Patents by Inventor Yutaka Muramoto
Yutaka Muramoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12097675Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.Type: GrantFiled: August 4, 2021Date of Patent: September 24, 2024Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi, Shunichi Kajiya, Takaaki Otowa, Yasuhiro Takahashi
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Patent number: 12083713Abstract: There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.Type: GrantFiled: February 7, 2023Date of Patent: September 10, 2024Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi
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Patent number: 12032123Abstract: There is provided an optical body with improved antireflection capability, a display device, and a method for manufacturing an optical body, the optical body including: a first concave-convex structure formed on a surface of a base material; and a second concave-convex structure superimposed on the first concave-convex structure. An average concave-convex period of the first concave-convex structure is larger than a wavelength in a visible light region, an average concave-convex period of the second concave-convex structure is less than or equal to the wavelength in the visible light region, and projecting parts of the second concave-convex structure extend in a direction normal to a flat plane of the base material.Type: GrantFiled: September 9, 2021Date of Patent: July 9, 2024Assignee: DEXERIALS CORPORATIONInventors: Shunichi Kajiya, Hideki Terashima, Yutaka Muramoto, Masanao Kikuchi, Takaaki Otowa
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Publication number: 20230228915Abstract: Visibility of an optical film at the time of handling can be improved, and an antireflection region and a visible region can be easily formed on a surface of the optical film in an identical processing step. An optical film 1 includes a base material 11 having flexibility and a resin layer 12 laminated on at least one of surfaces of the base material 11. The resin layer 12 includes a concave-convex pattern region 2 in which a micro concave-convex structure 20 composed of a plurality of convexities 21 or concavities 22 arrayed at a pitch P less than or equal to a wavelength of visible light are formed and a strip-shaped line marker region 3 in which a plurality of ridge portions 31 arrayed at intervals from one another at a track pitch Pt more than or equal to the wavelength of visible light are formed.Type: ApplicationFiled: September 29, 2021Publication date: July 20, 2023Applicant: DEXERIALS CORPORATIONInventor: Yutaka MURAMOTO
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Publication number: 20230182349Abstract: There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.Type: ApplicationFiled: February 7, 2023Publication date: June 15, 2023Applicant: DEXERIALS CORPORATIONInventors: Yutaka MURAMOTO, Masanao KIKUCHI
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Patent number: 11602878Abstract: There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.Type: GrantFiled: September 5, 2017Date of Patent: March 14, 2023Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi
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Patent number: 11543746Abstract: There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.Type: GrantFiled: January 8, 2021Date of Patent: January 3, 2023Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi
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Publication number: 20220003897Abstract: There is provided an optical body with improved antireflection capability, a display device, and a method for manufacturing an optical body, the optical body including: a first concave-convex structure formed on a surface of a base material; and a second concave-convex structure superimposed on the first concave-convex structure. An average concave-convex period of the first concave-convex structure is larger than a wavelength in a visible light region, an average concave-convex period of the second concave-convex structure is less than or equal to the wavelength in the visible light region, and projecting parts of the second concave-convex structure extend in a direction normal to a flat plane of the base material.Type: ApplicationFiled: September 9, 2021Publication date: January 6, 2022Applicant: DEXERIALS CORPORATIONInventors: Shunichi KAJIYA, Hideki TERASHIMA, Yutaka MURAMOTO, Masanao KIKUCHI, Takaaki OTOWA
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Publication number: 20210387429Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.Type: ApplicationFiled: August 4, 2021Publication date: December 16, 2021Applicant: DEXERIALS CORPORATIONInventors: Yutaka MURAMOTO, Masanao KIKUCHI, Shunichi KAJIYA, Takaaki OTOWA, Yasuhiro TAKAHASHI
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Patent number: 11143795Abstract: There is provided an optical body with improved antireflection capability, a display device, and a method for manufacturing an optical body, the optical body including: a first concave-convex structure formed on a surface of a base material; and a second concave-convex structure superimposed on the first concave-convex structure. An average concave-convex period of the first concave-convex structure is larger than a wavelength in a visible light region, an average concave-convex period of the second concave-convex structure is less than or equal to the wavelength in the visible light region, and projecting parts of the second concave-convex structure extend in a direction normal to a flat plane of the base material.Type: GrantFiled: August 31, 2015Date of Patent: October 12, 2021Assignee: DEXERIALS CORPORATIONInventors: Shunichi Kajiya, Hideki Terashima, Yutaka Muramoto, Masanao Kikuchi, Takaaki Otowa
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Patent number: 11090886Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.Type: GrantFiled: April 11, 2018Date of Patent: August 17, 2021Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi, Shunichi Kajiya, Takaaki Otowa, Yasuhiro Takahashi
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Publication number: 20210132493Abstract: There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.Type: ApplicationFiled: January 8, 2021Publication date: May 6, 2021Applicant: DEXERIALS CORPORATIONInventors: Yutaka MURAMOTO, Masanao KIKUCHI
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Patent number: 10890844Abstract: There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.Type: GrantFiled: February 28, 2019Date of Patent: January 12, 2021Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi
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Publication number: 20200198187Abstract: There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.Type: ApplicationFiled: September 5, 2017Publication date: June 25, 2020Applicant: DEXERIALS CORPORATIONInventors: Yutaka MURAMOTO, Masanao KIKUCHI
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Publication number: 20190212646Abstract: There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.Type: ApplicationFiled: February 28, 2019Publication date: July 11, 2019Applicant: DEXERIALS CORPORATIONInventors: Yutaka MURAMOTO, Masanao KIKUCHI
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Patent number: 10245780Abstract: There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.Type: GrantFiled: October 28, 2015Date of Patent: April 2, 2019Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi
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Patent number: 10207470Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.Type: GrantFiled: December 4, 2014Date of Patent: February 19, 2019Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi, Shunichi Kajiya, Takaaki Otowa, Yasuhiro Takahashi
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Patent number: 10095105Abstract: There is provided a method for manufacturing a master on which an arbitrary pattern is formed, the method including: forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape; generating a control signal corresponding to an object on the basis of an input image in which the object is depicted; irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer; and forming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed.Type: GrantFiled: July 14, 2015Date of Patent: October 9, 2018Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi
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Publication number: 20180281239Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.Type: ApplicationFiled: April 11, 2018Publication date: October 4, 2018Applicant: DEXERIALS CORPORATIONInventors: Yutaka MURAMOTO, Masanao KIKUCHI, Shunichi KAJIYA, Takaaki OTOWA, Yasuhiro TAKAHASHI
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Patent number: 10065380Abstract: There is provided a filler-filled film, a sheet film, a stacked film, a bonded body, and a method for producing a filler-filled film, the filler-filled film including: a film main body; a plurality of concavities formed on a surface of the film main body; and a filler put in each of the concavities. A diameter of an opening surface of the concavity is at least larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of filling of the fillers in one end portion of the film main body and the rate of filling of the fillers in another portion of the film main body is less than 0.5%.Type: GrantFiled: October 28, 2015Date of Patent: September 4, 2018Assignee: DEXERIALS CORPORATIONInventors: Yutaka Muramoto, Masanao Kikuchi