Abstract: An information processing device includes a processor and a memory. The memory is configured to store computer-readable instructions. The instructions instruct the information processing device to execute steps including randomly arranging a plurality of embroidery patterns within a coordinate area set in an embroidery frame that is moved in two directions.

Abstract: A sewing machine includes a sewing portion, a detector, a processor, and a memory. The sewing portion includes a needle bar and a transport portion. The needle bar is configured to have a sewing needle on a lower end. The transport portion is configured to move a work cloth. The detector is configured to detect ultrasonic waves. The memory stores computer-readable instructions that instruct the processor to perform specifying a position of a transmission source of the ultrasonic waves based on the ultrasonic waves that are detected by the detector, specifying sewing information based on the specified position of the transmission source, the sewing information being information that pertains to sewing, and controlling the sewing portion based on the specified sewing information.

Abstract: A sewing machine that includes a sewing device that includes a needle bar configured to attach a sewing needle, and a transport device configured to move a work cloth, a processor, a plurality of detection devices that are configured to detect ultrasonic waves, and a memory that is configured to store computer-readable instructions that instruct the sewing machine to execute steps comprising specifying, when an ultrasonic wave transmitted from a transmission source of the ultrasonic wave is detected by the detection devices, a position of the transmission source of the ultrasonic waves, based on the detected ultrasonic waves, specifying a sewing position on the work cloth based on the specified position of the transmission source, and moving the work cloth by the transport device in accordance with the specified sewing position.

Abstract: A coordinate computation device includes a position indication portion, a detection portion, a processor, and a memory. The position indication portion includes an indicating portion, a switch, and a transmitter. The detection portion is configured to detect ultrasonic waves transmitted by the transmitter. The memory is configured to store computer-readable instructions. The computer-readable instructions cause the processor to perform processes that include computing sets of first coordinates, based on times when the detection portion detects the ultrasonic waves, computing a movement direction of the position indication portion on a plane, computing an angle formed between the plane and a direction in which the position indication portion is long, and computing a set of second coordinates, based on the computed movement direction, the computed angle, and a set of third coordinates among the sets of the computed first coordinates.

Abstract: The present invention provides a metal polishing liquid capable of CMP at a high Cu polishing rate and solving the problems: (a) generation of scratches attributable to solid particles, (b) generation of deteriorations in flatness such as dishing and erosion, (c) complexity in a washing process for removing abrasive particles remaining on the surface of a substrate after polishing, and (d) higher costs attributable to the cost of a solid abrasive itself and to waste liquid treatment, as well as a method of polishing a film to be polished by using the same.

Abstract: A sewing machine includes a sewing device, a processor, and a memory. The sewing device is configured to form stitches on a sewing workpiece. The memory is to store computer-readable instructions that, when executed by the processor, instruct the processor to perform processes including acquiring embroidery data, generating stitched marker data, causing the sewing device to sew the at least one stitched marker, causing the sewing device to start sewing an embroidery pattern, identifying a pattern to be sewn when the sewing of the embroidery pattern is stopped, detecting at least one of a second sewing position and a second sewing angle when the sewing of the embroidery pattern is stopped, setting at least one of a third sewing position and a third sewing angle, correcting data to be used to sew the pattern to be sewn, and causing the sewing device to restart sewing the embroidery pattern.

Abstract: A sewing machine includes a detector configured to detect ultrasonic waves transmitted from a specification-enabled area, a processor, and a memory storing non-transitory computer-readable instructions that instruct the sewing machine to perform specifying a prescribed position based on a positional relationship between a transmission area and the specification-enabled area, the transmission area being an area that is at least a portion of a sewing-enabled area and being an area that includes a position of a transmission source that transmits the ultrasonic waves, the prescribed position being a position of an embroidery frame when the entire transmission area is included in the specification-enabled area, moving the embroidery frame to the specified prescribed position, specifying a transmission position based on the ultrasonic waves that are detected by the detector, and performing a sewing operation based on the specified transmission position.

Abstract: A sewing machine includes a bed, a sewing device, a projection portion, an item detection portion, and a control portion. The sewing device includes a needle bar and a feed portion that moves a work cloth. The projection portion projects, onto at least one of the bed and the work cloth, a projected image that includes at least one operation item that indicates an operation of the sewing device. The item detection portion detects whether a user's finger has touched a location, on the at least one of the bed and the work cloth onto which the at least one operation item is being projected by the projection portion, where one of the at least one operation item is being projected. The control portion operates the sewing device in accordance with the operation item that has been detected by the item detection portion.

Abstract: A sewing machine includes a sewing device, a processor, and a memory. The sewing device is configured to form stitches on a sewing workpiece. The memory is to store computer-readable instructions that, when executed by the processor, instruct the processor to perform processes including acquiring embroidery data, generating stitched marker data, causing the sewing device to sew the at least one stitched marker, causing the sewing device to start sewing an embroidery pattern, identifying a pattern to be sewn when the sewing of the embroidery pattern is stopped, detecting at least one of a second sewing position and a second sewing angle when the sewing of the embroidery pattern is stopped, setting at least one of a third sewing position and a third sewing angle, correcting data to be used to sew the pattern to be sewn, and causing the sewing device to restart sewing the embroidery pattern.

Abstract: A CMP polishing liquid comprises water and an abrasive particle, wherein the abrasive particle comprises a composite particle having a core including a first particle, and a second particle provided on the core, the first particle contains silica, the second particle contains cerium hydroxide, and the pH of the CMP polishing liquid is equal to or lower than 9.5.

Abstract: A method of manufacturing a connector chip includes preparing a plate-like insulating substrate material with a plurality of through hole rows arranged therein; forming a plurality of first and second base layers on opposite surfaces of the insulating substrate material; forming insulating layers between each two adjoining first base layers and between each two adjoining second base layers; forming third base layers on the one side over edge portions of the first base layers, internal surfaces of the through holes, and edge portions of the second base layers; forming fourth base layers on the other side over edge portions of the first base layers, the internal surfaces of the through holes, and edge portions of the second base layers; cutting the insulating substrate material along a middle of each of the through hole rows; and forming one or more plated layers over the first to fourth base layers.

Abstract: An information processing device includes a processor and a memory. The memory is configured to store computer-readable instructions. The instructions instruct the information processing device to execute steps including randomly arranging a plurality of embroidery patterns within a coordinate area set in an embroidery frame that is moved in two directions.

Abstract: A sewing machine includes at least one detecting portion, a processor, and a memory. The at least one detecting portion is configured to detect an ultrasonic wave that has been transmitted from a transmission source. The memory is configured to store computer-readable instructions that instruct the sewing machine to execute steps including identifying a position of the transmission source of the ultrasonic wave based on information pertaining to the ultrasonic wave that has been detected by the at least one detecting portion, and controlling sewing based on the position of the transmission source that has been identified.

Abstract: A sewing machine that includes a sewing device that includes a needle bar configured to attach a sewing needle, and a transport device configured to move a work cloth, a processor, a plurality of detection devices that are configured to detect ultrasonic waves, and a memory that is configured to store computer-readable instructions that instruct the sewing machine to execute steps comprising specifying, when an ultrasonic wave transmitted from a transmission source of the ultrasonic wave is detected by the detection devices, a position of the transmission source of the ultrasonic waves, based on the detected ultrasonic waves, specifying a sewing position on the work cloth based on the specified position of the transmission source, and moving the work cloth by the transport device in accordance with the specified sewing position.

Abstract: A sewing machine includes a sewing portion, a detector, a processor, and a memory. The sewing portion includes a needle bar and a transport portion. The needle bar is configured to have a sewing needle on a lower end. The transport portion is configured to move a work cloth. The detector is configured to detect ultrasonic waves. The memory stores computer-readable instructions that instruct the processor to perform specifying a position of a transmission source of the ultrasonic waves based on the ultrasonic waves that are detected by the detector, specifying sewing information based on the specified position of the transmission source, the sewing information being information that pertains to sewing, and controlling the sewing portion based on the specified sewing information.

Abstract: A sewing machine includes a detector configured to detect ultrasonic waves transmitted from a specification-enabled area, a processor, and a memory storing non-transitory computer-readable instructions that instruct the sewing machine to perform specifying a prescribed position based on a positional relationship between a transmission area and the specification-enabled area, the transmission area being an area that is at least a portion of a sewing-enabled area and being an area that includes a position of a transmission source that transmits the ultrasonic waves, the prescribed position being a position of an embroidery frame when the entire transmission area is included in the specification-enabled area, moving the embroidery frame to the specified prescribed position, specifying a transmission position based on the ultrasonic waves that are detected by the detector, and performing a sewing operation based on the specified transmission position.

Abstract: A sewing machine that includes a processor, a plurality of detection devices that is configured to be capable of changing mounting positions and configured to detect an ultrasonic wave, and a memory that is configured to store computer-readable instructions that instruct the sewing machine to execute steps comprising, identifying, when a first ultrasonic wave transmitted from a transmission source of the ultrasonic wave is detected by the detection devices, a position of the transmission source of the first ultrasonic wave, based on information relating to the detected first ultrasonic wave, and controlling sewing based on the identified position of the transmission source of the first ultrasonic wave.

Abstract: A sewing machine includes a control portion that controls a thread tension adjustment portion and a feed portion such that a first stitch and a second stitch are formed alternately on a sewing object. The first stitch includes only a stitch in which an interlacing point of the upper thread and a bobbin thread is lower than a top surface of the sewing object. The second stitch includes at least one set of a first section and a second section. The first section is a section in which the interlacing point and the bobbin thread are pulled out, by the thread tension, in the first direction on the top surface of the sewing object. The second section is a section in which the bobbin thread is pulled out in the second direction, and at least part of the second section overlapping with the first section.

Abstract: Disclosed is a metal-polishing liquid comprising: a metal-oxide-dissolving agent; a metal-oxidizing agent; a metal anticorrosive; a water-soluble polymer having a weight-average molecular weight of 8,000 or higher and having an anionic functional group and a nonionic functional group; and water, and having a pH within the range of 2.5 or higher but 5.0 or less. The metal-polishing liquid is effective in reducing the frictional force in polishing which generates during CMP. And is highly effective in flattening the surface of a work to be polished.

Abstract: A chip-like electric component such as a chip resistor is provided, which is easy to manufacture and in which cracks or fractures of an insulating substrate are unlikely to occur. A pair of surface electrodes 21, 23 are formed so that thicknesses of the pair of surface electrodes increase from a resistor layer 13 toward end portions 30 of an insulating substrate 29 in a direction in which the pair of surface electrodes 21, 23 are arranged. A plating reservoir S is formed between one of the surface electrodes 21, 23 and an insulating protective layer 15. When forming at least one plated layer 33, a plated metal pools in the plating reservoir S. The at least one plated layer 33 may work to reduce to some extent a height difference between a soldering electrode portion 21, 23, 27, 33 and the insulating protective layer 15.