Patents by Inventor Yutaro Tsuda

Yutaro Tsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220153920
    Abstract: Provided is a method for producing a polymer, characterized by reacting (A) an epoxy compound having two or more epoxy groups in the molecule with (B) a reactive compound having, in the molecule, two or more functional groups reactive with epoxy groups, in the presence of (C) a polymerization catalyst and (D) a cocatalyst.
    Type: Application
    Filed: February 12, 2020
    Publication date: May 19, 2022
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Yutaro TSUDA, Hiroki YAMAGUCHI
  • Patent number: 10005742
    Abstract: The present invention provides a method for producing an epoxy compound by a reaction of an olefin compound with hydrogen peroxide, wherein the epoxy compound is stably and safely produced using a hydrogen peroxide stabilizer for reducing an oxygen gas generated from hydrogen peroxide. A method for producing an epoxy compound by a reaction of an olefin compound with hydrogen peroxide, wherein the reaction is carried out in the presence of an organophosphorus compound in such a reaction medium that the pH is maintained within a range of more than 7.5 and less than 12.0. The olefin compound may be 1,3,5-tris-(alkenyl)-isocyanurate. The alkenyl group in the olefin compound may be 3-butenyl group, 4-pentenyl group, 5-hexenyl group, 6-heptenyl group, or 7-octenyl group. The epoxy compound may be 1,3,5-tris-(epoxyalkyl)-isocyanurate. The reaction medium may be such a reaction medium that the pH is maintained within a range of 8.0 to 10.5.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: June 26, 2018
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kazuki Hirasada, Yutaro Tsuda
  • Publication number: 20170275258
    Abstract: The present invention provides a method for producing an epoxy compound by a reaction of an olefin compound with hydrogen peroxide, wherein the epoxy compound is stably and safely produced using a hydrogen peroxide stabilizer for reducing an oxygen gas generated from hydrogen peroxide. A method for producing an epoxy compound by a reaction of an olefin compound with hydrogen peroxide, wherein the reaction is carried out in the presence of an organophosphorus compound in such a reaction medium that the pH is maintained within a range of more than 7.5 and less than 12.0. The olefin compound may be 1,3,5-tris-(alkenyl)-isocyanurate. The alkenyl group in the olefin compound may be 3-butenyl group, 4-pentenyl group, 5-hexenyl group, 6-heptenyl group, or 7-octenyl group. The epoxy compound may be 1,3,5-tris-(epoxyalkyl)-isocyanurate. The reaction medium may be such a reaction medium that the pH is maintained within a range of 8.0 to 10.5.
    Type: Application
    Filed: August 11, 2015
    Publication date: September 28, 2017
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kazuki HIRASADA, Yutaro TSUDA
  • Patent number: 9464074
    Abstract: There is provided a method for producing an epoxy compound having an epoxy ring bonded to a triazinetrione ring via a long chain alkylene group, an olefin compound having a specific structure is used to efficiently obtain an epoxy compound of which an olefin moiety is epoxidized in high yield. A method for producing an epoxy compound of Formula (2): including reacting a triolefin compound of the following Formula (1): (In the above-mentioned Formulae, R1 to R9 are each independently a hydrogen atom or a methyl group; and n1 to n3 are each independently an integer of 1 to 4) with hydrogen peroxide, a nitrile compound, and an alkaline substance in a solvent. The nitrile compound is an aliphatic nitrile compound or an aromatic nitrile compound. The alkaline substance is phosphate, carbonate, or an alkaline metal hydroxide.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: October 11, 2016
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Nobuyuki Kakiuchi, Kazuki Hirasada, Hiroki Yamaguchi, Yutaro Tsuda
  • Publication number: 20150284372
    Abstract: There is provided a method for producing an epoxy compound having an epoxy ring bonded to a triazinetrione ring via a long chain alkylene group, an olefin compound having a specific structure is used to efficiently obtain an epoxy compound of which an olefin moiety is epoxidized in high yield. A method for producing an epoxy compound of Formula (2): including reacting a triolefin compound of the following Formula (1): (In the above-mentioned Formulae, R1 to R9 are each independently a hydrogen atom or a methyl group; and n1 to n3 are each independently an integer of 1 to 4) with hydrogen peroxide, a nitrile compound, and an alkaline substance in a solvent. The nitrile compound is an aliphatic nitrile compound or an aromatic nitrile compound. The alkaline substance is phosphate, carbonate, or an alkaline metal hydroxide.
    Type: Application
    Filed: October 21, 2013
    Publication date: October 8, 2015
    Inventors: Nobuyuki Kakiuchi, Kazuki Hirasada, Hiroki Yamaguchi, Yutaro Tsuda
  • Patent number: 8969585
    Abstract: Provided is a process for producing an optically active compound represented by Formula (3): (wherein R1 is an alkyl group, an alkynyl group, an alkenyl group, an aliphatic heterocyclic group, a cycloalkyl group, an aryl group, an aralkyl group, or an aromatic heterocyclic group, and any hydrogen atom of R1 may be replaced with a substituent; R2 is a hydrogen atom or a group which is not reactive in the reaction below; and * represents a chiral center) or a salt thereof by subjecting a compound represented by Formula (1): (wherein R1 and R2 have the same meanings as defined in Formula (3)) to a ring closure reaction in the presence of a chiral ligand having 1 or more coordination sites, a Lewis acid represented by Formula (2): MmZn??(2) (wherein M is a metal ion, Z is a counter anion of M, and m and n are integers of 1 to 4), and a sulfonyl halide having an optionally substituted alkyl or phenyl group.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: March 3, 2015
    Assignee: Nagasaki University
    Inventors: Osamu Onomura, Yutaro Tsuda, Masami Kuriyama, Toshiharu Yanagi, Kazuya Kodama
  • Publication number: 20140012010
    Abstract: Provided is a process for producing an optically active compound represented by Formula (3): (wherein R1 is an alkyl group, an alkynyl group, an alkenyl group, an aliphatic heterocyclic group, a cycloalkyl group, an aryl group, an aralkyl group, or an aromatic heterocyclic group, and any hydrogen atom of R1 may be replaced with a substituent; R2 is a hydrogen atom or a group which is not reactive in the reaction below; and * represents a chiral center) or a salt thereof by subjecting a compound represented by Formula (1): (wherein R1 and R2 have the same meanings as defined in Formula (3)) to a ring closure reaction in the presence of a chiral ligand having 1 or more coordination sites, a Lewis acid represented by Formula (2): MmZn??(2) (wherein M is a metal ion, Z is a counter anion of M, and m and n are integers of 1 to 4), and a sulfonyl halide having an optionally substituted alkyl or phenyl group
    Type: Application
    Filed: January 31, 2012
    Publication date: January 9, 2014
    Inventors: Osamu Onomura, Yutaro Tsuda, Masami Kuriyama, Toshiharu Yanagi, Kazuya Kodama