Abstract: A power system including a first battery pack, a second battery pack, and a power management circuit is disclosed. The first battery pack has a first end and a second end, and has a first battery capacity. The second battery pack has a third end and a fourth end. The third end is coupled to the second end of the first battery pack and provides a low battery voltage. The fourth end is grounded, the second battery pack has a second battery capacity, and the second battery capacity is greater than the first battery capacity. The power management circuit is coupled to the second battery pack to receive the low battery voltage, and provides a component operating voltage to an electronic components based on the low battery voltage.

Abstract: A photo resist layer is used to protect a dielectric layer and conductive elements embedded in the dielectric layer when patterning an etch stop layer underlying the dielectric layer. The photo resist layer may further be used to etch another dielectric layer underlying the etch stop layer, where etching the next dielectric layer exposes a contact, such as a gate contact. The bottom layer can be used to protect the conductive elements embedded in the dielectric layer from a wet etchant used to etch the etch stop layer.

Abstract: A layout pattern of a magnetoresistive random access memory (MRAM) includes a substrate having a first cell region, a second cell region, a third cell region, and a fourth cell region and a diffusion region on the substrate extending through the first cell region, the second cell region, the third cell region, and the fourth cell region. Preferably, the diffusion region includes a H-shape according to a top view.

Abstract: An interactive exercise apparatus for guiding a user to perform an exercise includes a display device and a detecting device. The display device is configured to display video imagery which shows an instructor image and at least one motion check image. The motion check image corresponds to a predetermined one of a plurality of body parts of the user, which has a motion guide track and a motion achievement evaluation. The detecting device is configured to detect displacement of the body parts. The motion guide track is displayed on a predetermined position of the video imagery with a predetermined track pattern, corresponding to a movement path of the predetermined body part when the user follows movements demonstrated by the instructor image to perform the exercise. The motion achievement evaluation indicates a matching degree determined according to the displacement of the predetermined body part detected by the detecting device.

Abstract: A high voltage device includes: a semiconductor layer, a well, a drift oxide region, a body region, a gate, a source, a drain, and a field plate. The well has a first conductivity type, and is formed in a semiconductor layer. The drift oxide region is formed on the semiconductor layer. The body region has a second conductivity type, and is formed in the semiconductor layer, wherein the body region and a drift region are connected in a channel direction. The gate is formed on the semiconductor layer. The source and the drain have the first conductivity type, and are formed in the semiconductor layer, wherein the source and the drain are in the body region and the well, respectively. The field plate is formed on and connected with the drift oxide region, wherein the field plate is electrically conductive and has a temperature coefficient (TC) not higher than 4 ohm/° C.

Abstract: A power device includes: a semiconductor layer, a well region, a body region, a gate, a source, a drain, a field oxide region, and a self-aligned drift region. The field oxide region is formed on an upper surface of the semiconductor layer, wherein the field oxide region is located between the gate and the drain. The field oxide region is formed by steps including a chemical mechanical polish (CMP) process step. The self-aligned drift region is formed in the semiconductor layer, wherein the self-aligned drift region is entirely located vertically below and in contact with the field oxide region.

Abstract: A high voltage MOS device includes: a well, a body region, a gate, a source, plural body contact regions and a drain. The plural body contact regions are formed in the body region, wherein each of the body contact region is located beneath the top surface and contacts the top surface in the vertical direction, and is in contact or not in contact with the gate in the lateral direction. The plural body contact regions are arranged substantially in parallel in the width direction and any two neighboring body contact regions are not in contact with each other in the width direction. The gate includes a poly-silicon layer which serves as the only electrical contact of the gate, and every part of the poly-silicon layer is the first conductivity type.

Abstract: A high voltage MOS device includes: a well, a body region, a gate, a source, plural body contact regions and a drain. The plural body contact regions are formed in the body region, wherein each of the body contact region is located beneath the top surface and contacts the top surface in the vertical direction, and is in contact or not in contact with the gate in the lateral direction. The plural body contact regions are arranged substantially in parallel in the width direction and any two neighboring body contact regions are not in contact with each other in the width direction. The gate includes a poly-silicon layer which serves as the only electrical contact of the gate, and every part of the poly-silicon layer is the first conductivity type.

Abstract: A transformer structure includes a first conductive plate, a second conductive plate, a circuit board and a core assembly. The first conductive plate has a first through hole and two first pins, and the first pins are formed by bending two ends of the first conductive plate respectively. The second conductive plate is installed opposite to the first conductive plate and has a second through hole and two second pins, and second pins are formed by bending the two ends of the second conductive plate respectively. The circuit board includes a winding, a positioning portion and a third through hole. The core assembly is electromagnetically coupled to the first conductive plate, the circuit board and the second conductive plate and passed through the first, second and third through holes to provide a high amperage and low-profile transformer structure.

Abstract: A transformer structure includes a first conductive plate, a second conductive plate, a circuit board and a core assembly. The first conductive plate has a first through hole and two first pins, and the first pins are formed by bending two ends of the first conductive plate respectively. The second conductive plate is installed opposite to the first conductive plate and has a second through hole and two second pins, and second pins are formed by bending the two ends of the second conductive plate respectively. The circuit board includes a winding, a positioning portion and a third through hole. The core assembly is electromagentically coupled to the first conductive plate, the circuit board and the second conductive plate and passed through the first, second and third through holes to provide a high amperage and low-profile transformer structure.

Abstract: A method for fabricating a high voltage semiconductor device is provided. Firstly, a substrate is provided, wherein the substrate has a first active zone and a second active zone. Then, a first ion implantation process is performed to dope the substrate by a first mask layer, thereby forming a first-polarity doped region at the two ends of the first active zone and a periphery of the second active zone. After the first mask layer is removed, a second ion implantation process is performed to dope the substrate by a second mask layer, thereby forming a second-polarity doped region at the two ends of the second active zone and a periphery of the first active zone. After the second mask layer is removed, a first gate conductor structure and a second gate conductor structure are formed over the middle segments of the first active zone and the second active zone, respectively.

Abstract: A method for fabricating a high voltage semiconductor device is provided. Firstly, a substrate is provided, wherein the substrate has a first active zone and a second active zone. Then, a first ion implantation process is performed to dope the substrate by a first mask layer, thereby forming a first-polarity doped region at the two ends of the first active zone and a periphery of the second active zone. After the first mask layer is removed, a second ion implantation process is performed to dope the substrate by a second mask layer, thereby forming a second-polarity doped region at the two ends of the second active zone and a periphery of the first active zone. After the second mask layer is removed, a first gate conductor structure and a second gate conductor structure are formed over the middle segments of the first active zone and the second active zone, respectively.

Abstract: In accordance with one aspect of the present invention, an electrical sleep assistant device, which comprises a handheld case, a display panel, a plurality of biosensors, and a calculation module, is provided. The case has a surface. The display panel is disposed on the surface of the case. The plurality of biosensors are disposed on the surface of the case for collecting a plurality of physiological information. The calculation module is disposed in the case, and coupled to the display panel and the plurality of biosensors. Preferably, a plurality of buttons disposed on the surface of the case, and coupled to the calculation module.