Patents by Inventor Yutaka Kedo

Yutaka Kedo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer drying device and method
    Patent number: 6219936
    Abstract: Nitrogen gas is jetted into a space on the liquid level of pure water in a drying chamber in which wafers are immersed. Simultaneously therewith, liquid-phase isopropyl alcohol is jetted at a temperature higher than the temperature of the wafers and in the vicinity of jetting openings for the nitrogen gas. When the wafers are exposed above the liquid level in the drying chamber, the pure water held on both front and rear surfaces of the wafers is replaced by the isopropyl alcohol of mist-form. The isopropyl alcohol is then evaporated, whereby the wafers are dried.
    Type: Grant
    Filed: November 23, 1999
    Date of Patent: April 24, 2001
    Assignee: Toho Kasei Co., Ltd.
    Inventors: Yutaka Kedo, Yoshio Takemura, Susumu Matsuda