Abstract: A production apparatus for producing an electricity storage material is provided. The electricity storage material includes at least a thickener and an active material. The production apparatus includes a solution production device and a mixture-kneading device. The solution production device produces a surfactant-containing solution of the thickener. The mixture-kneading device kneads the solution together with a powder of the active material.

Abstract: A production apparatus for producing an electricity storage material is provided. The electricity storage material includes at least a thickener and an active material. The production apparatus includes a solution production device and a mixture-kneading device. The solution production device produces a surfactant-containing solution of the thickener. The mixture-kneading device kneads the solution together with a powder of the active material.

Abstract: A display apparatus comprising a display panel including first and second display regions arranged in an alternating manner and respectively passing a first polarization component light and a second polarization component of incident light; a light source panel including first and second light sources arranged in an alternating manner and respectively emitting light of the first polarization component and light of the second polarization component to the back surface of the display panel; and a lenticular lens that is positioned between the display panel and the light source panel, refracts light from the first light sources in a direction of a first viewpoint to provide the first viewpoint with the light passed by the first display regions, and refracts light from the second light sources in a direction of a second viewpoint to provide the second viewpoint with the light passed by the second display regions.

Abstract: Provided is an image processing apparatus that stereoscopically displays a two-dimensional image, comprising a generating section that generates a left-side image and a right-side image by shifting the two-dimensional image left and right in a display region; a right-edge processing section that attaches a right-edge image, which is displayed within a prescribed range from a right edge of the display region, to a right side of the left-side image; a left-edge processing section that attaches a left-edge image, which is displayed within a prescribed range from a left edge of the display region, to a left side of the right-side image; and an output section that outputs the left-side image with the right-edge image attached thereto to a left eye of a user and outputs the right-side image with the left-edge image attached thereto to a right eye of the user.

Abstract: Provided is an image processing apparatus that stereoscopically displays a two-dimensional image, comprising a generating section that generates a left-side image and a right-side image by shifting the two-dimensional image left and right in a display region; and an output section that outputs the left-side image to a left eye of the user and the right-side image to a right eye of the user. The generating section generates the left-side image and the right-side image by shifting the two-dimensional image to the left and right within the display region by a distance no greater than a distance between pupils of a user.

Abstract: A display apparatus comprising a display panel including first and second display regions arranged in an alternating manner and respectively passing a first polarization component light and a second polarization component of incident light; a light source panel including first and second light sources arranged in an alternating manner and respectively emitting light of the first polarization component and light of the second polarization component to the back surface of the display panel; and a lenticular lens that is positioned between the display panel and the light source panel, refracts light from the first light sources in a direction of a first viewpoint to provide the first viewpoint with the light passed by the first display regions, and refracts light from the second light sources in a direction of a second viewpoint to provide the second viewpoint with the light passed by the second display regions.

Abstract: An image display apparatus for displaying plural sets of a pair of right-eye image and left-eye image to their corresponding viewing points is provided, which includes: a multi-view image generating unit which receives a right image and left image corresponding to predetermined two viewing points, and generates right-eye images and left-eye images corresponding to a plurality of viewing points by shifting the entireties of the received right image and left image; and a display unit which displays the right-eye images and left-eye images generated by the multi-view image generating unit to their corresponding viewing points.

Abstract: Provided is an image processing apparatus that stereoscopically displays a two-dimensional image, comprising a generating section that generates a left-side image and a right-side image by shifting the two-dimensional image left and right in a display region; and an output section that outputs the left-side image to a left eye of the user and the right-side image to a right eye of the user. The generating section generates the left-side image and the right-side image by shifting the two-dimensional image to the left and right within the display region by a distance no greater than a distance between pupils of a user.

Abstract: Provided is an image processing apparatus that stereoscopically displays a two-dimensional image, comprising a generating section that generates a left-side image and a right-side image by shifting the two-dimensional image left and right in a display region; a right-edge processing section that attaches a right-edge image, which is displayed within a prescribed range from a right edge of the display region, to a right side of the left-side image; a left-edge processing section that attaches a left-edge image, which is displayed within a prescribed range from a left edge of the display region, to a left side of the right-side image; and an output section that outputs the left-side image with the right-edge image attached thereto to a left eye of a user and outputs the right-side image with the left-edge image attached thereto to a right eye of the user.

Abstract: In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.

Abstract: In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.

Abstract: An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.

Abstract: In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.

Abstract: In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.

Abstract: A point diffraction interference measuring method comprises forming a substantially ideal spherical wave by using a point light source-generating unit 101, 102, allowing a light flux composed of the spherical wave to pass through a test sample 109, thereafter dividing the light flux into two light fluxes by using an optical path-dividing element 105, allowing one light flux of the divided light fluxes to pass through a pinhole 129 to covert the one light flux into a reference light beam which is a substantially ideal spherical wave, and detecting interference fringes generated by causing interference between the reference light beam and a measuring light beam which is the other light flux of the divided light fluxes. The wavefront aberration of the test sample can be measured by observing the interference fringes without being affected by the disturbance which would be otherwise caused by any system vibration or the like.

Abstract: A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.

Abstract: A point diffraction interference measuring method comprises forming a substantially ideal spherical wave by using a point light source-generating unit 101, 102, allowing a light flux composed of the spherical wave to pass through a test sample 109, thereafter dividing the light flux into two light fluxes by using an optical path-dividing element 105, allowing one light flux of the divided light fluxes to pass through a pinhole 129 to covert the one light flux into a reference light beam which is a substantially ideal spherical wave, and detecting interference fringes generated by causing interference between the reference light beam and a measuring light beam which is the other light flux of the divided light fluxes. The wavefront aberration of the test sample can be measured by observing the interference fringes without being affected by the disturbance which would be otherwise caused by any system vibration or the like.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.

Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.