Patents by Inventor Yutaka Ozawa

Yutaka Ozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010026413
    Abstract: A rotating storage apparatus is provided for high recording reliability in an environment in which a shock or vibration exists. Provided are means for outputting a shock out signal (SO) if an output from an acceleration sensor exceeds a predetermined threshold, a latch circuit 21 for outputting a latch signal at high level during a predetermined write inhibit period after the shock out signal (SO) is input, and a write gate signal (WG) which goes high when a write is enabled. A write enable signal is generated by an AND circuit 23 having a NOT output of the latch signal as well as the write gate signal WG as its inputs.
    Type: Application
    Filed: March 19, 2001
    Publication date: October 4, 2001
    Inventors: Masashi Kisaka, Yutaka Ozawa, Kenji Toga
  • Publication number: 20010021075
    Abstract: A method to enable servo information to be detected surely and stably even when a time interval between servo sectors is changed due to disk shifting is provided. A time interval TS(i) is calculated according to an internal variable value, which is in proportion to a displacement &Dgr;r(i) of a servo area SF(i) in a radial direction of a subject disk (step S6). The displacement &Dgr;r(i) is calculated from already detected servo information, thereby a time interval for detecting servo information is adjusted according to the above-described time interval TS(i) (steps S7 and S4). The time interval TS(i) is the time interval between passing of a servo sector in the servo area SF(i) under the head H and passing of a servo sector in the servo area SF(i+1) under the head H.
    Type: Application
    Filed: January 17, 2001
    Publication date: September 13, 2001
    Inventors: Nobuyuki Kitazaki, Kenji Ogasawara, Yutaka Ozawa, Isao Yoneda
  • Publication number: 20010004653
    Abstract: A vulcanizable dip-forming rubber latex composition comprising an unsaturated nitrile-conjugated diene copolymer rubber latex, a sulfur-containing vulcanizer, and a vulcanization accelerator comprising at least one compound selected from (i) dithiocarbamic acid compounds of the formula: 1
    Type: Application
    Filed: January 16, 2001
    Publication date: June 21, 2001
    Inventors: Yutaka Ozawa, Hisanori Ohta
  • Patent number: 6187857
    Abstract: A vulcanizable dip-forming rubber latex composition comprising an unsaturated nitrile-conjugated diene copolymer rubber latex, a sulfur-containing vulcanizer, and a vulcanization accelerator comprising at least one compound selected from (i) dithiocarbamic acid compounds of the formula: and (ii) zinc dithiocarbamate compounds of the formula: wherein R1 and R2 are hydrocarbon groups having at least 6 carbon atoms which may be the same or different, and an optional thiazole compound. A rubber article dip-formed from the rubber latex composition has no crack occurrence, good surface luster and good vulcanization properties, and does not contain a nitrosamine, and therefore, is suitable for medical use.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: February 13, 2001
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Yutaka Ozawa, Hisanori Ohta
  • Patent number: 6139400
    Abstract: Disclosed is a polishing system used for polishing a surface to be polished of an object to be polished by a polishing pad, which is capable of improving uniformity of the surface to be polished of the object to be polished by positively, accurately adjusting a polishing pressure, and a polishing method using the polishing system. Concretely, the surface to be polished of a wafer as the object to be polished is polished by relatively moving, along a plane, a polishing surface of the rotating polishing pad and the surface to be polished of the wafer in slide-contact with each other, and adjusting a pressing force applied from the polishing pad to the wafer in accordance with a polishing pressure previously set depending on a relative-positional relationship between the polishing surface of the polishing pad and the surface to be polished of the wafer.
    Type: Grant
    Filed: April 21, 1998
    Date of Patent: October 31, 2000
    Assignee: Sony Corporation
    Inventors: Shuzo Sato, Hiizu Ohtorii, Yasuharu Ohkawa, Yutaka Ozawa, Taiichi Kusano
  • Patent number: 5369166
    Abstract: A copolymer latex is provided which comprises 30 to 90% by weight of a conjugated diene monomer unit, 9 to 50% by weight of an ethylenically unsaturated nitrile monomer unit, 0.1 to 20% by weight of an ethylenically unsaturated acid monomer unit and 0 to 20% by weight of an other ethylenically unsaturated monomer unit copolymerizable therewith, having a polystyrene-converted weight average molecular weight of 50,000 to 500,000, and containing 45% or less of methyl ethyl ketone insoluble matter. The latex is presented by emulsion polymerization using a polymerization initiator containing a peroxide whose decomposition temperature giving a half-life period of 10 hours is 100.degree. C. or higher and a reducing agent. The latex is used advantageously for dip molding.
    Type: Grant
    Filed: March 2, 1993
    Date of Patent: November 29, 1994
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Yutaka Ozawa, Hisanori Ohta
  • Patent number: 5350809
    Abstract: Disclosed herein is a process for the preparation of a chlorinated rubber, wherein chlorine gas is caused to act on a polyisoprene rubber to prepare the chlorinated rubber. Chlorine gas is blown into a high-acidity aqueous dispersion of the polyisoprene rubber to chlorinate the polyisoprene rubber, whereby a chlorinated isoprene rubber with high performance is prepared stably in an aqueous medium.
    Type: Grant
    Filed: January 22, 1993
    Date of Patent: September 27, 1994
    Assignee: Asahi Denka Kogyo K.K.
    Inventors: Hiroshi Tsuchiya, Makoto Kokura, Yutaka Ozawa, Takaaki Sugimura
  • Patent number: 4660838
    Abstract: In a sealing device for a rotary machine of the type that an annular groove is provided in an inner circumferential surface of a through-hole of a stationary member through which a rotary body supported rotatably by a bearing device extends, gap spaces between the rotary body and the both side portions of the stationary member on the opposite sides of the annular groove are sealed by seal rings, and a seal fluid feed hole for feeding a sealing fluid into the annular groove is provided in the stationary member; improvements are made in that a vibration suppressing movable ring is accommodated within the annular groove, the movable ring is mounted to the stationary member so as to be movable only in a radial direction so that an outside annular gap clearance may be formed between an outer circumferential surface of the movable ring and an inner circumferential surface of the annular groove and also an inside annular gap clearance may be formed between an inner circumferential surface of an inner hole of the mov
    Type: Grant
    Filed: March 13, 1986
    Date of Patent: April 28, 1987
    Assignee: Mitsubishi Jukogyo Kabushiki Kaisha
    Inventors: Kazuso Katayama, Yasushi Mori, Hiroshi Kanki, Shigeki Morii, Koji Takeshita, Yutaka Ozawa, Zenichi Yoshida
  • Patent number: 4350723
    Abstract: A peel-up type adhesive having a viscosity of 50 to 5,000 poises and comprising a rubber latex or a resin emulsion containing a polymeric substance which is film-forming at room temperature, and 1 to 200 parts by weight, per 100 parts by weight of the solid polymeric substance content of the rubber latex or resin emulsion, of a fibrous material.
    Type: Grant
    Filed: January 26, 1981
    Date of Patent: September 21, 1982
    Assignee: Nippon Zeon Co. Ltd.
    Inventors: Takaaki Sugimura, Yutaka Ozawa, Mari Takahashi