Abstract: The titanium plating solution production method including measuring a titanium plating solution containing fluorine and titanium by cyclic voltammetry under the following conditions, and adding titanium to the titanium plating solution so that the potential difference between the spontaneous potential and the Ti3+/Ti4+ redox potential is 0.75 V or more. Conditions: when the temperature of the titanium plating solution is 650° C. to 850° C. and when glassy carbon is used as a working electrode, platinum is used as a pseudo-reference electrode and titanium is used as a counter electrode, the potential scanning is repeatedly performed on the working electrode for at least five times at a scanning speed of 1 mV/sec to 500 mV/sec between a lower potential limit which is the immersion potential of the working electrode and an upper potential limit which is a potential that is 2 V to 4 V higher than the lower potential limit.

Abstract: Provided is a conductive material including: a base material that is conductive at least at a surface thereof; and a titanium film on the surface of the base material, the titanium film having an average film thickness of not less than 1 ?m and not more than 300 ?m.