Patents by Inventor Yutaro KURAMOTO

Yutaro KURAMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIST UNDERLAYER FILM-FORMING COMPOSITION
    Publication number: 20230161246
    Abstract: Provided is a novel composition for forming a resist underlayer film. This composition for forming a resist underlayer film includes a polymer (X) and a solvent, the polymer (X) containing: a plurality of structural units which are the same as or different from each other and have a methoxymethyl group and a ROCH2- group (R is a monovalent organic group, a hydrogen atom, or a mixture thereof) other than the methoxymethyl group; and a linking group that links the more than one structural unit.
    Type: Application
    Filed: February 22, 2021
    Publication date: May 25, 2023
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Hikaru TOKUNAGA, Yutaro KURAMOTO, Makoto NAKAJIMA, Satoshi HAMADA, Katsuya MIURA
  • FILM FORMING COMPOSITION
    Publication number: 20220100092
    Abstract: A film-forming composition is suitable as a resist underlayer film-forming composition capable of forming an Si-containing resist underlayer film that exhibits favorable adhesion to an EUV resist and favorable etching processability because of high rate of etching with fluorine. A film-forming composition, for example, including a polymer of Formula (E1) and a solvent.
    Type: Application
    Filed: December 25, 2019
    Publication date: March 31, 2022
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Wataru SHIBAYAMA, Yutaro KURAMOTO, Satoshi TAKEDA, Shuhei SHIGAKI, Ken ISHIBASHI, Makoto NAKAJIMA