Abstract: Band control is conducted for each user by distributing traffic for each user in a case where a plurality of band control devices are required due to increased traffic and under the condition where the user uses a plurality of terminals or has a plurality of IP addresses with one terminal to generate a plurality of communications at the same time.

Abstract: An irregularity defect inspection apparatus for inspecting an object to be inspected having a repeated pattern composed of regularly arranged unit patterns on the surface thereon to detect an irregularity defect occurring in the repeated pattern. The apparatus includes a light source apparatus having a light source for applying light to a region including an inspection region of the object to be inspected at a desired incidence angle, and an observation apparatus having a light-receiving optical system for receiving light which is generated from the inspection surface of the object to be inspected perpendicularly thereto when light is applied by the light source apparatus. The light source apparatus is provide with a light source having a parallelism of 2 degrees or less and an illuminance of 300000 Lx or higher.

Abstract: An irregularity defect inspection apparatus for inspecting an object to be inspected having a repeated pattern composed of regularly arranged unit patterns on the surface thereon to detect an irregularity defect occurring in the repeated pattern. The apparatus includes a light source apparatus having a light source for applying light to a region including an inspection region of the object to be inspected at a desired incidence angle, and an observation apparatus having a light-receiving optical system for receiving light which is generated from the inspection surface of the object to be inspected perpendicularly thereto when light is applied by the light source apparatus. The light source apparatus is provide with a light source having a parallelism of 2 degrees or less and an illuminance of 300000 Lx or higher.

Abstract: A mura defect inspection apparatus 10 having an illuminating unit 12 which irradiates light onto a photomask 50 having a chip 55 on the surface thereof, the chip is formed with a repeated pattern that a unit pattern is regularly arranged, and a photoreceptor 13 which receives scattered light generated at the edge part of the unit pattern of the repeated pattern on the chip of the photomask and converts it to received light data, wherein the received light data is analyzed to detect a mura defect generated in the repeated pattern, wherein the illuminating unit irradiates light that is emitted from an illumination light source and has a orientation property of the rays almost parallel, the light having a parallelism within an angle of 2°, for example, onto a repeated pattern 51 on the chip 55 of the photomask 50. This application claims foreign priority based on Japanese Patent application No. 2004-106462, filed Mar. 31, 2004, the contents of which is incorporated herein by reference in its entirety.