of Patent: January 12, 2021Assignee: FUJIFILM CornorationInventors: Kunihiko Kodama, Yuta Shigenoi
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Publication number: 20200270384Abstract: A curable composition contains one or more betaine monomers selected from the group consisting of a compound represented by Formula (1) and a compound represented by Formula (2).Type: ApplicationFiled: March 31, 2020Publication date: August 27, 2020Applicant: FUJIFILM CorporationInventors: Yosuke YAMAMOTO, Yuta Shigenoi, Atsushi Sugasaki
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Publication number: 20200223967Abstract: A curable composition contains a betaine monomer having a predetermined structure and a polyfunctional (meth)acrylamide compound having a predetermined structure.Type: ApplicationFiled: March 24, 2020Publication date: July 16, 2020Applicant: FUJIFILM CorporationInventors: Yosuke Yamamoto, Yuta Shigenoi, Atsushi Sugasaki
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Patent number: 10636975Abstract: An object of the present invention is to provide an organic semiconductor element (in particular, an organic thin film transistor) that exhibits high carrier mobility and can stably maintain carrier mobility even after long-term storage under high temperature and high humidity, a compound, an organic semiconductor composition, and a method of manufacturing an organic semiconductor film. The organic semiconductor element of the present invention contains a compound having a molecular weight of 2,000 or greater and a repeating unit represented by Formula (1). In Formula (1), A represents an electron acceptor unit, D is an electron donor unit, and at least one of D or A has at least one monovalent group represented by Formula (1-1). In Formula (1-1), Ar represents an aromatic heterocyclic group or an aromatic hydrocarbon group having 5 to 18 carbon atoms. Ca represents CR1R2. La represents an alkylene group having 1 to 20 carbon atoms. Lb represents an alkyl group having 9 or more carbon atoms.Type: GrantFiled: December 29, 2017Date of Patent: April 28, 2020Assignee: FUJIFILM CorporationInventors: Yosuke Yamamoto, Yuta Shigenoi
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Publication number: 20200069531Abstract: The present invention provides a laminate having excellent bacteria adhesion suppression performance. The present invention also provides a kit and a method for producing a laminate. A laminate according to the present invention includes a base material, an undercoat layer formed of an undercoat layer forming composition containing a polymer containing a repeating unit containing a polymerizable group and a repeating unit containing a polar group, and a cured film formed of a curable composition containing at least one compound selected from the group consisting of a compound represented by Formula (I), a compound represented by Formula (II), a compound represented by Formula (IV), and a compound represented by Formula (V) in this order.Type: ApplicationFiled: November 6, 2019Publication date: March 5, 2020Applicant: FUJIFILM CorporationInventor: Yuta SHIGENOI
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Publication number: 20190290551Abstract: A denture base coating composition includes at least one selected from the group consisting of a first compound represented by Formula (1-0) and a second compound represented by Formula (2-0).Type: ApplicationFiled: June 12, 2019Publication date: September 26, 2019Applicant: FUJIFILM CorporationInventors: Yosuke Yamamoto, Akihito Amao, Kiyotaka Fukagawa, Yuta Shigenoi, Natsumi Yokokawa, Chiaki Tsutsumi, Noriyuki Wakabayashi, Kazuo Takakuda