Abstract: The disclosed method is for manufacturing organic EL displays that comprise a substrate and multiple organic EL elements that are disposed in a matrix form on said substrate, and wherein said organic EL elements comprise pixel electrodes that are disposed on said substrate, an organic layer that is disposed on said pixel electrodes and a counter-electrode that is disposed on said organic layer.

Abstract: Disclosed is an organic electroluminescent element including: a substrate; and a positive electrode, an organic light-emitting layer, and a laminated negative electrode of two or more layers including a lower negative electrode and an upper negative electrode having different specific resistances from each other, the positive electrode, organic light-emitting layer, and laminated negative electrode sequentially provided on the substrate from the substrate side, and in the organic electroluminescent element, the lower negative electrode and the upper negative electrode include any one of ITO, IZO, GZO, and AZO as the main constituent, and the lower negative electrode is provided closer to the organic light-emitting layer than the upper negative electrode, and the lower negative electrode has a specific resistance higher than the specific resistance of the upper negative electrode adjacent to the lower negative electrode.

Abstract: The disclosed method is for manufacturing organic EL displays that comprise a substrate and multiple organic EL elements that are disposed in a matrix form on said substrate, and wherein said organic EL elements comprise pixel electrodes that are disposed on said substrate, an organic layer that is disposed on said pixel electrodes and a counter-electrode that is disposed on said organic layer.

Abstract: In one embodiment of a manufacturing method of a transparent conductive film of the present invention, a grid having a magnet is placed between a target and a substrate, and a pattern shaped transparent conductive film comprising the target material is formed over the substrate through a mask by a sputtering method. In other embodiment of a manufacturing method of a transparent conductive film of the present invention, a mask is placed on a substrate, a pattern shaped transparent conductive layer comprising a target material is formed on the substrate by a sputtering method, and a trap electrode having a magnet pin is installed between the target and the substrate.

Abstract: In one embodiment of a manufacturing method of a transparent conductive film of the present invention, a grid having a magnet is placed between a target and a substrate, and a pattern shaped transparent conductive film comprising the target material is formed over the substrate through a mask by a sputtering method. In other embodiment of a manufacturing method of a transparent conductive film of the present invention, a mask is placed on a substrate, a pattern shaped transparent conductive layer comprising a target material is formed on the substrate by a sputtering method, and a trap electrode having a magnet pin is installed between the target and the substrate.