Abstract: In a pump fault diagnostic apparatus for a hydraulic drive system, it is possible to make a fault diagnosis of hydraulic pumps automatically during an actual operation of a working machine and to detect a fault when there is a problem with horsepower limiting control of the hydraulic pumps as well. A controller 50 performs horsepower limiting control for a plurality of variable displacement hydraulic pumps 1 to 6.

Abstract: Disclosed is a debris removing system for preventing debris, being scattered from an X-ray source, the debris removing system including an attracting unit disposed between a light emission point of the X-ray source and the optical system, for attracting debris, the attracting unit having an attracting surface parallel or approximately parallel to an axis passing through the light emission point. The debris removing system further includes a rotation unit for rotating the attracting unit about the axis. This debris removing system assures a superior debris removing effect and a good EUV light utilization efficiency, being compatible with each other.

Abstract: An exposure apparatus for exposing a photosensitive substrate to a pattern on a mask within an exposure view angle to transfer the pattern onto the photosensitive substrate using X-ray as exposure radiation, wherein exposure light on the mask is limited by a light blocking plate for blocking the exposure radiation, thus accomplishing efficient manufacturing of the semiconductor devices.

Abstract: An X-ray exposure apparatus has a plasma X-ray source for generating X-rays by producing a plasma, and a collimator for converging X-rays that diverge from the X-ray source and reducing a global divergence angle to irradiate a mask with the X-rays. A local convergence angle as seen from one point on the mask is changed by moving the position or angle of the collimator in a direction perpendicular or parallel to the axis of the collimator. The pattern on the mask is transferred to a wafer using X-rays having a convergence angle thus controlled. As a result, controllable parameters are increased and a more suitable resist pattern can be obtained. In addition, process tolerance in terms of exposing finer patterns is improved.

Abstract: A terminal 1 transmits a route guide information request message that specifies the starting point and the destination point to a center station 2. The center station 2 searches for a route based on the received message, and transmits route guide information including a recommended route. On the recommended route, points where the direction of travel is changed more than a predetermined angle or points where the name of the road is changed are set as guide points. The route guide information includes data varying in degree of details depending on areas surrounding the guide points or the other areas. For each area surrounding the guide point, the route guide information includes the direction of travel at that guide point, detailed information about road shapes, road network data including not only the recommended road but also the other roads, etc. For each of the other areas, minimum guide information required is included in the route guide information.

Abstract: A device testing apparatus including a connection terminal to which an electronic device under test is detachably attached, a pusher for pushing the electronic device in the direction of the connection terminal so as to connect the electronic device to the connection terminal, and a cooling unit for cooling the electronic device. As the cooling unit, an element cooling the device using electricity is for example used. The cooling unit includes a cooling medium blower for blowing a cooling medium around the electronic device and heat exchange projections or depressions for raising the cooling efficiency by blowing a cooling medium. In the device testing apparatus, even if the electronic device generates heat on its own during testing, the electronic device is cooled through the pusher, connection terminals, or socket, so the effect of the heat generated by the electronic device is canceled out and the electronic device can be tested at the predetermined temperature as prescribed in the specification.

Abstract: An X-ray exposure apparatus includes a partition structure for defining therein an ambience of one of an atmospheric pressure and a reduced pressure, for accommodating an X-ray mask and an article to be exposed, an X-ray window provided on the partition structure for spatially isolating the inside of the partition structure and an X-ray source, and having a function for transmitting therethrough an X-ray beam with which the article as placed inside the partition structure can be exposed through the X-ray mask, and a scanning mechanism for scanningly moving the X-ray window in a direction intersecting with an optical axis of the X-ray beam, in a single exposure and without interruption at least from just before the start of the exposure to just after the end of the exposure.

Abstract: An X-ray exposure apparatus extracts exposure X-rays from light called synchrotron radiation from a synchrotron radiation source by an optical path including an X-ray mirror and performs exposure using the extracted X-rays. The X-ray mirror contains a material having an absorption edge in at least one of a wavelength range of less than 0.45 nm and a wavelength range exceeding 0.7 nm, thereby implementing exposure using the X-ray in the range of 0.45 nm to 0.7 nm. The X-ray mirror contains at least one material selected from the group consisting of iron, cobalt, nickel, copper, manganese, chromium, and their alloys, nitrides, carbides, and borides.

Abstract: An X-ray exposure apparatus includes a partition structure for defining therein an ambience of one of an atmospheric pressure and a reduced pressure, for accommodating an X-ray mask and an article to be exposed, an X-ray window provided on the partition structure for spatially isolating the inside of the partition structure and an X-ray source, and having a function for transmitting therethrough an X-ray beam with which the article as placed inside the partition structure can be exposed through the X-ray mask, and a scanning mechanism for scanningly moving the X-ray window in a direction intersecting with an optical axis of the X-ray beam, in a single exposure and without interruption at least from just before the start of the exposure to just after the end of the exposure.

Abstract: An X-ray mask has a mask pattern, a protection means for forming a dust-proof space for protecting the mask pattern, and an inner atmospheric pressure adjustment hole for ventilating between the dust-proof space and the outer atmosphere. The X-ray mask can be either a transmission type mask in which the mask pattern is formed on a membrane, or a reflection type mask in which a multilayered film reflection layer and the mask pattern are formed on a substrate.

Abstract: System (software) development is performed based on a state transition diagram. The workflow of a business process is partitioned for each event therein and assigns process codes to the respective process results. A process code is an identification code to indicate a certain state of a process. For example, a process code AA is assigned to the waiting state before completion of a process A, and a process code AB is assigned to the completion state thereof, wherein the process code AB is set as a condition to start a process B. The process codes that are set based on the state transition diagram are managed in an external database (DB) so that flexible modification of the state transition configuration and the state transition order is possible. This provides an entirely new method of system design that facilitates business process reengineering.

Abstract: An X-ray exposure apparatus has a laser light source and a copper tape serving as a target. The position at which a plasma is produced on the target is changed by changing the angle of a mirror that is for irradiating the target with laser light. Alternatively, a plurality of lasers are provided and it is so arranged that different positions on the target are irradiated with different lasers. The position at which a plasma is produced on the target is thus changed to generate a plasma at each of a plurality of positions during one exposure operation. By thus irradiating a plurality of locations in an irradiation area on a target with laser light, the amount of defocusing of X-rays on a wafer is controlled so that a mask pattern is transferred to the wafer in reliable fashion.

Abstract: A sorting control method of tested ICs for sorting and reloading tested ICs held on a test tray to customer trays in accordance with test results, wherein a calculating from the test results an occurrence rate of each category of tested ICs held on the test tray and starting reloading from ICs of a category having a low occurrence rate and when a second tray for holding ICs of the category is being changed, reloading of ICs of a category having a high occurrence rate is performed.

Abstract: An exposure method for transferring a pattern of a mask onto a workpiece in a proximity exposure system, includes a first exposure step for exposing a predetermined portion of the workpiece, while maintaining a first spacing between the mask and the workpiece, and a second exposure step for exposing the predetermined portion of the workpiece, while maintaining a second spacing, different from the first spacing, between the mask and the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.

Abstract: An X-ray exposure apparatus has a plasma X-ray source for generating X-rays by producing a plasma, and a collimator for converging X-rays that diverge from the X-ray source and reducing a global divergence angle to irradiate a mask with the X-rays. A local convergence angle as seen from one point on the mask is changed by moving the position or angle of the collimator in a direction perpendicular or parallel to the axis of the collimator. The pattern on the mask is transferred to a wafer using X-rays having a convergence angle thus controlled. As a result, controllable parameters are increased and a more suitable resist pattern can be obtained. In addition, process tolerance in terms of exposing finer patterns is improved.

Abstract: An X-ray mask includes a mask pattern formed on a surface, a detachable protection cover attached on the surface for forming a dust-proof space for protecting the mask pattern, the protection cover being detached when the mask pattern is exposed with X-rays, and a hole for ventilating between the dust-proof space and an outer atmosphere.

Abstract: An X-ray exposure apparatus comprises an X-ray mirror containing a material having an absorption edge only in at least either one of a wavelength region of less than 0.45 nm and a wavelength region exceeding 0.7 nm as to X-rays.

Abstract: An exposure method for printing a pattern onto a workpiece to be exposed, includes a first exposure step for forming, on the workpiece and by exposure, a transferred image of a first absorbing material pattern formed on a mask and having no periodic structure, and a second exposure step for printing, on the workpiece and by exposure, a diffraction pattern to be produced through Fresnel diffraction due to a second absorbing material pattern formed on the mask and having a periodic structure, the diffraction pattern having a period corresponding to 1/n of a period of the transferred image of the periodic structure pattern, where n is an integer not less than 2, and wherein the first and second exposure steps are performed simultaneously.

Abstract: An x-ray illumination device which illuminates an object by reflecting an x-ray irradiated from a SR emission point with at least one x-ray mirror comprises: first measuring means for measuring the position of the emission point; first control means for controlling the position of the emission point based on the measurements of the first measuring means; second measuring means for measuring the position of the x-ray near the x-ray mirror; and second control means for controlling the position or the attitude of the x-ray mirror based on the measurements of the second measuring means. The control frequency of the first control means of the x-ray illumination device here is of a frequency range higher than the control frequency of the second control means, and the ranges of the two control frequencies thereof partially overlap.

Abstract: An X-ray optical system includes an X-ray illumination system having at least two mirrors, a driving system for moving the at least two mirrors, a detecting system having at least one sensor, for detecting at least one of tilt and incidence position of X-rays in the X-ray illumination system, and a control system for controlling movements of the at least two mirrors by the driving system on the basis of detection by the detecting system.