Patents by Inventor Yuuiki Ishii

Yuuiki Ishii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure method, exposure system, and substrate processing apparatus
    Patent number: 7728953
    Abstract: high performance and high quality micro devices, etc. are produced highly efficiently at a high throughput. Before transferring a wafer W to an exposure apparatus 200 for exposing the wafer W, marks formed on the wafer W is measured by an in-line measurement device 400 and a measurement result and/or a result of performing calculation processing on the measurement result is notified to the exposure apparatus 200. In the exposure apparatus 200, a measurement condition is optimized based on the notified result and an alignment processing and other processing are performed.
    Type: Grant
    Filed: August 31, 2006
    Date of Patent: June 1, 2010
    Assignee: Nikon Corporation
    Inventors: Hiroyuki Suzuki, Yuuiki Ishii, Shinishi Okita