Patents by Inventor Yutaka GOMI

Yutaka GOMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reticle transmittance measurement method, projection exposure method using the same, and projection exposure device
    Patent number: 9904170
    Abstract: When a reticle is first used, the reticle is loaded in a projection exposure device and measured by either oblique measurement or random measurement, thereby avoiding the fear of uneven sampling and determining the reticle transmittance of the entire reticle as the parent population, without increasing the sampling count. The same effect can be obtained by making the measurement spot size, which is fixed in general, variable and by changing the angle of incidence in relation to the measurement spot size.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: February 27, 2018
    Assignee: SII Semiconductor Corporation
    Inventors: Michihiro Murata, Yutaka Gomi
  • RETICLE TRANSMITTANCE MEASUREMENT METHOD, PROJECTION EXPOSURE METHOD USING THE SAME, AND PROJECTION EXPOSURE DEVICE
    Publication number: 20170351180
    Abstract: When a reticle is first used, the reticle is loaded in a projection exposure device and measured by either oblique measurement or random measurement, thereby avoiding the fear of uneven sampling and determining the reticle transmittance of the entire reticle as the parent population, without increasing the sampling count. The same effect can be obtained by making the measurement spot size, which is fixed in general, variable and by changing the angle of incidence in relation to the measurement spot size.
    Type: Application
    Filed: June 20, 2017
    Publication date: December 7, 2017
    Inventors: Michihiro MURATA, Yutaka GOMI
  • Reticle transmittance measurement method, and projection exposure method using the same
    Patent number: 9733567
    Abstract: When a reticle is first used, the reticle is loaded in a projection exposure device and measured by either oblique measurement and random measurement, thereby avoiding the fear of uneven sampling and determining the reticle transmittance of the entire reticle as the parent population, without increasing the sampling count. The same effect can be obtained by making the measurement spot size, which is fixed in general, variable and by changing the angle of incidence in relation to the measurement spot size.
    Type: Grant
    Filed: September 21, 2015
    Date of Patent: August 15, 2017
    Assignee: SII Semiconductor Corporation
    Inventors: Michihiro Murata, Yutaka Gomi
  • RETICLE TRANSMITTANCE MEASUREMENT METHOD, PROJECTION EXPOSURE DEVICE, AND PROJECTION EXPOSURE METHOD
    Publication number: 20160091391
    Abstract: When a reticle is used first, the reticle is actually loaded in a projection exposure device and measured by one of oblique measurement and random measurement, thereby avoiding the fear of uneven sampling and determining the reticle transmittance of the entire reticle as the parent population, without increasing the, sampling count. The same effect can be obtained by making the measurement spot size, which is fixed in general, variable and by changing the angle of incidence in relation to the measurement spot size.
    Type: Application
    Filed: September 21, 2015
    Publication date: March 31, 2016
    Inventors: Michihiro MURATA, Yutaka GOMI